|
1.H. Sakaki, J. Appl. Phys. 19, 735 (1980). 2. Peter Y. Yu, Fundamental of Semiconductors (Springer-Verlag Berlin Heideberg 1996) p.469. 3.D.J. Eaglesham, and M.Cerullo, Phys.Rev.Lett.64, 1943 (1989). 4.I.K. Sou, J. Mao, Z. Ma, W.S, Chen ,K.S. Wang, G.K.L. Wong, J. Crystal Growth. 175, 632 (1997). 5. Peter Y. Yu, Fundamental of Semiconductors (Springer-Verlag Berlin Heideberg 1996) p.165. 6. Peter Y. Yu, Fundamental of Semiconductors (Springer-Verlag Berlin Heideberg 1996) p.133. 7.A. Blacha, H. Presting, Phys. stat. sol. (b), 126, 11 (1984). 8. Peter Y. Yu, Fundamental of Semiconductors (Springer-Verlag Berlin Heideberg 1996) p.272. 9.J. Tersoff, Phys. Rev. lett. 56, 2755 (1986). 10.W.A. Harrison, J. Vac. Sci. Technol. 14, 1016 (1977). 11.I.K. Sou, K.S. Wong, Z.Y. Yang, H.Wang, and G.K.L. Wong , Appl,Rhys,Lett.66,15 (1977). 12.S.Le Goff and B. Stebe, Solid State Communications,83 , 555 (1992). 13.M. Boero, J.M. Rorison,and J.C. Inkson, Surface Science, 377 (1997). 14.T. Garm, J. Phys. 8, 5725 (1996). 15.Henry Mathieu, Pierre Lefebvre, and Philippe Christol, Phys. Rev. B, 46, 4092 (1992). 16.H.M. Manasevit, Appl. Phys. Lett. 12, 156 (1968). 17.Z. Ling,J. Wang, C.X. Jin,and D,H, Wang, Nonlinear Optics,18,231,(1997) 18.M.C. Harris Liao, Y.H. Chang, Y.F.Chen, J.W. Hsu, J.M. lin, and W.C Chou, Appl. Phys. Lett. 70, 1 (1997). 19.Y.P. Vashni, Physica. 34, 149 (1967). 20.B.P. Zhang, T. Yasuda, and Y. Segawa, Appl. Phys. Lett. 70, 18 (1997). 21.Qianghua Xie, A. Madhukar, and P. Kobayashi, Phys. Rev. Lett. 75, 2542 (1992). 22.Z.Y. Xu, Z.D.Lu, X.P.Yang, Z.L. Yuan, B.Z. Zheng, and J.Z. Xu, Phys. Rev. B54. 11, 528. 23.G.S Solomon, J.A. Trezza and J.S. Harris, Appl. Phys. Lett. 66, 3161 (1995). 24.P. Michler, A. Hangleiter,M. Moser,M. Geiger, and F. Scholz, Phys. Rev. B, 46, 7280 (1992). 25.M.Vening and D.J. Dunstan, Phys. Rev. B, 48, 2412 (1993). 26.J.D. Lambkin, D.J. Dunstan, K.H. Wood, and L.K. Howard, Appl. Phys. Lett. 57, 1986 (1990). 27.Y. Kayanuma, Solid State Comunication. 59, 405 (1986).
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