臺灣博碩士論文加值系統

本研究提出結合全像干涉微影技術及軟式模仁的複印製程技術，並配合黃光微影製程光學技術，來製作高分子非對稱光柵耦合波導元件。
本製程中先以黃光微影製程方式製作出脊樑式波導母片，再以全像式干涉微影技術於波導母片上進行干涉，製作出高分子布拉格光柵波導元件，並以此光柵波導元件配合軟式印刷(soft-printing)技術之微接觸成形(micro-contact printing)、毛細管成形(micromolding in capillaries)技術與複製成形(replica molding)技術來製作高分子光波導濾波元件模仁，再配合高分子材料製作出非對稱光柵耦合波導元件。
此高分子非對稱光柵耦合波導元件軟式翻模的模仁可達到大量生產的效果，具有製程時間縮短、低成本、及極低光損耗等之優點。
研究中會以掃描式電子顯微鏡(SEM)及原子力顯微鏡(AFM)觀察表面光柵，結合
近場光學量測觀察濾波並紀錄實驗之結果，並研究探討其光學傳輸特性。

In this thesis, we propose a novel technique of fabricating an asymmetric Bragg coupled devices with polymer waveguides by using master molding of soft printing with the photolithography and holographic technique.
First we made a ridge waveguides component through photolithography. We used the holography interference to implement a polymer Bragg waveguide component then with micro-contact printing of the soft printing, micro-molding in capillaries and replica molding to fabricate the molding of soft asymmetric Bragg coupled device with polymer waveguides component. Finally, we utilized formed soft waveguide molding along with polymer materials to implement an asymmetric Bragg coupled devices with waveguides component.
It is easily to achieve the mass production. It has some advantages including process time shortening, low cost and lowest optical loss by using technique of soft molding of asymmetric Bragg coupled devices with polymer waveguide.
In order to observation of the surface grating and record the results of this experiment accurately, we utilize the AFM (Atomic Force Microscopy) and SEM (Scanning Electron Microscopy ). Whereas the optical transmitting features are measured through the optical measuring system.

中文摘要 ………………………………………………………… i
英文摘要 ………………………………………………………… ii
致謝 ………………………………………………………… iii
目錄 ………………………………………………………… iv
表目錄 ………………………………………………………… V
圖目錄 ………………………………………………………… Vi
第一章 導論…………………………………………………… 1
1.1 前言…………………………………………………… 1
1.2 研究目的與方法……………………………………… 2
1.3 論文架構……………………………………………… 2
第二章 研究背景理論探討…………………………………… 4
2.1 微機電系統技術……………………………………… 4
2.2 光波導簡介…………………………………………… 6
2.3 光波導元件介紹與探討……………………………… 8
2.3.1 其他特殊光波導……………………………………… 9
2.4 繞射光柵概述………………………………………… 10
2.4.1 光柵的結構…………………………………………… 10
2.4.2 光柵的種類…………………………………………… 11
2.4.3 光柵的製作及其相關文獻…………………………… 12
2.5 全像干涉微影系統之架構…………………………… 13
2.6 全像干涉微影之繞射光柵理論與光束入射角度推算 17
2.6.1 全像干涉微影之繞射光柵理論…………………… 17
2.6.2 全像干涉微影之光束入射角度推算………………… 20
2.7 軟式微影技術………………………………………… 25
2.7.1 微接觸印刷…………………………………………… 26
2.7.2 毛細管微成形………………………………………… 27
2.7.3 微轉印成形…………………………………………… 27
2.7.4 複製成形……………………………………………… 27
2.8 PDMS特性探討與製程條件…………………………… 28
2.8.1 PDMS特性探討………………………………………… 28
2.8.2 PDMS製程條件………………………………………… 28
2.9 掃描式電子顯微鏡介紹……………………………… 29
2.10 原子力顯微鏡量測之基本介紹……………………… 32
第三章 高分子非對稱波導元件研製………………………… 35
3.1 高分子非對稱波導元件之架構說明………………… 35
3.2 SU8厚膜光阻特性探討………………………………… 36
3.3 波導元件之厚膜光阻黃光微影製程………………… 37
第四章 高分子非對稱光柵耦合波導元件研製……………… 44
4.1 高分子非對稱光柵耦合波導元件之架構說明……… 44
4.2 高分子非對稱波導元件之布拉格光柵製作………… 44
4.2.1 高分子非對稱波導元件之光阻塗佈與光柵製作…… 45
4.3 軟式微翻高分子非對稱光柵耦合之波導模仁製程… 51
4.4 布拉格光柵深度與週期之量測……………………… 58
4.5 高分子非對稱光柵耦合波導元件之保護層製作…… 61
4.6 高分子非對稱光柵耦合波導元件之拋光研磨……… 62
第五章 高分子非對稱光柵耦合波導元件之量測…………… 66
5.1 高分子非對稱光柵耦合波導元件之光強度量測…… 66
5.2 高分子非對稱光柵耦合波導元件之光頻譜量測…… 69
第六章 結論…………………………………………………… 72
參 考 文 獻 ………………………………………… 73
英文論文
大綱 ………………………………………………………… 75
簡 歷 ………………………………………………………… 78

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