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Microelectromechanical systems (MEMS) is predicted to be the
star offuture industry. By means of the IC technology, the
mechanical properties ofsilicon can be applied to many fields in
our life. Microsensors and microactuators are the typical
applications in this field, among the otherthings. The key point
of this thesis focuses on the fabrication processes of the three
electrodes capacitive pressure sensor. A detailed study of
processes will be showed, especially in cavity formation and p+
layer formation.Nevertheless, we also mention an introduction
about the design considerations. Finally, to improve the study
of capacitive pressure sensor, we give a sincerethinking in
chapter four.
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