臺灣博碩士論文加值系統

本研究使用銅銦鎵硒四元合金靶材，濺鍍成長CIGS薄膜，並搭配事後硒處理，在玻璃基板上沉積CIGS薄膜。研究濺鍍CIGS靶材時的功率、溫度、氣體流量，以及後續硒處理時的溫度等參數、氣體氣氛等。研究探討各項參數對於CIGS薄膜的影響。在適當參數的控制下，製作出p型的CIGS薄膜。並將p型CIGS薄膜製作於n型矽基板上，並對其電流-電壓、響應度等特性，作ㄧ探討。

In this dissertation, we study the deposition of Copper Indium Gallium Selenium ( CIGS ) thin-film on glass substrate by sputtering with followed selenium heat treatment. Deposition parameters such as power, temperature and gas flow were studied. Following heat treatment parameters such as temperature and gases were studied also. Film morphology, concentration and mobility for these films were analyzed. With controlled parameters, p-type CIGS thin-films can be achieved and p-n diode were fabricated by deposition the CIGS film on n-type Si substrate. The current-voltage behavior and spectral responsivity were characterized for this diode.

中文摘要……………………….……………………………………………………………...I
英文摘要……………………………………………………………………………..…….....II
致謝…………………………………………………………………………………………..III
目錄…………………………………………………………………………………………..IV
表目錄………………………………………………………………………………………..VI
圖目錄………………………………………………………………………………………..Ⅶ
第一章 導論…………………………………………………………………………………..1
1.1 背景介紹…………………………………………………………………………...1
1.2 CIGS薄膜太陽能電池之薄膜性質…………………………………………….....1
第二章 實驗研究之動機與文獻回顧………………………………………………………..4
2.1 CIGS薄膜太陽能電池背景……………………………………………………….4
2.2 CIGS太陽能電池…………………………………………………………………..6
2.3 CIS薄膜缺陷性質……………………………………………………………….....8
2.4 CIGS薄膜之問題……………………………………………………...............…..9
第三章 實驗設備與流程……………………………………………………………………15
3.1 製程設備………………………………………………………………………….15
3.1.1 磁控濺鍍系統……………………………………………………..…………15
3.1.2 硒處理熱蒸鍍系統………………………………………..…………………16
3.2 分析設備……………………………………………………………………….…17
3.2.1 霍爾量測（Hall Measurement）……………………………………………17
3.2.2 掃描式電子顯微鏡（Scanning Electron Microscope）…………..…………18
3.3 實驗流程……………………………………………………………………….....19
3.3.1 濺鍍四元銅銦鎵硒薄膜………………………………………..……………19
3.3.2 蒸鍍硒薄膜及事後硒處理………………………………………..………....21
第四章 實驗結果與討論…………………………………………………………………...32
4.1 濺鍍銅銦鎵硒四元合金靶材……………………………………….…………...32
4.1.1氬氣對銅銦鎵硒的影響………………………………………….............….32
4.1.2溫度對銅銦鎵硒的影響…………………………………………..………....33
4.2 硒處理對銅銦鎵硒的電性影響………………………………………………....33
4.2.1硒處理溫度的影響…………………………………………………………..33
4.2.2增加銦元素在銅銦鎵硒薄膜裡對硒處理的影響………………..………....35
4.3 熱處理氣氛對銅銦鎵硒薄膜的影響…………………………………….……....37
4.3.1空氣熱處理對銅銦鎵硒薄膜的影響………………………………………...37
4.3.2真空熱處理對銅銦鎵硒薄膜的影響……………………………..………….38
4.3.3氫氣氬氣混合氣體熱處理對銅銦鎵硒薄膜的影響………………..……….38
4.4 綜合空氣熱處理以及混合氣體熱處理對銅銦鎵硒薄膜的影響……………….40
4.5 銅銦鎵硒元件光響應度分析……………………………………….……………41
第五章 結論與未來討論…………………………………………………………………..73
參考文獻…………………………………………………………………………………......74

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