臺灣博碩士論文加值系統

發展乾淨且可再生能源，並減少使用化石燃料是現今一大目標。自從本多與藤嶋教授在1972年發表以二氧化鈦為電極進行光電化學水分解，許多研究人員開始著重於利用半導體為光觸媒進行水分解的研究。藉由光電化學水分解原理，結合太陽光產氫，能有效利用太陽光之光觸媒成為發展重點。本研究即以三氧化鎢一維奈米陣列進行光電化學性質研究，尋找最佳光電化學水分解效率的製備條件，為了得到更好光電化學水分解效率，所以進一步貴金屬批覆。
在研究過程中，我們利用簡單的水熱法一次性製備三氧化鎢一維奈米陣列於鎢片上，並使用光沉積法將貴金屬奈米顆粒(Au、Pt、Pd) 批覆於材料，利用X-射線繞射光譜(XRD)、場發射掃描式電子顯微鏡/能量散射光譜儀(SEM/EDX)、高解析穿透式電子顯微鏡(HRTEM)、X-ray光電子能譜儀(XPS)和紫外光-可見光吸收光譜儀和X光吸收近邊緣結構光譜(XANES)了解材料的表面特性。XRD經分析比對後，三氧化鎢屬於單斜晶系；SEM圖則看出三氧化鎢奈米線隨時間變長，從3小時的0.5μm到10小時的17 μm，而直徑(85 nm)無任何改變；HRTEM顯示三氧化鎢奈米線成長方向為[002]；XANES分析結果表示三氧化鎢經過鍛燒可以減少氧空缺情形。
合成材料進行光電化學測試，包含光電流測試、電流-時間曲線和入射單色光子-電子轉換效率(IPCE)。WO3、Au-WO3、Pt-WO3、Pd-WO3的光電化學水分解效率分別為0.22 %、0.29 %、0.26 %、0.21 %，而IPCE則顯示吸收波長範圍，WO3為360~460 nm，Au-WO3為360~520 nm，Pt-WO3為360~480 nm，Pd-WO3為360~460 nm。我們使用簡單的方法成功合成三氧化鎢一維奈米陣列，批覆Au、Pt可以增加材料的光電化學產氫效率以及提升可見光吸收，提供未來改善光電化學性質發展方向。

摘要...................................................... I
Abstract ................................................ II
圖目錄.................................................. VII
表目錄...................................................XII
第一章 緒論................................................1
1-1 研究緣起 ............................................. 1
1-2 研究目的與內容 ....................................... 2
第二章 文獻回顧........................................... 3
2-1 三氧化鎢簡介 ......................................... 3
2-1-1 三氧化鎢基本性質 ................................... 3
2-1-2 一維奈米結構 ....................................... 5
2-2 三氧化鎢一維結構奈米陣列合成方法 ......................6
2-2-1 熱燈絲化學氣相沉積法 ............................... 7
2-2-2 熱蒸鍍法 ........................................... 8
2-2-3 陽極氧化法 ......................................... 9
2-2-4 溶膠-凝膠法.........................................11
2-2-5 水熱法 .............................................13
2-3 共催化光觸媒 .........................................17
2-3-1 批覆金屬元素 .......................................17
2-3-2 摻雜非金屬元素 .....................................22
2-4 光電化學水分解 .......................................22
2-4-1 光電化學水分解原理 .................................22
2-4-2 光電化學裝置 .......................................26
第三章 實驗方法與設備.....................................28
3-1 研究架構與內容 .......................................28
3-2 材料製備 .............................................30
3-2-1 基材前處理 .........................................30
3-2-2 三氧化鎢一維奈米陣列製備 ...........................30
3-2-3 三氧化鎢一維奈米陣列修飾 ...........................31
3-3 特性分析 .............................................32
3-3-1 X-射線繞射光譜 .....................................33
3-3-2 場發射掃描式電子顯微鏡/能量散射光譜儀 ..............34
3-3-3 高解析穿透式電子顯微鏡 .............................35
3-3-4 X-射線光電子能譜儀 .................................36
3-3-5 紫外光-可見光吸收光譜儀.............................37
3-3-6 X光吸收近邊緣結構光譜 ..............................38
3-4 光電化學裝置與測試 ...................................39
3-4-1 標準測試狀況 .......................................39
3-4-2 光電化學裝置與測試 .................................41
第四章 結果與討論.........................................45
4-1 水熱法製備三氧化鎢一維奈米陣列 .......................45
4-1-1 表面形貌分析 .......................................46
4-1-2 表面特性分析 .......................................50
4-1-3 光電化學測試 .......................................54
4-2 批覆貴金屬修飾三氧化鎢一維奈米陣列 ...................61
4-2-1 表面形貌分析 .......................................63
4-2-2 表面特性分析 .......................................66
4-2-3 光電化學測試 .......................................72
4-3 機制探討 .............................................81
4-3-1 成長機制 ...........................................81
4-3-2 光電化學機制 .......................................82
第五章 結論與建議.........................................89
5-1 結論 .................................................89
5-2 建議 .................................................90
第六章 文獻回顧...........................................91

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