臺灣博碩士論文加值系統

本實驗以反應式射頻磁控濺鍍法製備CrNbSiTiZr高熵碳化物鍍膜，探討不同甲烷流率以及施加-100 V基板偏壓後對鍍膜微結構、機械性質、磨耗性質的影響。實驗結果顯示在無基板偏壓下，隨甲烷流率逐漸增加，高熵碳化物鍍膜均呈現FCC固溶結構，鍍膜中碳含量則由36.1 at% 增加至81.1 at%。隨鍍膜中碳含量增加，鍍膜表面粗糙度逐漸下降，結構趨向緻密化。在甲烷流率為3 %時鍍膜有最大硬度26.2 GPa，隨碳含量的增加，硬度呈現逐漸下降的趨勢。施加-100 V基板偏壓後，碳化物鍍膜仍維持FCC固溶結構，結構變得更緻密，硬度也由26.2 GPa提升至32.8 GPa。在高熵碳化物鍍膜與基板附著性方面，臨界荷重介於14至55 N之間。添加中間層後有效提升鍍膜附著性，臨界荷重由原本14 N提升至47 N。由磨耗測試結果顯示，隨碳含量的增加，鍍膜的摩擦係數和磨耗速率均有逐漸下降的趨勢，最低分別可達0.07和2.0 × 10-7 mm3/N•m。由真空退火結果發現，在1000 °C下碳化物鍍膜仍可保持FCC結構。大氣退火方面，鍍膜在800 °C時仍維持FCC固溶結構。由此可見，本研究開發的CrNbSiTiZr高熵碳化物鍍膜具有優異的性質，在工業上極具應用潛力。

摘要 I
目錄 II
表目錄 VI
圖目錄 VII
第一章 前言與研究目的 1
1.1 前言 1
1.2 研究目的 3
第二章 文獻回顧 5
2.1 表面鍍膜 5
2.1.1 表面鍍膜的發展 5
2.1.2 碳化物鍍膜的發展 7
2.2 高熵合金 12
2.2.1 高熵合金定義 12
2.2.2 高熵合金特點 14
2.2.3 高熵碳化物鍍膜的研究 16
2.3 射頻磁控濺鍍原理 18
2.3.1 濺鍍原理 18
2.3.2 射頻濺鍍 21
2.3.3 磁控濺鍍 22
2.3.4 反應式濺鍍 24
第三章 實驗方法和步驟 25
3.1 實驗設計 25
3.2 材料準備 29
3.2.1 靶材製備 29
3.2.2 基板選擇 29
3.2.3 製程氣體 29
3.2.4 對磨球 30
3.3 實驗參數與流程 32
3.4 鍍膜性質分析與量測 37
3.4.1 靶材與鍍膜成份分析 37
3.4.2 靶材與鍍膜晶體結構分析 37
3.4.3 鍍膜表面與橫截面形貌觀察 38
3.4.4 鍍膜硬度與楊氏模數分析 38
3.4.5 鍍膜殘留應力分析 39
3.4.6 鍍膜鍵結形式分析 40
3.4.7 鍍膜拉曼光譜分析 40
3.4.8 鍍膜粗糙度分析 41
3.4.9 鍍膜附著性質分析 42
3.4.10 鍍膜磨耗表現分析 42
3.4.11 鍍膜熱穩定性及抗氧化能力分析 43
第四章 結果與討論 48
4.1 高熵碳化物鍍膜結構與性質 49
4.1.1 高熵合金靶材結構與成份分析 49
4.1.2 高熵碳化物鍍膜之鍍率分析 52
4.1.3 高熵碳化物鍍膜之成份分析 54
4.1.4 高熵碳化物鍍膜之晶體結構分析 56
4.1.5 高熵碳化物鍍膜之表面和橫截面形貌 59
4.1.6 高熵碳化物鍍膜之鍵結分析 64
4.1.7 高熵碳化物鍍膜之拉曼光譜分析 67
4.1.8 高熵碳化物鍍膜之硬度和楊氏模數 70
4.2 在-100 V基板偏壓下高熵碳化物鍍膜結構與性質 73
4.2.1 在-100 V基板偏壓下高熵碳化物鍍膜之鍍率分析 74
4.2.2 在-100 V基板偏壓下高熵碳化物鍍膜之成份分析 76
4.2.3 在-100 V基板偏壓下高熵碳化物鍍膜之晶體結構 78
4.2.4 在-100 V基板偏壓下高熵碳化物鍍膜之表面與橫截面形貌 …………………………………………………………….80
4.2.5 在-100 V基板偏壓下高熵碳化物鍍膜之殘留應力 83
4.2.6 在-100 V基板偏壓下高熵碳化物鍍膜之硬度與楊氏模數 85
4.3 高熵碳化物鍍膜之附著性質 87
4.4 不同中間層厚度對附著力的影響 92
4.5 高熵碳化物鍍膜之耐磨耗表現 96
4.6 高熵碳化物鍍膜之高溫性質 109
4.6.1 真空退火 109
4.6.2 大氣退火 114
第五章 結論與未來研究方向 123
5.1 結論 123
5.2 未來研究方向 125
第六章 參考文獻 126

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