臺灣博碩士論文加值系統

半導體工業製程中，對於矽晶圓表層覆膜製程多利用旋轉塗佈方式(
Spin coating) 進行, 而覆膜用流體原料包括光阻液(Photoresist)﹑聚
亞醯銨(Polyimide) 等之價格均非常昂貴；故在覆膜過程中注入液量及噴
塗速度對液膜形成之反應結果有相當重大之影響。如何在不殘留不穩定手
指狀(Instability fingers)情況下，減少噴入液量而能達成均勻覆膜(
Uniform film)之目的，則為本實驗分析之重點。 本實驗分析中，量
測覆膜用光阻液(Photoresist)之表面張力及黏度等基本性質，並利用自
行設計製作之自動注液裝置變更改變注入液量﹑注入速度等參數以探討其
於旋轉覆膜過程中所造成的影響；而以快速攝影技巧擷取塗覆過程影像供
結果數據分析，並依此數據尋找出液膜噴塗完整與否，繪出之分界圖，提
供半導體業界改進覆膜製程之參考； 以期減少注入液量降低製造成本
及機台閒置時間。

Spin coating is a process utilized by microelectroincs
industry to from athin uniform film of photoresist or polyimide
on silicon wafers.Since boththe prices of photoresist and
polyimide are rather high, controlling thequantity of liquid and
the dispensation rate in the spin coating process is a critical
work. This project is aimed to reduce the quality of
liquidwhile keeping the stable uniform film without resulting in
the so-called instability fingers. In this project an
experimental equipment to simulatethe process of spin coating is
constructed. We first measure the viscosityand surface tension
force of liquids used in such process.Then the qualitiesand the
dispensation rate of these liquids are varied to analyze
theireffects in spin coating process. Here a high speed camera
is used to recordall the proceedings. We deduce an
experience diagram no matter with or without instability fingers
characteristics in spin coating processbase on the experimental
data. Such a formulation is utilized to search the least
quantities of the coating liquid to form a stable uniform film
without resulting in the instability fingers.