臺灣博碩士論文加值系統

奈米射出成形，使用聚碳酸酯(PC)材料，能夠提升奈米結構的複製速度，光學特性n值接近玻璃，奈米射出成形可以縮短製程時間，4 sec cycle time 快速的提升生產效能，可以有效的降低成本，並且可以製作出高穿透率的幾何結構形狀。透過奈米射出成形也可以大面積且精準的複製奈米孔洞的幾何形狀，且利用模溫幾的溫度控制可以精準地控制奈米孔洞幾何形狀的深寬比複製，此篇paper 討論的深度落於200nm~400nm，孔洞的週期為700nm範圍內。奈米孔洞設計是可以降低反射率，分別以波長400nm 及550nm作為觀察點，單純鏡面無奈米孔洞的PC量測結果為10.2% 及 8.9%，再以深度400nm的奈米孔洞做比較，其量測量測結果為1.4% 及 2.1% 很明顯的此設計它可以有效地降低反射率。與傳統的娥眼設計製程只能透過蝕刻來進行，相對本研究提出了一種更為簡單便利的方式來製作奈米結構，大大縮短了製程時間，而且對於深度的控制也找出有效的控制方法，以製程而言，奈米射出成形相較於蝕刻來的容易，深度的控制更是簡單。此外也開始進行探討NHA(奈米孔洞陣列)對多層膜的影響和檢測的應用潛力。

A rapid, cost-effective and high-throughput process for nanotexturing subwavelength structures with high uniformity using the polycarbonate (PC) is realized via injection nanomolding. The process enables the precise control of nanohole array (NHA) surface topography (nanohole depth, diameter, and periodicity) over large areas thereby presenting a highly versatile platform for fabricating substrates with user-defined, functional performance. Specifically, the optical property of the PC substrates were systematically characterized and tuned through the modulation of the depths of NHA. The aspect ratio submicron holes can be easily modulated and experimentally proven by simply adjusting the molding temperature. The nanotextured depths were reliably fabricated in the range of 200 to 400 nm with a period of approximately 700 nm. The fabricated PC films can reduce the reflectivity from an original bare film of 10.2% and 8.9% to 1.4% and 2.1% with 400-nm depth of nanoholes at the wavelength of 400 and 550 nm, respectively. Compared with conventional moth-like nanostructures with nanopillar arrays with heights adjustable only by an etching process, this paper proposes a facile route with submicron holes to achieve a similar antireflective function, with a significantly reduced time and facile height modulation capability. Furthermore, the effects of multilayer coatings of dielectric and metallic layers on the nanomolded NHA have been performed and potential sensing application is explored.

Content
摘要 I
Abstract II
圖目錄 VI
表目錄 IX
第一章 緒論 1
1-1 文獻回顧 1
1-2 射出成型 3
1-3 論文架構 6
第二章 奈米孔洞陣列生成技術 8
2-1導論 8
2-2 射出成形實驗 14
2-2-1 實驗因子分析 14
2-2-2 實驗規劃 18
2-2-3結果分析 22
2-2-4再現性實驗確認 36
2-3實驗結果分析 43
第三章奈米孔洞陣光學特性探討研究 45
3-1 特性分析 46
3-1-1深度特性分析 46
3-1-2 光學性質分析 49
3-2 多層膜分析 50
3-3結果與討論 52
第四章 結論 53
4-1奈米孔洞陣列生成技術 53
4-2 奈米孔洞陣光學特性探討 53
參考文獻 55

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