臺灣博碩士論文加值系統

由於共軛高分子在主鏈上有非定域化的電子結構，這類電子結構主宰了共軛高分子的光電性質，其基本的光物理機制仍相當複雜未明，因此共軛高分子在薄膜態與液態溶劑中光電性質被廣泛的研究，本文探討激發單分子螢光時間的軌跡。由於MEH-PPV (聚[2-甲氧基-5-(2'乙基己氧基)-1, 4-对苯乙炔]) / PS (聚苯乙烯) 薄膜中，進行除潤後所產生的發光增益，有良好的應用發揮潛力，因此本文進行此實驗，實驗中使用的共軛高分子15%MEH-PPV與85% polystyrene,共同溶於由甲苯，四氫呋喃和環已酮等體積混合之溶劑後，旋塗於矽晶片或玻璃薄片的基材上。高分子薄膜厚度為20nm，當此共軛高分子薄膜進行加熱或溶劑蒸氣退火，高分子薄膜會產生除潤現象，本實驗使用熱退火進行除潤樣品之製作，我們也探討除潤過後的polarization現象和生存時間以及時間頻譜的變化,光譜對除潤造成的影響，實驗觀察中似乎沒有找到極化現象，而從生存時間我們得知樣品生存的快慢:液滴>未除潤>殘留薄膜，這種改進過後的生存時間,顯示除潤可能可以應用在比較長時間的裝置 ，而這種裝置在有機電子領域佔非常重要的領域，我們開始研究經過photo-bleaching，改變頻譜和photo-bleaching阻力的特性。

The electronic structure of conjugated polymer chains is non-localized. This electronic structure dominates the optical properties of conjugated polymers. However, the basic photo-physical mechanism is still not clear despite extensive studies of their optical properties in liquid and solid form. This paper discusses a fluorescence time trace under constant excitation of dewetted films of MEH-PPV (poly[2-methoxy, 5-(2'-ethylhexyloxy)-1, 4-phenylenevinylene]) / PS (Polystyrene) Conjugate polymer used in the experiment was 15% MEH-PPV polymer with 85% polystyrene dissolved in equal parts toluene, tetrahydrofuran and cyclohexanone.The sample was spin cast onto a silicon or glass substrate to a thickness of 20nm. Dewetting was carried out using thermal vapor annealing. We investigated the changes of emission polarization, survival time and spectrum across the dewetted sample.We did not find any polarization effect.Concerning survival time fast and slow, we found Droplet> pristine film>residual film. This improved lifetime suggests that dewetting may be useful for making longer lived devices，its effects on device lifetime are of crucial importance in the field of organic electronics，we have investigated both the resistance to photo-bleaching and spectral changes during photo-bleaching

