臺灣博碩士論文加值系統

本研究是以陰極電弧蒸鍍法,於SKH9高速鋼基材上被覆TiAlN薄膜,探討
TiAl介層對於TiAlN薄膜附著性質的影響。 三元成份的TiAlN薄膜性質
優於TiN薄膜,諸如高硬度、磨耗阻抗、優良化學安定性..等。TiAlN漸進
層鍍膜的形成,主要是藉由控制基材負偏壓的變化,而從基材/ TiAlN界面
上漸進改變鍍膜中Ti/Al成份含量變化至TiAlN鍍膜表面上。經由XRD繞射
分析結果顯示, TiAlN薄膜均具有很強的(111)優選方向。而以基材偏
壓-300V被覆O.1x10^-6m的TiAl介層於SKH9高速鋼基材上提昇TiAlN薄膜附
著力效果最佳.比較不同微結構的TiAlN薄膜附著力,漸進層鍍膜其臨界負
荷值為57N,較複層鍍膜51N及單層鍍膜47N來的高。TiAlN薄膜熱重差(TGD)
分析結果顯示,TiAlN薄膜氧化溫度達890*C / 925*C ,均較TiN薄膜、TiCN
薄膜 及CrN薄膜的氧化溫度高,這是由於TiAlN薄膜在600*C -925*C 高溫
大氣環境中會產生Al2O3保護性膜,因此TiAlN薄膜具備有優異之抗高溫氧
化性質。

In this research,TiAlN films were deposited on high speed steel(
SKH9) by cathodic arc evaporation.The effect of TiAl interlayer
on the tribological properties of TiAlN films were investigated.
The characteristics of the ternary TiAlNfilms have the
properties of high hardness ,abrasion resistance and excellent
chemical stability which all contribute to the success of TiN.A
graded TiAlN structure is defined as a continuous variation of
the various components,fromthe film/substrate interface to the
top surface of the film during the growth.The bias voltage
applied to the substrate is the primary parameter responsiblefor
aluminum depletion and titanium enrichment in the film
composition.XRD analysis showed that TiAlN films have strong
(111) preferred orientation.Optimized critical load of TiAlN/
SKH9 were obtained at a substrate bias 300v, and with a
interlayer thickness of 0.1*10^-6mTiAl.TiAlN graded coating
exhibited the highest critical load of 57N while multilayer film
measured 51N and singlelayer film measured 47N.The thermal
stability of TiAlN film was investigated by TGD. The oxidation
resistance of TiAlN exhibited much higher onset temperature of
890C/925C compared to of TiN,TiCN and CrN. This higher oxidation
resistance of TiAlN protective layer was conjected to the fact
stable Al2O3 atits surface when the coating reaches 600 C - 925
C in air .