| 
[1]Adivikolanu, S. and Zafiriou, E., “Robust run-to-run control for semiconductor manufacturing: An internal model control approach”, Proceedings of American Control Conference, Vol. 6, pp. 3687-3691, 1998.
  [2]Afshar, P. and Wang, H., “An ILC-based minimum entropy PI controller for unknown and non-Gaussian stochastic systems”, Proceedings of 17th World Congress the International Federation of Automatic Control, Seoul, Korea, July 6-11, pp. 12230-12235, 2008.
  [3]Baras, J. S. and Patel, N. S., “A framework for robust run by run control with lot delayed measurements”, IEEE Transactions on Semiconductor Manufacturing, Vol. 10 (1), pp. 75-83, 1997.
  [4]Bell, A. J and Sejnowski, T. J., “An information-maximization approach to blind separation and blind deconvolution”, Neural Computation, Vol. 7, pp. 1129-1159, 1995.
  [5]Butler, S. W. and Stefani, J. A., “Supervisory run-to-run control of polysilicon gate etch using in situ ellipsometry”, IEEE Transactions on Semiconductor Manufacturing, Vol. 7 (2), pp. 193-201, 1994.
  [6]Del Castillo, E., “Statistical process adjustment for quality control”, New York: Wiley, 2002.
  [7]Del Castillo, E.; Hurwitz, A. M., “Run-to-run process control: literature review and extensions”, Journal of Quality Technology, Vol. 29 (2), pp. 184-196, 1997.
  [8]Erdogmus, D. and Principe, J. C., “An error-entropy minimization algorithm for supervised training of nonlinear adaptive systems”, IEEE Transactions on Signal Processing, Vol. 50 (7), pp. 1780-1786, 2002.
  [9]Erdogmus, D. and Principe, J. C., “Generalized information potential criterion for adaptive system training”, IEEE Transactions on Neural Networks, Vol. 13 (5), pp. 1035-1044, 2002.
  [10]Erdogmus, D.; Principe, J. C.; Kim, S. P. and Sanchez, J. C., “A recursive Renyi's entropy estimator”, Proceedings of IEEE Neural Networks for Signal Processing, pp. 209-217, 2002.
  [11]Firth, S. K.; Campbell, W. J.; Toprac, A. and Edgar, T. F., “Just-in-time adaptive disturbance estimation for run-to-run control of semiconductor processes”, IEEE Transactions on Semiconductor Manufacturing, Vol. 19(3), pp. 298-315, 2006.
  [12]Gaddam, S. and Braun, M. W., “Etch Chamber Condition Based Process Control Model for Shallow Trench Isolation Trench Depth Control”, Proceedings of IEEE/SEMI Advanced Semiconductor Manufacturing Conference and Workshop, April 11-12, pp. 17-20, 2005.
  [13]Good, R. P. and Qin, S. J., “On the stability of MIMO EWMA run-to-run controllers with metrology delay”, IEEE Transactions on Semiconductor Manufacturing, Vol. 19 (1), pp. 78-86, 2006.
  [14]Good, R. P. and Qin, S. J., “Stability analysis of double EWMA run-to-run control with metrology delay”, Proceedings of American Control Conference, pp. 2156-2161, 2002.
  [15]Guo, L. and Wang, H., “Minimum entropy filtering for multivariate stochastic systems with non-Gaussian noises”, IEEE Transactions on Automatic Control, Vol. 51 (4), pp. 695-700, 2006.
  [16]Hamby, E. S.; Kabamba, P. T. and Khargonekar, P. P., “A probabilistic approach to run-to-run control”, IEEE Transactions on Semiconductor Manufacturing, Vol. 11 (4), pp. 654-669, 1998.
  [17]Hankinson, M.; Vincent, T.; Irani, K. B. and Khargonekar, P. P., “Integrated real-time and run-to-run control of etch depth in reactive ion etching”, IEEE Transactions on Semiconductor Manufacturing, Vol. 10 (1), pp. 121-130, 1997.
  [18]Ingolfsson, A. and Sachs, E., “Stability and sensitivity of an EWMA controller”, Journal of Quality Technology, Vol. 25 (4), pp. 271-287, 1993.
  [19]Lee, J. H. and Kiew, C. M., “Robust forecasts and run-to-run control for processes with linear drifts”, Journal of Process Control, Vol. 19 (4), pp. 636-643, 2009.
  [20]Ma, M. D.; Chang, C. C.; Jang, S. S. and Wong, D. S. H., “Mixed product run-to-run process control – An ANOVA model with ARIMA disturbance approach”, Journal of Process Control, Vol. 19 (4), pp. 604-614, 2009.
  [21]Mozumder, P. K.; Saxena, S. and Collins, D. J., “A monitor wafer based controller for semiconductor processes”, IEEE Transactions on Semiconductor Manufacturing, Vol. 7 (3), pp. 400-411, 1994.
  [22]Papoulis, A., “Probability, random variables, and stochastic processes”, New York: McGraw-Hill, 2nd ed., 1984.
  [23]Parzen, E., “On the estimation of a probability density function and the mode”, Annals of Mathematical Statistics, Vol. 33 (3), pp. 1065-1076, 1962.
