臺灣博碩士論文加值系統

Abstract
In order to extend the applications of IC process in TAIWAN and to promote the
traditional mechanical hot embossing process，we have developed a new process
SMIHE （Silicon Mold Insert Hot Embossing）。This process has combined both IC
and hot embossing process。Brightness enhancement thin films
have been successfully
fabricated by this method。these films have pyramids on top to
focus incident light and
achieve the brightness enhancement effect。Anisotropic silicon
etching is used to
fabricate pyramid sharpes on a four inch silicon wafer as the
mold insert in the hot
embossing process。We have successfully fabricated these films by using PVC as
material。The optical measurements have proven the brightness enchancement of
about 20% within the viewing angel of about 70*。During the hot embossing
process，PVC will show the rehological behavior which is
between elastic and viscous
state。We have chosen Kelvin Mold to describe the hot embossing process and
discussed the results in detail。