臺灣博碩士論文加值系統

本研究以碳化鉻（Chromium carbide，CrC）作為太陽光熱選擇性吸收膜之材料，膜層結構為 SiO2 /CrC 沉積於不銹鋼基板(S.S. substrate)及矽基板上。使用本實驗室自有濺鍍機(Sputter)與非平衡磁控濺鍍機系統(Closed Field Unbalanced Magnetron Sputter，隸屬於金屬工業發展中心)兩台設備製作太陽能光熱選擇性吸收膜。經由國家奈米元件實驗室之紫外光/可見光光譜儀(UV-VIS-NIR Spectrophotometer)量測試片之反射率頻譜，用以計算試片之吸收效率。本研究最佳結果為以非平衡磁控濺鍍機系統在(Ar/C2H2 = 45/15、定電流： 2 A、轉速： 5 RPM)的條件下製鍍 CrC 之太陽能光熱選擇性吸收膜，其吸收率可達 81.91％；在其表面再沉積一層 100nm 之抗反射層(SiO2)後，其最佳吸收率可大幅提昇至 95.39%。
本研究也藉由場發射型掃描式電子顯微鏡(Field-Emission SEM)、薄膜 X 光繞射儀(X-Ray Thin Film Diffractormeter) 與拉曼光譜分析儀(Raman Spectrometer) 分別進行薄膜之表面形貌、結晶性分析。

In this study, Chromium Carbide (CrC) is used as solar heat selective absorbers, and decided that the film structure is SiO2 /CrC deposited on stainless steel substrate and the silicon substrate. Using our own sputter and the closed field unbalanced magnetron sputter, we fabricated the solar selective absorbers. And this thesis uses the UV-VIS-NIR Spectrophotometer to measure the reflectance spectrum of the sample to caculate the photothemal conversion efficiency. By using the recipe of Ar/C2H2=45/15, we fabricated the CrC solar heat selective absorber film and its best photothemal conversion efficiency is 81.91％. After depositing an anti-reflection layer consisted of 100nm SiO2 on CrC film, we fabricated the SiO2/CrC solar heat selective absorber film and its best photothemal conversion efficiency is up to 95.39%.
In this study, we also used the Field-Emission Scanning Electron Microscope (FESEM), X-ray thin film diffraction (XRD) and Raman Spectrometer to measure the surface morphology and crystal analysis of the solar selective absorbers.

中文摘要..............................................I
ABSTRACT..............................................II
誌 謝.................................................III
目錄..................................................IV
圖目錄................................................VII
表目錄................................................X
第一章、緒論..........................................1
1.1 前言.............................................1
1.2 研究動機.........................................1
1.3 研究目的.........................................8
第二章、文獻探討......................................9
2.1 文獻回顧.........................................9
2.2 太陽熱能選擇性吸收膜原理.........................13
2.2.1 太陽輻射......................................13
2.2.2 選擇性吸收結構類型............................15
2.2.3 選擇性吸收膜之操作極限........................16
2.3 濺渡原理.........................................18
2.3.1 濺射(Sputter).................................18
2.3.2 電漿濺射......................................19
2.3.3 薄膜成長機制..................................22
2.3.4 反應性濺鍍(Reactive Sputtering)...............23
2.3.5 磁控濺鍍(Magnetron Sputtering)................23
第三章、實驗流程與儀器介紹............................25
3.1 實驗規劃.........................................25
3.1.1 試片準備及前處理..............................26
3.1.2 鍍膜流程......................................27
3.1.3 鍍膜參數......................................28
3.2 鍍膜設備.........................................30
3.2.1 Sputter 濺鍍機................................30
3.2.2非平衡磁控濺鍍機...............................32
3.3 分析量測設備儀器.................................33
3.3.1 紫外光/可見光 光譜儀..........................33
3.3.2 原子力顯微鏡(Atomic Force Microscopy, AFM)....34
3.3.3 X-Ray繞射分析儀(X-Ray Diffraction, XRD)......35
3.3.4 拉曼光譜分析儀( Raman Spectrometer )..........37
第四章、結果與討論....................................40
4.1 紫外光/可見光 光譜儀.............................40
4.1.1 第一組實驗之反射率圖..........................40
4.1.2 第二組實驗之反射率............................49
4.2 拉曼光譜分析.....................................56
4.2.1第一組實驗之拉曼光譜分析.......................56
4.2.2第二組實驗之拉曼光譜分析.......................59
4.3 XRD分析.........................................60
4.3.1 第一組試片之 XRD 分析.........................60
4.3.2 第二組試片之 XRD 分析.........................62
4.4 SEM表面形貌觀察.................................64
4.5 AFM表面粗糙度分析...............................68
第五章、結論與未來展望................................71
5.1 結論.............................................71
5.2 未來展望.........................................72
參考文獻..............................................73

[1] 區新生，「全球能源科技發展趨勢」，98 年全國能源會議系列報導，台灣，四月，(2009)。
[2] 葉惠青等，「我國重點能源產業技術發展動向及策略」， 2010 年能源產業技術白皮書，經濟部能源局，第 5-238 頁，(2010)。
[3] H. Tabor, “Selective radiation I-Wavelength discrimination”, Bull. Res. Counc. ,5A (1956),P.P. 119-128.
