臺灣博碩士論文加值系統

本論文使用聚焦離子束(Foucsed ion beam,FIB)、磁控濺鍍機(Magnetron Sputter)做出雙曲特性的多層膜結構，以及使用FIB蝕刻奈米天線，提高場增強與方向性。

在實驗中使用掃描式電子顯微鏡(Scanning electron microscope , SEM)確認結構的厚度、均勻性、表面平坦，確保天線中間間距距離。

樣品測量方面包括光吸收波長(Absorption)來確認結構上的光吸收波段；探討不同厚度超穎材料結構鍍上螢光材料後，測量光激發螢光(Photoluminescence , PL)及時間解析光激發螢光(Time-Resolved Photoluminescence , TRPL)。

實驗結果發現利用聚焦離子束在雙曲超穎材料(hyperbolic metamaterial)基板上製作奈米天線結構後鍍上螢光材料的PL強度與矽基板鍍上螢光材料DCJTB後，相比之下增強了17倍，螢光生命週期減少46%。

實驗證明了奈米天線之局部表面電漿共振能夠提高螢光分子震盪強度，使PL強度增強，螢光生命週期減少。

In this paper, Fourier ion beam (FIB)、magnetron sputtering (Magnetron Sputter) are used to make the multilayered multilayer structure, and the antenna is strengthened by FIB etching to improve the field enhancement and directionality.

We firstly usedScanning electron microscope (SEM) ,respectively to observe the surface roughness , thickness and the uniformityof the substrates.Ensure the width between the nano antenna.

Secondly ,we used Photoluminescence to measure the light of absorption wave in the structure. For investigating the influences of photoluminescence (PL) and time-resolved photoluminescence (TRPL),we deposited the fluorescent dye "DCJTB" on the different thickness of hyperbolic meta-material .

We observed that the PL intensity ofnano-antenna on HMM sample which deposited 75 nm DCJTB was increased about 17 times, and the lifetime could be shortened about 46% comparing with deposited 75nm DCJTB on Silicon.

We demonstrated that the localized surface plasma of nano-antenna on HMM samples could enhance the resonance vibration strength of fluorescent molecules. Therefore, when the PL intensity is increased, the lifetime is shortened at the same time.

摘要 I
ABSTRACT II
目錄 III
圖目錄 VII
表目錄 X
第一章簡介 1
1-1表面增強拉曼散射 1
1-2金屬增強螢光簡介 4
1-3超穎材料 5
1-4-雙曲超穎材料 7
1-5研究動機 9
第二章 儀器介紹 12
2-1掃描式電子顯微鏡 12
2-2高真空磁控濺鍍機 13
2-2-1濺鍍原理 13
2-2-2濺鍍操作步驟 13
2-2-3濺鍍機抽高真空步驟 14
2-2-4濺鍍機鍍膜步驟 15
2-3 模擬軟體(COMSOL Multiphysics)...................... 17
2-4聚焦離子束及掃瞄式電子顯微系統（Dual Beam Focused Ion Beam & Scanning Electron Microscope System）..................18
2-4-1聚焦.............................................. 18
2-4-2離子...............................................19
2-4-3聚焦離子槍(Ion Column).............................20
2-4-4離子束與物質作用...................................26
2-4-5表面濺擊(Sputting).................................27
2-4-6 FIB成橡原理.......................................28
2-4-7掃描參數(Scan parameter)...........................30
2-4-8 Gas .............................................. 31
2-5 FDTD有限差分時域法..................................32
2-6熱蒸鍍...............................................33
2-7光激發螢光光譜(Photoluminescence,PL).................35

第三章 樣品製作 38
3-1基板清洗 38
3-2磁控濺鍍製作雙曲超穎材料(HMM)基板 39
3-3利用聚焦離子束(FIB)蝕刻天線 39
3-4製作隔絕層 39
3-5蒸鍍有機染料........................................ 39
第四章實驗結果與討論 40
4-1利用磁控濺鍍機製作奈米天線基板SEM圖 40
4-2利用磁控濺鍍機製作奈米天線在HMM基板SEM圖........... 43
4-3計算結構材料是否為雙曲超穎材料....................... 44
4-4聚焦離子束蝕刻天線SEM圖 47
4-5奈米天線SEM圖利用工程及科學應用繪圖軟體(Origin)......48
4-6奈米天線結構之光激發螢光(PL)MAPPING與三維色階圖 49
4-7奈米天線結構之光激發螢光(PL)光譜與時間解析光激發螢光
(TRPL)量測 51
4-8奈米天線結構在HMM基板之光激發螢光(PL)光譜與時間解析光
激發螢光(TRPL)量測 55
4-9COMSOL模擬矽-銀多層膜之吸收圖 57
第五張 結論 58
參考文獻 59

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