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研究生:吳昌霖
研究生(外文):Wu Chang Lin
論文名稱:藍光可寫一次光碟雙層a-Si/Cu無機記錄薄膜之研究
論文名稱(外文):A Study of the Dual Layer a-Si/Cu Inorganic Recording Thin Film for Blue-ray Write-once Disk
指導教授:何永鈞
指導教授(外文):Her Yung Chiun
學位類別:碩士
校院名稱:國立中興大學
系所名稱:材料工程學研究所
學門:工程學門
學類:材料工程學類
論文種類:學術論文
論文出版年:2003
畢業學年度:91
語文別:中文
論文頁數:84
中文關鍵詞:可寫一次藍光光碟無機記錄材料非晶形矽/銅雙層薄膜
外文關鍵詞:Write-once Blue-ray DiskInorganic Recording Materiala-Si/Cu Dual Layer
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  • 被引用被引用:5
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目前的可寫一次光碟,主要是以有機染料為記錄層材料,但有機染料的吸收波長範圍狹窄,且大部分有機染料對短波長範圍的藍光或藍紫光的吸收率都非常的低,所以應用在藍光記錄之高密度儲存媒體時,會產生許多問題,於是研發適用於可寫一次藍光光碟的無機記錄材料將是刻不容緩的課題。
本研究以IBAD製備a-Si/Cu雙層記錄膜取代有機染料,作為可寫一次藍光光碟的無機記錄材料。由熱分析的實驗結果顯示,a-Si/Cu雙層記錄膜有兩階段的反射率變化,在100℃/min的升溫速率下,反射率變化對應的溫度分別為175℃與495℃。從TEM與AES的分析可得知,第一階段的變化是a-Si/Cu雙層記錄膜的Cu向a-Si擴散並反應形成Cu3Si,並且和未與Cu反應的a-Si共存;第二階段的變化為Si擴散至Cu3Si中的孕核位置,而同時與Cu3Si的晶粒一起結晶成長,形成結晶Si(c-Si)與晶粒較大的Cu3Si。由光學性質分析的結果顯示,初濺鍍a-Si/Cu雙層記錄膜對藍光波長405nm有足夠的吸收率47.3%和適當的反射率43.9%,經過500℃熱處理後,形成c-Si與Cu3Si的結晶相,與初濺鍍薄膜有明顯的光學對比36.4%,很明顯的,a-Si/Cu雙層記錄膜具有符合藍光可寫一次光碟記錄材料的要求。經由靜態測試結果顯示我們確定a-Si/Cu雙層記錄膜在短時間的雷射脈衝下,Cu能有效使非晶形Si結晶化而導致記錄前後的反射對比。在雷射功率為6mW、8mW與10mW時,最短的寫入時間分別為100ns、50ns與10ns;我們估計最大線速度在3m/s、6m/s與29m/s時,資料傳輸速率分別可達到約18.1Mbps、36.2Mbps與181.2Mbps。
Organic dyes have been used as the recording materials for most of the write-once(W/O)disks. However, the absorption spectrum of the organic dye is strongly wavelength dependent and is very weak at the range of blue wavelengths. It is very difficult to synthesize a suitable organic recording material for the write-once blue-ray disk. Therefore, inorganic recording materials exhibiting adequate optical properties at blue wavelength become possible candidates for the write-once blue-ray disks.
In this study, an a-Si/Cu dual layer prepared by an Ion Beam Assisted Deposition system(IBAD)was adopted as the recording layer for the write-once blu-ray disk. The results of thermal analysis showed that there were two reflectivity changes occurring at 175℃ and 495℃ at the heating rate of 100℃/min. The results of TEM and AES analyses confirmed that the first change corresponded to the formation of Cu3Si through the diffusion of Cu into the amorphous Si layer, while the second change corresponded to the crystallization of amorphous Si where poly-crystalline Si grew from the existing Cu3Si nuclei. At the blue wavelength of 405nm, the as-deposited a-Si/Cu recording film exhibited an absorptance of 47.3% and a reflectivity of 43.9%. After being annealed at 500℃, the reflectivity of c-Si/Cu3Si film increased to 59.9%, and an optical contrast of 36.4% was obtained. It is obvious that the a-Si/Cu dual layer with optical properties fulfilling the requirements for the write-once blu-ray disk is one of the promising recording materials. The results of the static testing demonstrated that the copper layer could effectively enhanced the crystallization of amorphous silicon layer. As the laser powers of 6mW、8mW and 10mW were applied the minimum durations of writing pulse were found to be 100ns、50ns and 10ns, respectively, which corresponded to the maximum linear velocities of 3m/s、6m/s and 29m/s, and data transfer rates of 18.1Mbps、36.2Mbps and 181.2Mbps, respectively.
內文目錄
第一章、序論.......................................1
1.1 前言..........................................1
1.2 研究目的......................................2
第二章、理論基礎與文獻回顧.........................4
2.1 光儲存媒體的發展..............................4
2.2 光碟片的構造與原理............................9
2.2.1 唯讀型光碟片.................................9
2.2.2 可重複讀寫型光碟片..........................11
2.2.3 可寫一次型光碟片............................13
2.3 可寫一次無機記錄材料的種類與發展.............16
2.3.1 脫落型......................................16
2.3.2 雙層合金型..................................17
2.3.3 氣泡型......................................18
2.3.4 相變化型....................................19
2.3.5 坑穴型......................................21
2.3.6 金屬島狀薄膜................................23
2.4 高傳輸速率之無機可寫一次藍光光碟.............25
2.5 金屬誘發結晶結構a-Si/Cu雙層記錄膜............30
第三章、實驗步驟..................................31
3.1 實驗設計與流程................................31
3.2 基板清洗......................................33
3.3 薄膜濺鍍......................................33
3.4 膜厚量測與沉積速率檢測........................35
3.5 薄膜退火處理..................................35
3.6 薄膜性質分析..................................36
3.6.1 薄膜表面形貌量測分析........................36
3.6.2 熱性質分析..................................37
3.6.3 擴散分析....................................39
3.6.4 薄膜微結構觀察分析..........................40
3.6.5 薄膜光學性質分析............................40
3.6.6 靜態測試分析................................41
第四章、實驗結果與討論............................42
4.1 薄膜厚度與表面形貌...........................42
4.2 熱性質分析...................................44
4.2.1 非恆溫試驗..................................44
4.2.2 恆溫試驗....................................46
4.3 a-Si/Cu雙層記錄膜的相變化機制................50
4.4 薄膜光學性質分析.............................66
4.4.1 薄膜反射率之分析............................66
4.4.2 薄膜穿透率之分析............................68
4.4.3 薄膜吸收率之分析............................70
4.5 靜態測試分析結果.............................72
第五章、結論......................................79
參考文獻..........................................81
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