臺灣博碩士論文加值系統

統計製程控制（SPC）是目前較常利用於半導體廠的製程品質管制方法，在單一製程結束後經由量測機台蒐集晶圓電性測試值，採用管制圖的統計原理探討晶圓品質及特性，一但發現製程異常的情形，便能在下一批貨生產之前予以修正，製作出符合品質要求之產品。但是這樣的品質管制僅能在批貨與批貨間作改變，對於因為機台處於不穩定的環境所生產的晶圓，必須作補救措施，甚至於整批貨廢棄不用等情形，並無法有效的防範。不僅增加產品成本，降低機台使用效能（OEE），還延遲交貨予顧客的時間。因此本論文提出一個採用統一模式語言（UML）為分析與設計方法，針對統計製程控制在單一製程中無法有效管理的缺點，發展出一套半導體機台之即時性監控系統。文中先探討半導體廠之製程控制，以及GEM機台特性，依照所收集之需求進行分析與研究，利用動態模式圖進行系統設計，最後於MS Windows NT環境下以Visual BASIC 5.0為發展工具架構出系統程式。本論文主要貢獻有：(1)支援SPC需求之GEM通訊問答分析，(2)即時性機況監控系統之功能分析及塑模，(3)可勾構即時性監控系統的實現，及(4)即時性機況飄移警示通報介面。

Statistical Process Control (SPC) is more common way in the process quality control of semiconductor manufacture. The measure machine collects the value of wafer acceptance test after a single step process. After that, assume the run rule to discuss to discuss the quality and attribute of wafer. Once discover the unusual step process situation, the products which are achieved its quality request. However, such a quality control only can be changed in cassette-to-cassette, because it can''t do forceful preventing bad wafer in a unstable environment and lose Overall Equipment Effectiveness (OEE). Therefore, our thesis presents that use Unified Modeling Language (UML) as a analysis and design method aiming at the bug when SPC in single step process can''t mange effectively and developing the Generic Equipment Monitoring System (GEMS) for semiconductor manufactures. In this thesis, we discuss the process control for semiconductor manufacture and the attribute of GEM equipment then obey the request doing analysis and study and use the interaction diagram, statechart diagram and activity diagram, doing system design and structuring the system program. The main contribution of this thesis includes (1) Support GEM communication scenario for SPC request. (2) Analyses and model the function of real-time equipment monitoring system. (3) Achieve configurable real-time monitoring system. (4) Complete the real-time informing alarm interface.

第1章 緒論1
1.1 半導體機台之使用效能1
1.2 製程程序控制4
1.3 半導體機台之監控介面標準6
1.4 論文審閱9
1.5 本文貢獻及架構11
第2章 半導體機台即時監控功能需求14
2.1 統計製程控制（SPC）14
2.2 機台製程之即時監控15
2.2.1 半導體機台監控15
2.2.2 ModelWare/RT16
2.3 GEM機台特性18
2.4 即時性監控系統功能規格24
2.4.1 即時抽樣考量24
2.4.2 功能規格24
第3章 設計方法27
3.1 採用之數學模式整理27
3.1.1 UML塑模方法論之探討28
3.1.2 類別與物件圖29
3.1.3 使用案例圖32
3.1.4 互動圖34
3.1.5 狀態圖35
3.1.6 活動圖37
3.1.7 佈署圖38
3.2 系統分析介紹38
3.2.1 GEMS功能需求39
3.2.2 建立使用案例圖40
3.2.3 尋找使用案例圖中的物件與類別42
3.2.4 建立互動圖48
3.2.5 建立狀態圖51
3.2.6 建立活動圖53
3.2.7 建立佈署圖55
第4章 即時性監控系統之實現57
4.1 UML模式之實現57
4.2 GEMS系統之程式架構61
4.2.1 檢視模組63
4.2.2 資料庫模組64
4.2.3 網路介面模組65
4.2.4 收集模組66
4.2.5 設定模組67
4.2.6 圖形化顯示模組68
第5章 實例驗證71
5.1 系統架構圖71
5.1.1 可勾構即時異常警報處理系統72
5.1.2 機台模擬74
5.2 展示功能76
5.3 展示流程78
5.3.1 追蹤內容定義80
5.3.2 即時性圖形顯示85
5.3.3 告警處理87
5.3.4 歷史資料88
第6章 結論90
6.1 本論文貢獻90
6.2 後續研究92
附錄A：各模組之間通訊格式94
A.1 收集模組傳送給顯示模組94
A.2 GEMS傳送給CREAMS96
參考文獻98
中英文詞彙對照表102

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