[4] D.C.Martin, R.Bell, “in Proceeding of Conference on Coatings for the Aerospace Environment”, Dayton, Ohio,. WADD-TR-60-TB, (1960).
[5] 楊松偉，「以電漿濺鍍技術製備太陽能選擇性吸收膜之研究」，中國文化大學材料科學與製造研究所碩士論文，(2001)。
[6] V. Moise, R, Cloots, and A. Mulmont, “International Journal of Inorganic Materials”, Vol. 3 , P.P. 1323, (2001).
[7] C. Anandan, V. K. William Grips, K. S. Rajam, V. Jayaram, and P. Bera, “Applied Surface Science”, Vol.191, P.P. 254 , (2002).
[8] Z. C. Orel and M. K. Gunde, Sol. Engergy Mater. Sol. Cells, Vol. 68, P.P. 337, (2001).
[9] Z. C. Orel, M. K. Gunde, A. Lencek, and N. Benz, “Solar Engergy”, Vol.69, P.P.131, (2000).
[10] A. Wazawaz, J. Aalmi, H. Hallak, and R. Bes, “Renewable Energy”, Vol. 27 , P.P. 227, (2002).
[11] Y. Zhiqiang, and G. L. Harding, “Thin Solid Films”, Vol. 120, P.P. 81, (1984).
[12] V. Texeira, E. Sousa, M. F. Costa, C. Nunes, L. Rosa, M. J. Carvalho, M. Collares-Pereira, E. Roman, and J. Gago, “Thin Solid Films”, Vol.392, P.P. 320, (2001).
[13] Q. -C. Zhang and D. R. Mills, J. Appl. Phys. Lett. , Vol. 72, P.P. 3013 , (1992).
[14] Q. -C. Zhang and D. R. Mills, Appl. Phys. Lett., Vol. 60 , P.P. 545, (1992).
[15] Y. Cao and X. Hu, “Thin Solid Films”, Vol. 375 , P.P. 155, (2000).
[16] 詹文皓、李世民、唐震宸、楊正旭、陶惟翰，「光學理論模擬鋁-氮複合薄膜結構之太陽能選擇性吸收膜」，照明學刊， 6 月， (2003)。
[17] U. Ortabasi and W. Buehl, “Analysis and Performance of an EvaCuated Tubular Collector. ” Ext. Abstr. Gong., Los Angeles, Caiif., Vol. 222, (1975).
[18] K. Hirotani, K. Kanatani and M. Osumi, “An EvaCuated Glass Tube SolarCollector and Its Application to a Solar Cooling, Heating and Hot Water Supply System for the Hospital in Kinki University. ”Solar Energy, Vol. 22, P.P. 535, (1979).
[19] G. E. McDonald, “Spectral Reflectance Properties of Block Chrome for Use as a Solar Selective Coating. ” Solar Energy Vol. 17 , P.P. 119, (1975).
[20] W. Hermann, H. Horster and R. Kersten “ EvaCuated Selective Solar Collectors. ”Proc. ISES Gong., Atlanta. Pergamon Press, New York Vol. 337 , (1979).