  [24]Pasadyn, A. J. and Edgar, T. F., “Observability and state estimation for multiple product control in semiconductor manufacturing”, IEEE Transactions on Semiconductor Manufacturing, Vol. 18 (4), pp. 592-604, 2005.
  [25]Principe, J. C.; Xu, D. and Fisher, J., “Information theoretic learning”, in Unsupervised Adaptive Filtering, S. Haykin, Ed. New York: Wiley, Vol. I, pp. 265-319, 2000.
  [26]Renyi, A., “On Measures of Entropy and Information”, Proceeding of Fourth Berkeley Symposium on Mathematical Statistics and Probability, Vol. 1, pp. 547-561, 1961.
  [27]Sachs, E.; Hu, A. and Ingolfsson, A., “Run by run process control: combining SPC and feedback control”, IEEE Transactions on Semiconductor Manufacturing, Vol. 8 (1), pp. 26-43, 1995.
  [28]Sachs, E.; Hu, A.; Ingolfsson, A. and Langer, P.H., “Modeling and control of an epitaxial silicon deposition process with step disturbances”, Proceedings of IEEE/SEMI Advanced Semiconductor Manufacturing Conference and Workshop, Oct. 21-23, pp. 104-107, 1991.
  [29]Shannon, C. E., “A Mathematical Theory of Communication”, Bell System Technical Journal, Vol. 27, pp. 379-423, 1948.
  [30]Stefani, J. A.; Poarch, S.; Saxena, S. and Mozuner, P. K., “Advanced process control of a CVD tungsten reactor”, IEEE Transactions on Semiconductor Manufacturing, Vol. 9 (3), pp. 366-383, 1996.
  [31]Wang, A. P.; Afshar P. and Wang. H., “Complex stochastic systems modelling and control via iterative machine learning”, Neurocomputing, Vol. 7 (13-15), pp. 2685-2692, 2008.
  [32]Wang, H. and Zhang, J. H., “Bounded stochastic distributions control for pseudo-ARMAX stochastic systems”, IEEE Transactions on Automatic Control, Vol. 46 (3), pp. 486-490, 2001.
  [33]Wang, H., “Bounded dynamic stochastic systems: modeling and control”, London: Springer-Verlag Ltd, 2000.
  [34]Wang, H., “Control of condition output probability density functions for general nonlinear and non-Gaussian dynamic stochastic systems”, IEE Proceedings of Control Theory Application, Vol. 150, pp. 55-60, 2003.
  [35]Wang, H., “Minimum entropy control of non-Gaussian dynamic stochastic systems”, IEEE Transactions on Automatic Control, Vol. 47 (2), pp. 398-403, 2002.
  [36]Wang, H., “Robust control of the output probability density functions for multivariable stochastic systems with guaranteed stability”, IEEE Transactions on Automatic Control, Vol. 44 (2), pp. 2103-2107, 1999.
  [37]Wang, J.; He, Q. P. and Edgar, T. F., “State estimation in high-mix semiconductor manufacturing”, Journal of Process Control, Vol. 19 (3), pp. 443-456, 2009.
  [38]Wang, J.; He, Q. P.; Qin, S. J.; Bode, C. A. and Purdy, M. A., “Recursive least squares estimation for Run-to-Run control with metrology delay and its application to STI etch process”, IEEE Transactions on Semiconductor Manufacturing, Vol. 18 (2), pp. 309-319, 2005.
  [39]Wu, M. F.; Lin, C. H.; Wong, D. S. H.; Jang, S. S. and Tseng, S. T., “Performance analysis of EWMA controllers subject to metrology delay”, IEEE Transactions on Semiconductor Manufacturing, Vol. 21 (3), pp. 413-425, 2008.
  [40]Xu, J. W.; Erdogmus, D.; Ozturk, M. C. and Principe, J. C., “Recursive Renyi's entropy estimator for adaptive filtering”, Proceedings of IEEE International Symposium on Signal Processing and Information Technology (ISSPIT), pp. 134-137, 2003.
  [41]Yue, H. and Wang, H., “Minimum entropy control of closed-loop tracking errors for dynamic stochastic systems”, IEEE Transactions on Automatic Control, Vol. 48 (1), pp. 118-122, 2003.
  [42]Yue, H.; Zhang, J. F.; Wang, H. and Cao, L. L., “Shaping of molecular weight distribution using B-spline based predictive probability density function control”, Proceedings of American Control Conference, pp. 3587-3592, 2004.
  [43]Zhang, J. F., “Modeling and control of output PDF and its application in MWD control”, 2005.
  [44]Zhang, J. H. and Wang, H., “Iterative learning-based minimum tracking error entropy controller for robotic manipulators with random communication time delays”, IET Control Theory and Applications, Vol. 2 (8), pp. 682-692, 2008.
  [45]Zhang, J. H. and Wang, H., “Minimum entropy control of nonlinear ARMA systems over a communication network”, Neural Computing and Application, Vol. 17 (4), pp. 385-390, 2008.
  [46]Zhang, J. H. and Yue, H., “Improved identification algorithm for B-spline modeling of output probability density functions”, Proceedings of IEEE International Symposium on Intelligent Control, pp. 143-148, 2004.
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