臺灣博碩士論文加值系統

在本實驗中，我們是以CF4作為前驅物，以固態石墨靶﹙碳純度達99.99%﹚作為陰極材料，並使用本實驗室之過濾式陰極電弧電漿沈積系統合成非晶質類鑽碳膜。其中我們藉由改變製程中的負偏壓以及CF4氣體流量來觀察非晶質碳氟薄膜﹙a-C:F films﹚性質上所發生的變化，以分辨出在何種條件之下薄膜擁有最適合應用在所需目的上的特質。本實驗裡利用X光電子能譜﹙XPS﹚來觀察此非晶質碳膜的化學鍵結行為，發現隨著負偏壓的上升，皆會導致薄膜鍵結往低能遷移的特性。另外，還利用拉曼光譜來鑑定薄膜石墨化的程度；利用低掠角的X光繞射得到薄膜的晶體結構；利用掃瞄式電子顯微鏡得到膜厚和薄膜的表面形貌，觀察到當氣體流量30 sccm和負偏壓675 V左右時，薄膜的表面形貌將從純粹的薄膜結構轉變成直徑約為10–20 nm的均勻奈米顆粒，並同時利用原子力顯微鏡﹙AFM﹚來判定薄膜的表面粗糙度變化和進一步的表面形貌，發現隨著通入氣體流量和負偏壓的上升皆會造成薄膜表面粗糙度的提升﹔利用液滴法測量接觸角，觀察在薄膜上的表面自由能變化﹔最後利用奈米檢測系統探討薄膜的機械性質。

Diamond-like carbon (DLC) films are known for their high mechanical hardness, high wear resistance, low friction coefficients, optical transparency, electrical resistivities, besides, have extensively applications in many areas such as the electronic devices, high precise mechanisms, etc. Even though the incorporation of fluorine into DLC films will reduce their surface energy, don’t change their original excellent properties. The hydrophobic characteristics attach DLC films superior properties can be used in nonstick kitchenware and protective coatings for optical instruments.
The feathers of DLC films are defined by the method of production. The key point of DLC is the fraction of sp3 bonding, and it’s decided by ion energy. Via former reports, we have already know many different production process of causing different ion energy, such as direct dual ion beam deposition(DDIBD), plasma-based ion implantation (PBII), plasma-enhanced chemical vapor deposition (PECVD), filtered cathodic arc plasma system (FCAP) and others.
Filtered cathodic vacuum arc plasma system is a developed technology for depositing amorphous DLC films, It has the advantages of a high deposition rate and low deposition temperature. The cathodic arc can guarantee a good diamond-like film quality by generating highly ionized plasma (30–100%).There is a magnetic filter before the substrate, it can removes the neutrals and macro-particles that are produced by bombarding the carbon target.
This relationships between various bias voltage and CF4 flow rate of the a-C:F films were explored in this research.

目錄
ABSTRACT 4
摘要………………………………………………………………………5
第一章、 文獻回顧 6
1.1碳與類鑽碳膜 6
1.2非晶質碳氟膜簡介 8
1.3 非晶質碳氟膜的成膜機制 9
1.4 低介電材料應用 10
1.5 生醫材料應用 10
第二章、 過濾式陰極電弧電漿系統簡介 12
2.1 過濾式陰極電弧電漿系統 13
2.1.1 陰極電弧沈積原理 13
2.1.2 真空電弧 ﹙VACUUM ARC﹚ 15
2.1.3 電弧源﹙ARC SOURCES﹚ 15
2.1.4 靶座之外加磁場 16
2.1.5 大粒子過濾裝置﹙MACROPARTICLES FILTER﹚ 17
2.2 鍍膜成長機制 22
2.3 電漿與壓力的關係 24
2.4 電漿之輝光放電過程 26
2.5大粒子﹙MACROPARTICLES﹚ 28
第三章、實驗步驟及流程 29
3.1 試片準備 29
3.2 試片清洗 29
3.3 合成非晶質碳氟薄膜 --- 29
3.4 實驗流程 34
3.5 實驗參數 35
3.6 分析儀器及量測原理 36
3.6.1拉曼光譜分析(RAMAN SPECTROSCOPY) 36
3.6.2 傅立葉轉換紅外線光譜儀(FTIR) 39
3.6.3化學分析電子儀分析(ESCA) 41
3.6.4原子力顯微鏡(ATOMIC FORCE MICROSCOPY , AFM)[38] 43
3.6.5 掃描式電子顯微鏡 (SEM) 47
3.6.6 機械性質量測 49
3.6.7 接觸角﹙CONTACT ANGLE﹚量測 53
3.6.8 X光繞射 ﹙XRD﹚ 54
第四章、結果與討論 57
4.1 拉曼光譜特性分析﹙RAMAN CHARACTERIZATION﹚ 57
4.2 傅立葉轉換紅外線光譜特性分析(FTIR CHARACTERIZATION﹚ 63
4.3 X光光電子能譜特性分析﹙XPS CHARACTERIZATION﹚ 68
4.4 原子力顯微鏡特性分析(AFM CHARACTERIZATION) 74
4.5 掃描式電子顯微鏡特性分析(SEM CHARACTERIZATION) 81
4.6 低掠角X光繞射分析法﹙GLANCING INCIDENT X-RAY DIFFRACTION CHARACTERIZATION﹚ 89
4.7 奈米硬度特性分析(NANO-INDENTATION CHARACTERIZATION) 91
4.8 接觸角﹙CONTACT ANGLE﹚量測 96
第五章、 結論 99
第五章、 未來研究計畫 101
參考文獻 ……………………………………………………………102

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