[21] A. andersson, O. Hunderi and C. G. Granqvist, “Nickel Pigmented Anodic Aluminium Oxide for Selective Absorption of Solar Energy.” J. Appl. Phys. Vol. 51, P.P. 754, (1980).
[22] V. B. Eliseev, M. M. Koltun, O. A. Nevezhin, V. P. Matveev, I. P. Gavrilova, A. V. NRomankevich, S. V. Ryabikov and E. M. Yurin, “ Solar-to-thermal EnergyConverter Based on Coaxial EvaCuated Tubular Element with Multilayer Selective Coatings.” Geliotekhnika Vol. 14 , P.P.29, (1978).
[23] D. C. Beekley and G. R. Mather, “Analysis and Experimental Tests of Solar Collector Arrays Based on EvaCuated Tubular Solar Collectors.” Ext. Abstr. ISES Gong., Los Angeles, Calif., P.P. 220 , (1975).
[24] H. G. Craighead, R. Bartynski, R. A. Buhrman, L. Wojcik and A. J. Sievers, “ Metal/insulator Composite Selective Absorbers.” Solar Energy Mat 1, Vol. 105, (1979).
[25] D. R. McKenzie, “Gold, Silver, Chromium and Copper Cermet Selective Surface for EvaCuated Solar Collectors.” Appl. Phys. Left. Vol. 34, P.P. 26, (1979).
[26] Development of High Temperature Coatings for Solar Collectors. General Electric Rep. ANL-K77-3805-I, (1977).
[27] G. E. Carver and E. E. Chain, “CVD Molybdenum Films of High Infrared Reflectance and Significant Solar Absorptance.” J. Physique, Collogue Cl, Suppl. 1, 42, Cl-203, (1981).
[28] J. C. C. Fan and S. A. Spura, “Selective Black Absorbers Using RF Sputtered Cr~Oz/Cr Cermet Films.” Appl. Phys. Lett. Vol. 30, P.P. 513, (1977).
[29] R. Blickensderfer, “Metal Oxycarbonitride Solar Absorbers.” Proc. DOEIDST Thermal Power System Workshop on Selective Absorber Coatings, SERIITP-31-061, P.P. 371, (1977).
[30] H. Ihara, S. Ebisawa and I. Itoh, Proc. 7th Int. Vac. Gong., 3rd Int. Conf. On Solid Surfaces, P.P. 1813, (1977).
[31] J. A. Thornton, J. L. Lamb and A. S. Penfold, “Development of Selective Surface.” Final Report, Contract DE-AC04-78CS35306, U. S. D. O. E. , (Aug. 1980).
[32] J. A. Thornton, J. L. Lamb and A. S. Penfold, “Sputter Deposited/Mo/Al2O3 Selective Absorber Coating.” Thin Solid Films, Vol. 72, P.P. 101, (1980).
[33] G. L. Harding and B. Window, “Graded Metal Carbide Solar Selective Surface Coated onto Glass Tubes by a Magnetron Sputtering System.” J. Vac. Sci. Technol. Vol. 16, P.P. 2101, (1979).
[34] Q. .-C. Zhang, “Direct Current Magnetron Sputtered W-Aln Cermet Selective Surfaces.” J. Vac. Sci. Technol. Vol. 15, P.P. 2842-2846, (1997).
[35] Q.. –C Zhang, “Metal-AlN Cermet Selective Surface Deposited by Direct Current Magnertron Sputtering Technology.” J. Physics D:Appl. Phys. Vol. 31, P.P. 335-362, (1988).
[36] 陶惟翰、楊松偉、唐震宸、黃呈加，「太陽能選擇性吸收膜製備技術與其物性之研究」，中國材料科學學會公元 2000 年年會， 11 月，(1996)。
[37] Q. .-C. Zhang, “Direct Current Magnetron Sputtered W-Aln Cermet Selective Surfaces.” J. Vac. Sci. Technol. Vol. 15, P.P. 2842-2846, (1997).
