[1]W. Shockley and H. Kroemer, “Theory of Wide-gap Emitter for Transistors”, IRE, vol. 45, pp. 1535, 1998.
[2]Shu-Han Chen, Student Member, Sheng-Yu Wang, Rei-Jay Hsieh, and Jen-Inn Chyi, Senior Member, “InGaAsSb/InP Double Heterojunction Bipolar Transistors Grown by Solid-Source Molecular Beam Epitaxy”, IEEE Electron Device Letters, vol. 28, No. 8, August, 2007.
[3]C. C. McAndrew, et al, “VBIC95, The Vertical Bipolar Inter-Company Model”, IEEE J. Solid-State Circuits, vol. 31, pp. 1476-1483, October, 1998.
[4]H. K. Gummel, and H. C. Poon, “An integrated charge control model of bipolar transistors”, Bell Syst. Tech. J., 49, pp. 827-852, 1970.
[5]Shu-Han Chen, Sheng-Yu Wang, Rei-Jay Hsieh and Jen-Inn Chyi, “ Low turn-on and high-speed InP/InGaAsSb/InGaAs HBTs with an InGaAsSb Base”, Department of Electrical Engineering, National Central University Chung-Li, Taiwan, R.O.C. , p. 17.
[6]黃國威、鄧裕民、管瑞豐、陳良波, “BJT之VBIC模型化技術”, 國家奈米元件實驗室,奈米通訊,第六卷第四期42。
[7]Agilent Technologies, “IC-CAP Modeling Reference”, pp. 6-52, 2000.
[8]張芷娟,磷化銦異質接面雙極性電晶體之等效電路模型,國立雲林科技大學,碩士論文, 2005。[9]William Liu, “HANDBOOK OF III-V HETEROJUNCTION BIPOLAR TRANSISTOR”, John Willy & Sons, pp. 1088-1090, 1998.
[10]C. C. McAndrew and L. W. Nagel, “SPICE Early Modeling”, Bipolar/BiCOMOS Circuits & Tech. Meeting, pp. 144-147, 1994.
[11]徐慧芬,“VBIC模型應用於不同尺寸異質接面雙載子電晶體之研究”,國立雲林科技大學,碩士論文,2005。[12]陳駿逸, “VBIC等效模型對異質接面雙載子電晶體之研究”,國立雲林科技大學,碩士論文,pp. 40-44,2003。
[13]李文雄, “磷化銦異質接面雙極性電晶體熱阻與崩潰效應之特性分析”,國立雲林科技大學,碩士論文,2007。[14]G. M. Kull, L. W. Nagel, S.-W. Lee, P. Lloyd, E. J. Prendergast, and H. K. Dirks, “A Unified Circuit Model for Bipolar Transistors Including Quasi-Saturation Effect”, IEEE Trans. Electron Devices, vol. 32, pp. 1103-1113, 1985.
[15]William Liu, “Handbook of III-V Heterojunction Bipolar Transistors”, John Wiley & Sons, pp. 238-241, 1998.
[16]F. Lin, B. Chen, T. Zhou, B. L. Ooi, P. S. Kooi, “Characterization and Modeling of Avalanche Multiplication in HBTs”, Microelectronics Journal, vol. 33, pp. 39-43, 2002.
[17]HBT Model Manual, Global Communication Semiconductor, Inc., 1999.
[18]D. A. Neamen, “Semiconductor Physics and Device”, 3th ed. McGraw. Hill, pp. 398, 2003.
[19]Kenji Kurishima, Hiroki Nakajima, Takashi Kobayashi, Yutak Matsuoka andTadao Ishibashi, “Fabrication and Characterization of High-Performance InP/InGaAs Double-Heterojunction Bipolar Transistors”, IEEE Trans. Electron Devices, vol. 41, No. 8, pp. 1319-1326, August, 1994.
[20]劉佳慧,“異質接面雙載子電晶體熱效應之研究”,國立雲林科技大學,碩士論文,2002。[21]D. E. Dawson, A. K. Gupta, and M. L. Salib, “CW Measurement of HBT Thermal Resistance”, IEEE Trans. Electron Devices, vol. 39, pp. 2235-2239, October, 1992.
[22]J. R. Waldrop, K. C. Wang, and P. M. Asbeck, “Determination of Junction Temperature InAlGaAs/GaAs Heterojunction Bipolar Transistors by Electrical Measurement”, IEEE Trans. Electron Devices, vol. 39, pp. 1248-1250, May, 1992.
[23]N. Bovolon, P. Baureis, J.-E. Müller, P. Zwicknagl, R. Schultheis, and E. Zanoni, “A Simple Method for The Thermal Resistance Measurement of AlGaAs/GaAs Heterojunction Bipolar Transistors”, IEEE Trans. Electron Devices, vol. 48, pp. 1846-1848, August, 1998.
[24]Hong Wang, Hong Yang, K. Radhakrishnan and Chee Leong Tan, “On the Thermal Resistance of Metamorphic and Lattice-Matched InP HBTs: A Comparative Study”, Indium Phosphide and Related Materials Conference, IPRM. 14th, pp. 177-180, May, 2002.
[25]S. P. Marsh, “Direct Extraction Technique to Derive the Junction Temperature of HBT’s Under High Self-Heating Bias Conditions”, IEEE Trans. Electron Device, vol. 47, No. 2, pp. 288-291, 2000.
[26]S. P. Marsh, “Thermal Impedance Variation of HBT’s at High Junction Temperature Operating Conditions”, IEEE Trans. Electron Device, pp. 634-637, 1999.