臺灣博碩士論文加值系統

奈米壓印(Nanoimprint lithography, NIL)是一種低成本且具有高生產力的非傳統微影技術。奈米印器（即母模）之製造上，將採用電子束微影技術及電感式耦合電漿乾蝕刻的製程進行，製造出高深寬比之母模結構。壓印設備系統上，將採用熱壓印技術，進行奈米結構之圖形轉移。

The project is aimed at developing the mold fabrication and the imprinting recipe for nano-imprint (NIL). For fabrication of a nano-imprinting mold, the electron beam lithography and ICP(Inductively Coupled Plasma) dry etching will be mainly employed to structure the mold of high aspect ratio.
As for the nano-imprinting process, the hot-embossing will be employed, and the molds will be tested to form the nanopatterns, and then replicate the pattern to the polymer on the substrate.

目錄
誌謝 i
中文摘要 ii
英文摘要 iii
目錄 iv
圖目錄 vi
表目錄 ix
第一章 前言 1
第二章 文獻探討 3
2.1 奈米壓印微影技術 3
2.1.1 熱壓型 3
2.1.2 光硬化型 10
2.2 母模材料之選用 12
2.3 矽晶圓之蝕刻 12
第三章 設備、材料、技術與方法 15
3.1 實驗設備 15
3.2 實驗材料 17
3.3 技術與方法 18
3.3.1 電子束微影 18
第四章 製程步驟及結果 21
4.1 製程步驟 21
4.1.1 矽母模之製作 21
4.1.2 以矽母模進行熱固化型奈米壓印 22
4.2 製程說明與結果 24
4.2.1母模製作 24
4.2.2熱固性奈米壓印 33
4.2.2.1 熱壓前未對母模進行表面處理 33
4.2.2.2 熱壓前對母模進行表面處理 37
4.2.2.2.1 離形層之附著 37
4.2.2.2.2 浸泡脫膜劑20分鐘之熱壓 39
4.2.2.2.3浸泡脫膜劑2小時之熱壓 45
4.2.2.2.4重新設計母模後的壓印 47
4.2.2.2.5 母模表面附著高分子層之移除 61
4.3 奈米壓印流程整理 63
第五章 結論與未來展望 64
參考文獻 65

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