臺灣博碩士論文加值系統

本研究中利用磁控濺鍍法並控制氬氣與氮氣的比例來製備氮化鉭單層與多層薄膜。當氬氣與氮氣比為18:2時，薄膜呈現柱狀晶的結晶結構，而當比例為12:8時，則呈現非晶結構。從X光繞射分析中得知，結晶的氮化鉭薄膜有(200)的結晶優選方向，然而非晶的氮化鉭薄膜則沒有明顯的繞射峰而呈現非晶狀態。利用結晶與非晶的氮化鉭薄膜交互堆疊形成多層薄膜，並且控制不同的厚度與比例，並將所有薄膜的總厚度控制約為1微米。當總數為50層時，呈現出較平滑的結構。然而在其他多層薄膜系統中，在薄膜頂端均會產生柱狀晶結構。在真空環境下，氮化鉭單層薄膜的熱穩定性均可以達到600 oC。而在大氣環境下熱處理，所有的薄膜系統均會產生氧化現象。硬度方面，單層結晶的氮化鉭薄膜具有最高的硬度與楊式模數。多層氮化鉭薄膜有較低的硬度與楊式模式是因為添加較軟的非晶層的因素。在刮痕與磨耗測試方面，單層薄膜呈現出較差的附著性與較高的磨擦係數，相較之下，多層薄膜則擁有較佳的附著性與較低的磨擦係數。在腐蝕測試方面，非晶的單層氮化鉭薄膜，因為結構的因素使其具有較佳的抗腐蝕能力，而單層的結晶氮化鉭薄膜與多層薄膜，因為其結構與缺陷的影響，使其抗腐蝕能力降低。因此，薄膜系統中非晶的氮化鉭薄膜擁有較佳的抗腐蝕能力。

The single layer and multilayer Tantalum nitride, TaN are fabricated by magnetron sputtering technique. With Ar/N2 gas flow ratio control, TaN layers are manipulated with amorphous and crystalline structures. The Ar/N2 gas flow ratio of the single layer TaN at 18/2 triggers the columnar crystalline structure, yet at Ar/N2 12/8, the TaN coating shows an amorphous feature. The c-TaN have the (200) preferred orientation, while the a-TaN shows no peak from X-ray pattern analysis. The multilayer TaN coatings are then produced by alternating stacking of c-TaN and a-TaN layers with various bilayer thickness and ratios. The overall coating thickness is controlled around 1 μm. When the total number of layers is 50, it shows the smooth structure. However, the other multilayer coatings show the columnar structure at upper portion of the coatings. The single layer TaN coating shows the good thermal stability up to 600 oC in the vacuum air. All coatings at 600 oC air annealing exhibit significant Ta2O5 formation. The c-TaN have higher hardness and Young’s modulus than the other coatings. The multilayer TaN coating has lower hardness and Young’s modulus due to soft a-TaN phase incorporation. In scratch and wear tests, the single layer show a poor adhesion and higher friction coefficient, on the contrary, the multilayer TaN coating show the better adhesion and lower friction coefficient as compared. The single layer a-TaN show the higher Ecorr and the lower Icorr owing to it structure feature. The c-TaN and multilayer TaN coatings show less wrrosive effectiveness since c-TaN and columnar structure provide layer defects for chemical attacks. That means the amorphous structure of TaN is beneficial to the corrosion behavior for the single and multilayer TaN coatings.

摘要...........................................................I
Abstract......................................................II
Contents......................................................III
Table List....................................................V
Figure Caption................................................VI
Chapter 1 Introduction......................................1
1.1 Background................................................1
1.2 Material Systems..........................................1
1.3 Critical Issues...........................................2
1.4 Objective.................................................2
Chapter 2 Literature review...................................4
2.1 Surface engineering.......................................4
2.1.1 Surface Modification....................................5
2.1.2 Surface treatment.......................................5
2.1.3 Surface coating.........................................5
2.1.4 Composite surface technology............................6
2.1.5 Nano surface engineering technology.....................6
2.2 Sputter technology........................................6
2.2.1 Plasma theory...........................................6
2.2.2 Sputter theory..........................................6
2.2.3 Magnetron sputtering....................................7
2.2.4 Sequentially sputtering.................................7
2.3 TaN coatings..............................................8
2.3.1 Introduction of hard coatings...........................8
2.3.2 Introduction of TaN coatings............................8
2.3.3 Microstructure and phase characteristics................9
2.3.4 Mechanical properties...................................10
2.3.5 Thermal stability and Oxidation.........................11
2.3.6 Corrosion behavior......................................11
2.4 Multilayer coating........................................11
Chapter 3 Experimental Procedures.............................35
3.1 Sputtering Deposition of TaN coatings....................35
3.1.1 Substrate preparation...................................35
3.1.2 Parameter of sputtering fabrication.....................35
3.2 Heat treatment process....................................36
3.3 Measurements and analysis.................................36
3.3.1 Composition analysis....................................36
3.3.2 Phase identification....................................36
3.3.3 Microstructure investigation............................36
3.3.4 Hardness evaluation.....................................37
3.3.5 Scratch and wear test...................................37
3.3.6 Oxidation test..........................................37
3.3.7 Electrochemical tests...................................38
Chapter 4 Results and discussion..............................45
4.1 TaN single and multilayer fabrication and condition.......45
4.2 Microstructure of TaN coatings............................45
4.3 Thermal stability of TaN coatings.........................50
4.3.1 Vacuum annealing........................................50
4.3.2 Air annealing...........................................50
4.4 Hardness of TaN coatings..................................52
4.5 Tribological behavior of TaN coatings.....................53
4.5.1 Scratch test............................................53
4.5.2 Wear test...............................................54
4.6 Corrosion behavior of TaN coatings........................55
Chapter 5 Conclusion.........................................114
References...................................................116
Appendix.....................................................121

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