摘要…………………………………………………………………… iii
Abstract………………………………………………………… iv
誌謝………………………………………………………………… vi
目錄………………………………………………………………… vii
圖目錄………………………………………………………………….. xii
表目錄……………………………………………………………… xvi
第一章 介紹……………………………………………… 1
1-1 前言…………………………………………………………… 1
1-1-1 何謂共軛高分子……………………………………… 1
1-1-2 共軛高分子物理性質 3
1-1-3 何謂dewetting…………………………… …………….......6
1-1-4 光學顯微鏡的發展…………………………… ……………..7
1-1-5 共焦顯微鏡之發展…………………………… ……………..8
1-1-6 何謂共焦顯微鏡…………………………… ……………...9
1-2 研究動機及目的……………………………………………… 11
1-2-1 觀察除潤(dewetting)反應後的發光增益………… ………11
第二章 實驗步驟與方法 13
2-1 材料及薄膜的配置……………………………………… 13
2-2 玻璃清洗過程……………………………………………… 14
2-3 除潤(dewetting)製作方法………………………… 16
2-4 實驗設備描述(optical system)………………………………… 17
2-4-1如何測量樣品極化方法… 18
2-4-2系統的錯誤以及校正……………………… 19
2-4-3 共焦顯微鏡(spot size)……………………… 24
第三章 實驗結果 25
3-1定義公式 25
3-2標準條件(實驗參數)…………………………… 26
3-3整理樣品細節和準備事項………………………… 27
3-4共焦顯微鏡系統架構……………………………… 28
3-5如何取得數據…………………………… 29
3-6數據整合…………………………………… ………………31
3-6-1共焦顯微鏡背景光源…………………………… …....….32
3-6-2極化現象…………………………… …....….33
3-6-3聚焦平面…………………………… …....….36
3-7 AFM 數據…………………………………… ………………38
3-8 AFM 討論:矽晶片 vs 玻璃………………… ………………39
3-9面積數據: 2維掃描影像(低功率掃描) ………………… ……40
3-9-1未Photo-Bleaching的強度………………… ……40
3-9-1-1比較培煒論文的頻譜………………… ……40
3-9-1-2未 Photo-Bleaching PL 頻譜………………… …41
3-9-1-3 PL Spectra(矽晶片vs玻璃; 除潤/未除潤)……… …42
3-9-1-4 程式選擇………………… ……43
矽晶片未除潤:全部(Total)………………… ……43
玻璃未除潤:全部(Total)………………… ……44
矽晶片除潤:全部(Total): droplet, residual, total……… ……45
玻璃未除潤:全部(Total)droplet, residual, total……… …………..46
3-9-1-5手動選取強度區域(矽晶片) ……… 47
3-9-1-6手動選取強度區域(玻璃) ……… ……48
3-9-1-7點(point)intensity:矽晶片 48
3-9-1-8點(point)intensity:波璃 50
3-9-1-9 總結:相關強度……… …………..51
3-9-1-10討論:液滴於強度區域大小的相關性(矽晶片)……… ..52
3-9-1-11液滴於強度全部區域大小的相關性(矽晶片)……… ….53
3-9-1-12討論:液滴於強度區域大小的相關性(玻璃)……… 54
3-9-1-13液滴於強度全部區域大小的相關性(玻璃)……… ……55
3-9-1-14總結:液滴大小的相關性……… …………..56
3-9-1-15討論:counts / nm (wafer data) ……… …………..57
3-9-1-16討論:counts / nm (Glass data) ……… …………..58
3-9-1-17討論:PL determined increase vs Confocal的比較…… 59
3-10未 Photo-Bleaching PL 頻譜… 60
3-10-1問題與技術…………………………… 60
3-10-2光學系統… 61
3-10-3γ(relative efficiency of 2 channels) 計算…… 62
3-10-4 γ (relative efficiency of 2 channels) 計算…… 63
3-10-5面積 PL Spectrum…………………………… 64
3-10-5-1 矽晶片 vs 玻璃:[除潤/未除潤] …………… 64
3-10-6 程式選擇 …………………………… 65
3-10-6-1 矽晶片(By Program) …………………………… 65
3-10-6-2 玻璃(By Program) …………………………… 66
3-10-7手動選取 PL 區域 (矽晶片) …………… 67
3-10-8手動選取 PL 區域(玻璃) ……………… 68
3-10-9點(point) PL:矽晶片 …………………………… 69
3-10-10點(Point) PL:玻璃 …………………………… 70
3-10-11總結: 相關頻譜…………………………… 71
3-10-12討論: 液滴於頻譜區域大小的相關性…………… 72
3-10-13討論:不同系統的差異性…………………………… 73
3-10-14討論: Confocal vs PL Spectrometer的比較……………… 74
3-11生存時間…………………………… 75
3-12目的…………………………… 75
3-13矽晶片…………………………… 76
3-13-1未除潤與除潤生存時間的比較…………………… 76
3-13-2殘留薄膜的生存時間…………………………… 77
3-13-3液滴於生存時間區域大小的相關性…………………… 78
3-14 玻璃…………………………… 79
3-14-1未除潤與除潤生存時間的比較…………………… 79
3-14-2殘留薄膜的生存時間…………………………… 80
3-14-3液滴於生存時間區域大小的相關性…………………… 81
3-15總結: 比較未除潤和除潤與殘留薄膜的生存時間……… 82
3-16矽晶片vs 玻璃 :Average Survival Time………………… 83
3-17討論:(全部560nm 相關的效率)……………… 84
3-18經過 Photo-Bleaching生存時間的頻譜位移… 85
3-19為什麼要研究改變頻譜?… 85
3-20我們為什要要選擇頻譜位移的分析?… 86
3-21頻譜分析的技術… 87
3-22光學系統… 88
3-23 矽晶片… 89
3-23-1 S(t) 未除潤… 89
3-23-2 S(t) 液滴… 90
3-23-3矽晶片液滴於s(t)區域大小的相關性… 91
3-23-4 S(t) 殘留薄膜… 92
3-24 玻璃… 93
3-24-1 S(t) 未除潤… 93
3-24-2 S(t) 液滴… 94
3-24-3矽晶片液滴於s(t)區域大小的相關性… 95
3-24-4 S(t) 殘留薄膜… 96
3-25 總結: S(t) 矽晶片vs 玻璃 … 97
3-26 矽晶片vs 玻璃 :平均s(t) … 98
3-27 討論:s(t)結果 … 99
第四章 總結與討論 100
4-1 100
4-2 101
4-3 … 101
4-4 … 102
4-5… 102
第五章 下一步(未來展望) 103
參考文獻 104
附錄 …………………………………………………...107

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