臺灣博碩士論文加值系統

35–300 nm非晶形二氧化釕及釕之複合薄膜已成功地以一新開發的鍍液配方，用無電鍍沉積的方式沉積在銅基板上。其無電鍍液之成份為：K2RuCl5•xH2O、NaNO2、NaOH、NaClO。不同鍍液製備步驟、三種不同濃度之NaNO2、及不同沉積時間為本研究之操作變因。本研究討論其反應方程式來說明無電鍍液之沉積機制。紫外光-可見光光譜圖之最大吸收波長的窄小分佈，顯示無電鍍液之穩定程度。此外，利用能量散佈光譜儀、掃描式電子顯微鏡、原子力顯微鏡、X光光電子譜儀、拉曼散射光譜儀來研究二氧化釕與釕複合薄膜之特性。結果顯示，以0.06 M NaNO2(aq)為配方之無電鍍液為最佳之參數。另外，藉由2小時氫氣還原在200℃下還原其複合薄膜，可得到結晶之金屬釕薄膜。而非晶形之複合薄膜，在2小時的氬氣高溫退火400℃的環境下可得結晶之二氧化釕與釕之複合薄膜。

A 35–300 nm amorphous ruthenium oxide and ruthenium composite film has been deposited by electroless plating on a Cu substrate. The plating solution contained compounds of K2RuCl5•xH2O, NaNO2, NaOH, and NaClO. Variables including different mixing steps, concentrations of NaNO2(aq), and plating time were investigated. The reaction steps for the electroless plating were indentified. Stability of the plating solution was confirmed by UV-Vis absorption spectra with narrow maximum wavelength distribution. EDX, SEM, AFM, XPS, and Raman spectroscopy were employed to characterize the as-deposited films. It was concluded that the plating solution with 0.06 M NaNO2(aq) delivered the desirable film qualities. A crystalline Ru film was obtained by H2 reduction for the as-deposited film at 200℃ for 2 hr. In addition, we were able to produce a crystalline RuO2 and Ru composite film by Ar annealing of the as-deposited film at 400℃ for 2 hr.

摘要 i
Abstract ii
Acknowledgements iii
Contents iv
List of Tables vii
List of Figures viii
Chapter 1 Introduction 1
Chapter 2 Literature Review 4
2.1 Physical and chemical properties of RuO2 and Ru 4
2.2 Applications of RuO2 films 5
2.3 Fabrications of RuO2 films 5
2.3.1 Vacuum deposition 5
2.3.2 Solution deposition 7
2.3.3 Other methods 7
2.4 Applications of Ru films 8
2.5 Fabrications of Ru films 8
2.5.1 Vacuum deposition 8
2.5.2 Solution deposition 10
Chapter 3 Experimental 16
3.1 Experimental design 16
3.2 Materials 17
3.3 Plating bath preparation 17
3.4 Instruments and characterization 20
Chapter 4 Results and Discussion I: Development of Ru electroless plating solution 22
4.1 Development of plating bath components 22
4.2 Deposition mechanism 24
4.3 Stability of plating solution 25
Chapter 5 Results and Discussion II: Characterization of composite RuO2 and Ru films 30
5.1 Characterization of composite RuO2 and Ru films 30
5.1.1 The existence of Ru element in the deposited films 30
5.1.2 Morphology observation and thickness measurement of the deposited films 32
5.1.3 Thickness at different plating time 38
5.1.4 Roughness measurement for the deposited films 39
5.1.5 Characterization of the oxidation states for the deposited films 41
5.1.6 Phase and crystallinity characterization for the deposited films 47
5.1.7 Raman spectroscopy characterization for the deposited films 48
5.2 Characterization of the composite RuO2 and Ru films after hydrogen reduction 52
5.2.1 Morphology observation of the deposited films after hydrogen reduction 52
5.2.2 Phase and crystallinity characterization for the deposited films after hydrogen reduction 56
5.2.3 Characterization of the oxidation states for the deposited films after hydrogen reduction 58
5.2.4 Raman spectroscopy characterization for the deposited films after hydrogen reduction 60
5.3 Characterization of composite RuO2 and Ru films after argon annealing 63
5.3.1 Morphology observation of the deposited films after argon annealing 63
5.3.2 Phase and crystallinity characterization for the deposited films after argon annealing 65
Chapter 6 Conclusions 67
References 69

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