臺灣博碩士論文加值系統

本論文使用自組裝之微波電漿噴射化學氣相沉積系統配合自行設計的升降載台，來合成平滑且低粗糙度之大面積奈米鑽石薄膜，並於此真空系統內利用機械運動引入的方式，將馬達直線及旋轉運動導入系統內，再利用速度控制往復行程以得到均勻之奈米鑽石薄膜。而本真空系統之往復式載台能以動態方式成長大面積奈米鑽石薄膜鍍膜，並利用微電腦單晶片89S51作為主控器，搭配CNY70光耦合感測器調整馬達之轉速，並以此真空系統之移動載台，探討合成大面積奈米鑽石薄膜各區域之變化形式。
本論文首先使用超音波震盪法混合奈米鑽石粉末以及金屬粉末（Ti、Al）以促進鑽石薄膜的成核，以降低合成奈米鑽石膜之表面粗糙度。結果顯示，在不同金屬粉末混合鑽石粉末溶液所做之前處理，能有效的提高鑽石薄膜的成核密度以及降低表面粗糙度TiD(~13 nm) < AlD(~15 nm) < DP(~17 nm)。
由研究結果顯示在較低基材移動轉速（48 rpm）下，其厚度最厚。而利用不同區域不同轉速控制往復式載台可縮小其鍍膜所造成厚度不均差距（48 rpm + 72 rpm、48 rpm + 96 rpm），最後利用不同轉速加上時間延遲（48 rpm + 5秒延遲、48 rpm + 10秒延遲）可得到大面積奈米鑽石膜之均勻厚度。

In this study, smooth and uniform large area nanodiamond thin film (NCD) were synthesized by using home-made microwave plasma jet chemical vapor deposition (MPJCVD) system with mechanical feed through. Linear motion reciprocating carrier, which used microcomputer single-chip to control the motor speeds, was added into MPJCVD system. The CNY70 photosensor was employed as a switch to change the different speeds which ensure uniform NCD films growth. Finally, the regional larger NCD film’s variations by reciprocating carrier system have been investigated.
The ultrasonication pretreatment processes were used with nanodiamond powder mixture nanoametal powder solutions (Ti, Al) which aim to reduce the NCD films surface roughness. Both TiD and AlD pretreatment processes have significantly enhanced the formation of NCD films nuclei and lower surface roughness.
From obtained results, lower reciprocating speed (48 rpm) was insured highest thickness. Moreover, through using various speeds for different areas could reduce the non-uniform large area NCD films thickness. The SEM results of as-grown large area NCD films revealed that highest uniform were attain at higher reciprocation speed (96 rpm) and 10 second of delay time.

中文摘要 i
英文摘要 ii
誌　謝 iii
目　錄 iv
表　目　錄 vi
圖　目　錄 vii
第一章　緒論 1
1.1 機電整合在真空鍍膜之應用探討 1
1.1.1 前言 1
1.1.2 真空鍍膜系統之微波電漿束化學氣相沉積 1
1.1.3 真空鍍膜系統之馬達控制原理 2
1.2 真空鍍膜系統之鑽石鍍膜應用 3
1.3 研究動機 8
1.4 研究範疇 8
第二章　文獻回顧與基本理論 9
2.1 機電整合之真空電漿系統回顧 9
2.1.1 真空電漿系統所需具備之特性 9
2.1.2 微波輔助化學氣相沉積系統 10
2.1.3 成長大面積之鑽石薄膜 13
2.1.4 微波電漿束化學氣相沉積（MPJCVD）系統設計分析 15
2.1.5 MPJCVD系統之同步旋轉-升降載台真空引入 18
2.2 人工鑽石發展史 19
2.3 碳的結構 20
2.3.1 鑽石結構 21
2.4 不同鑽石薄膜之分類 22
2.4.1 微米晶鑽石薄膜（MCD） 22
2.4.2 奈米晶鑽石薄膜（NCD） 23
2.4.3 超奈米晶鑽石薄膜（UNCD） 24
2.5 鑽石薄膜成核影響 24
2.5.1 基材對於成核之影響 25
2.5.2 前處理對於成核之影響 27
2.6 光放射光譜臨場診斷技術 32
2.6.1 電漿中電子溫度計算 33
第三章　研究方法與實驗步驟 35
3.1 實驗流程 35
3.2 鍍膜設備簡介 36
3.3 實驗步驟與細節 39
3.3.1 鑽石薄膜之成核前處理 39
3.3.2 超音波震盪法-奈米鋁粉末之成核前處理 40
3.3.3 使用往復式載台合成大面積鑽石薄膜 41
3.3.4 移動式載台驅動器及馬達 42
3.4 薄膜特性分析 44
3.4.1 掃描式電子顯微鏡（FE-SEM） 44
3.4.2 原子力探針顯微鏡（AFM） 46
3.4.3 拉曼光譜儀（Raman spectrum） 48
3.4.4 場發射穿透式電子顯微鏡（HR-TEM） 48
3.4.5 光放射光譜儀（Optical emission spectroscope） 49
第四章　結果與討論 50
4.1 往復式移動載台速度調變控制分析及原理 50
4.1.1 往復式移動載台 50
4.1.2 往復式移動載台速度控制調變 50
4.2 成長大面積奈米鑽石薄膜之超音波震盪前處理 53
4.2.1 奈米鑽石粉末超音波震盪前處理 54
4.2.2 奈米鑽石粉末混合奈米鈦粉末超音波震盪前處理 55
4.2.3 奈米鑽石粉末混合奈米鋁粉末超音波震盪前處理 56
4.3 不同粉末溶液前處理製程綜合討論 62
4.3.1 三種溶液超音波震盪前處理AFM表面形貌分析 62
4.3.2 三種溶液超音波震盪前處理拉曼鍵結分析 64
4.3.3 穿透式顯微鏡TEM影像分析 65
4.3.4 製程成本分析 68
4.3.5 超音波震盪前處理結論 69
4.4 使用往復式移動載台成長大面積奈米鑽石薄膜 72
4.4.1 使用往復式移動載台動態成長奈米鑽石薄膜 72
4.4.2 往復式載台對於大面積奈米鑽石薄膜之影響 76
4.4.3 速度調變大面積奈米鑽石薄膜之SEM表面形貌分析 82
4.4.4 速度調變延遲大面積奈米鑽石薄膜之SEM表面形貌分析 85
第五章　結論 88
參考文獻 90
作者簡介 95

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