臺灣博碩士論文加值系統

由於精密陶瓷為高硬度且高脆性之材料，而陶瓷的拋光都是使用游離磨料進行，所以加工時間非常冗長。有鑑於此，本研究開發一種導磁性膠體磨料，來對精密陶瓷進行拋光研究。實驗試片以氧化鋁陶瓷(Al2O3)做為實驗工作物。並以自製之特殊NC刀把，安裝於CNC綜合加工機之主軸上，並將導磁性之高分子膠體磨料吸附導磁性之NC刀把工作端，利用磁力來拘束結合式的膠體磨料，對工件表面進行膠體磁力研磨加工。
本研究先結合田口氏實驗法來建立膠體磁力研磨的最佳化參數， 藉由加工路徑、磨料粒徑、主軸轉速、膠體硬度、鋼砂號數、路徑間隙、進給率與Z軸進給等加工參數，來觀察加工後試片表面的表面粗糙度的改變，和各加工參數的研拋效能影響。並利用單因子實驗法以不同粒徑之磨料、純導磁性介質與磁極距離，來探討對於膠體磁力研磨之效能，且利用不同加工方法驗證本實驗之可行性。田口實驗法之最佳化中以磨粒粒徑、路徑間隙、Z軸進給、加工路徑為影響較大之參數。經由單因子實驗結果，能在加工30分鐘後表面粗糙度可由Ra0.316μm降至 Ra0.089μm，表面粗糙度改善率可達到72%。驗證膠體磁力研磨確實具有優異的研拋效能。

For the hard and brittle properties of the precision ceramic, a gel abrasive with ferromagnet was developed to polish this product. Silicone gel was chose as the medium that used to mix the ferromagnet and abrasive in this study, and a magnetic tool was designed to adsorb and fix the ferromagnetic gel abrasive in the gel magnetic abrasive finishing (GMAF).
In this experiment, Taguchi method was first applied to find the optimal parameters in GMAF, surface roughness of the workpiece was evaluated by this method. Then the polishing efficiency was discussed by the abrasive mesh and the gap between the gel abrasive and workpiece. The results shown that the abrasive mesh, the distance between two polishing path, the feed rate of Z axis and the machining path of numerical control were four important factors that would dominate the surface roughness of the workpiece. The surface could be finished from 0.316 mRa roughness to 0.089mRa roughness during 30 minutes; the roughness improvement rate of this process would reach 72%. Therefore, the excellent polishing ability of the GMAF has been improved in this study.

中文摘要...... i
英文摘要... ii
誌謝............................................................... iii
目錄........ iv
表目錄.... vii
圖目錄.... viii
符號說明 x
第一章 序 論 1
1.1前言....... 1
1.2研究動機與目的 3
1.3文獻回顧 4
1.3.1磁力拋光方面 4
1.4論文架構 9
第二章 研究原理與方法 10
2.1膠體磁力研磨加工原理 10
2.2精密陶瓷概論 12
2.2.1單一化合物的氧化物陶瓷 15
2.2.2精密陶瓷成型技術 16
2.2.3精密陶瓷加工現況 20
2.3表面粗糙度 22
2.3.1表面粗糙度表示法 23
2.4田口式試驗法 26
2.4.1田口式實驗法與傳統實驗之差異 27
2.4.2品質特性質 29
2.4.3影響因子 31
2.4.4穩健設計 33
第三章 實驗方法與設備 35
3.1實驗設備 35
3.2實驗材料 43
3.2.1實驗試片 43
3.2.2導磁性高分子膠體磨料 44
3.3實驗方法 46
3.3.1田口式實驗法參數規劃 46
3.3.2單因子實驗法參數規劃 49
3.4精密陶瓷之導磁性膠體磨料加工機制 51
3.5實驗流程圖 53
第四章 結果與討論 54
4.1田口式試驗法與驗證 54
4.1.1田口法試驗結果 54
4.1.2田口法實驗最佳化參數驗證結果 56
4.2單因子試驗法實驗結果 59
4.2.1磨料粒徑對於研拋效能之影響 59
4.2.2純導磁性介質研拋效能之影響 62
4.2.3其他加工方法研拋效能之影響 64
4.2.4磁極距離對於研拋效能之影響 66
第五章 結論與未來展望 68
5.1結論....... 68
5.2未來展望 70
參考文獻 72
簡歷..............................................................................................................................76

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