[38] J. P. Holman 著，王鎮雄等譯，「熱傳遞學」， (1995)。
[39] J. A.Thornton, J. L. Lamb and A. S. Penfold, “Development of Selective Surface.” Final Report, Contract DE-AC04-78CS35306, U. S. D. O. E. (Aug. 1980).
[40] B. Chapman, “Glow Discharge Processes”, John Wiley & Sons, New York, P.P. 177, (1980).
[41] B. Chapman, “Glow Discharge Processes”, John Wiley & Sons, New York, P.P. 49, (1980).
[42] 陳松德，「濺鍍鉭基薄膜的相轉變機制與銅金屬化擴散阻礙性質之研究」，逢甲大學材料科學研究所碩士論文，(1999)。
[43] M. Ohring, “The Materials Science of Thin Films”, Academic Press, New Jersey, P.P. 107 (1992).
[44] B. Chapman, “Glow Discharge Processes”, John Wiley & Sons, New York, P.P. 49 (1980).
[45] W. D. Westwood, Reactive Sputter Deposition, “Handbook of Plasma Processing Technology”, Springer- Verlag Berlin Heidelberg, U.S.A, Ch. 9, (1992).
[46] M. Ohring, “The Materials Science of Thin Films”, Academic Press, New Jersey, P.P. 118-133, (1992).
[47] 楊哲勛，「射頻磁控濺鍍氧化鎳薄膜製程條件對顯為結構與電性及光性之影響研究」，國立成功大學 材料科學及工程學系 碩士論文，(1990)。
[48] Donald L. Smith “ Thin-Film Desposition Priciples and Practive” , The McGraw-Hill Companies, nc. P.P. 157, (1999)
[49] Q..-C. Zhang and D. R. Mills, “High Solar Performance Selective Surface Using Bi-sublayer Cermet Film Structures.” Sol. Energy Mater. Sol. Cells Vol. 27, P.P. 273-290, (1992).
[50] 鄭信民、林麗娟，「 X 光繞射應用簡介」，工業材料雜誌， 181 期, 第 100-108 頁，(1994)。
[51] 黃健瑋，「應用於薄膜太陽能面板之奈米鋁誘發大晶粒低溫多晶矽薄膜之製備」，碩士論文，崑山科技大學，( 2009)。
[52] 汪建民，「材料分析」，中國材料科學學會， (1998)。
[53] 許巧玲，「 二十一世紀的新能源-太陽電池」，工業材料雜誌， 192 期, 第 89-95頁，(2002)。
[54] J. Robertson, “Diamond-like amorphous carbon” , Materials Scienceand Engineering R, 37, P.P. 129, (2002)
[55] B.R. Wu, J.A. Xu, “Total energy calculations of the lattice properties ofcubic and hexagonal diamond” , Physical Review B, 57, P.P. 13355 , (1998)
[56] G.M. Gualberto, C. Underhill, S.Y. Leung, G. Dresselhaus, “Raman andinfrared spectra of graphite-AlCl3”, Physical Review B, 21, P.P. 862 , (1980)
[57] C.Q. Jin, X. Wang, Z.X. Liu, Y.L. Zhang, F.Y. Li, R.C. Yu, “The unusual morphology, structure, and magnetic property evolution of glassy carbon upon high pressure treatment”, Brazilian Journal of Physics, 33, P.P. 723, (2003)
[58] 陳佳琪，「研究類鑽碳電流式消毒水感測器」，國立成功大學 化學工程研究所 碩士論文，(2005)。
[59] 張永宏，「氮化鋁薄膜於太陽能選擇性吸收膜之研究」，私立龍華科技大學 機械工程研究所 碩士論文， (2005)。
[60] 王詮文，「退火時間對蒸鍍鋁誘發多晶矽薄膜之影響」，國立高雄第一科技大學 光電工程研究所 碩士論文，(2009)。
[61] 王宇宙，「SiO2/Ti/SiO2 太陽能選擇性吸收膜之光學模擬、最佳化設計與製作」，國立高雄第一科技大學 光電工程研究所 碩士論文， (2009)。
[62] 陳信价，「不銹鋼碳化太陽能選擇性吸收膜之研究與製作」，國立高雄第一科技大學 光電工程研究所 碩士論文， (2010)。