臺灣博碩士論文加值系統

　　最近幾年隨著微機電技術已經發展非常成熟，且將微機電技術推向奈米科技時代。因為在奈米尺度下我們可以得到更小且密度更高的特徵尺寸。 然而在製作奈米尺度等級的線寬時，受到傳統物理光學繞射極限的限制。所以學者們紛紛研究不同的新穎技術來克服傳統光學繞射限制。而其中一種新穎方法是奈米壓印技術，其在奈米結構與奈米製程上有其重要的應用，是當今奈米科技中的重要研究課題。許多學者聲稱雷射輔助奈米壓印技術更被譽為下一世代最具潛力的技術之一。
　　本研究在雷射輔助奈米壓印中，先製作出有微米級及奈米級圖案的母模，接著利用準分子雷射當作加熱的矽表面的熱源，將母模的圖案完整的轉移到矽的表面上。這種快速在矽表面成形出微米級及奈米級圖案的方法不需要用到傳統曝光、顯影和蝕刻的製程。本文探討雷射能量、壓印力量、壓印的尺寸對於壓印深度的相互影響；這基本參數對雷射輔助奈米壓印應用上是一項重要的研究。
　　為了使雷射輔助奈米壓印有效率，建議使用雷射能量密度0.6 ~1.0 J/cm2而壓印力量為150~1200 MPa能在矽上轉印出完美結果。並且藉由著奈米凹模的模子可以在矽表面成形出微米級及奈米級的結構。

　　In recent years, the commercialization of Micro Electro-Mechanical System (MEMS) technology has been successfully developed. The transition of MEMS technology to nano fabrication is a solution to the growing demand for smaller and highdensity feature sizes in the nanometer scale. However, it is difficult to achieve critical dimensions at sub-wavelength scale using traditional optical lithography techniques due to the optical diffraction limit. Therefore, developed several techniques overcome this diffraction limit and simultaneously achieve the massive and similar patterning. One of the methods involves that the Nano-imprinting lithography (NIL) is now a promising method for nano-patterning and nano-fabrication. Many researchers claimed that Laser Assited Direct Imprinting ( LADI ) technology is a promising technology for for the next generation lithography tools.
　　This study focuses on the micro- and nano-scaled fabrication process of Laser Assited Direct Imprinting as well as fabrication of quartz molds. Either micro- or nano- scaled patterns on the quartz molds were successfully transformed to silicon surface using a single excimer laser pulse as the heating source. This rapid technique for fabricating micro- and nano-scaled structures in the silicon does not require spin coating photo-resist, photolithography, and chemical etching. Crucial parameters in LADI process such as the laser fluence (J/cm2), the contact pressure (MPa), feature size and the imprinted depth were studied and optimized systematically. These essential parameters in the experiments can be optimized to improve LADI simulation study.
　　In order to make the LADI more efficiently, the 0.6~1.0 J/cm2 laser energy and 150~1200 MPa imprinted pressure on the substrate are required. Consequently, the LADI technique has a great potential for the nanopatterning and nanostructures fabrication by the nano-scaled concave quartz mold.

中文摘要....................................................I
ABSTRACT..................................................II
ACKNOWLEDGEMENT.......................................IV
CONTENTS................................................VI
LIST OF TABLES.............................................IX
LIST OF FIGURES.............................................X
SYMBOLS DESCRIPTIONS...................................XIX

Chapter 1 INTRODUCTION
1-1 Preface-------------------------------------------------------------------------------1
1-2 Literature Survey-------------------------------------------------------------------1
　1-2-1 Hot embossing nano-imprint lithography (HE-NIL)---------------------------2
　1-2-2 Soft imprint lithography (SIL)---------------------------------------------------4
　1-2-3 Step and flash imprint lithography (SFIL)--------------------------------------5
　1-2-4 Laser assisted direct imprint (LADI)--------------------------------------------8
1-3 Motivation and Objective----------------------------------------------------------9
1-4 Thesis Outline----------------------------------------------------------------------10
Chapter 2 EXPERIMENTAL SET-UP AND MOLD FABRICATIONS
2-1 Experimental Instruments and Equipments------------------------------------12
2-2 Mold Fabrications-----------------------------------------------------------------19
　2-2-1 Fabricated micro-scaled quartz molds----------------------------------------19
　2-2-2 Fabricated nano-scaled quartz molds-----------------------------------------28
2-3 Laser Assisted Direct Imprinting (LADI)--------------------------------------34
　2-3-1 Excimer laser micro-machining system--------------------------------------33
　2-3-2 Designed working platform---------------------------------------------------38
　2-3-3 Process for LADI--------------------------------------------------------------40
Chapter 3 RESULTS AND DISCUSSIONS
3-1 Results for Micro-Imprinting ---------------------------------------------------42
　3-1-1 Comparisons on pressure------------------------------------------------------65
　3-1-2 Comparisons on laser fluence-------------------------------------------------66
　3-1-3 Comparisons on feature size--------------------------------------------------66
3-2 Results for Nano-Imprinting -------------------------------------------------------67
　3-1-2 Comparisons on pile-up effect ---------------------------------------------71
3-3 Discussions---------------------------------------------------------------------------72
Chapter 4 CONCLUSION AND FUTURE PERSPECTIVE
4-1 Conclusion---------------------------------------------------------------------------78
4-2 Future Perspective------------------------------------------------------------------79
REFERENCES----------------------------------------------------------------------------80
VITA-----------------------------------------------------------------------------------83

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