臺灣博碩士論文加值系統

本論文主要研究導光層厚度對平面波導濾波器之影響。在此研究中，將以全像術干涉技術和微模轉印技術在高分子上製作光柵結構。此次平面波導光柵結構與以往不大一樣，以往打出的雷射光點為圓形，這次改變了反射角度，使光點打出來變成一直線的，將製程改變得更加簡單方便也使原本要打許多點的方式如今也只要打一點便能達到。光柵先在正光阻上藉由微影製程形成，在將其轉印到PDMS模仁上；在這步驟之後，將以PDMS高分子濾波器的模型(pattern)轉印至高分子上。在高分子上元件得以保存較長的時間且此翻模技術可達到大量生產的效果及製作出低損耗的高分子光波導元件，其光學傳輸特性可由Tunable Laser頻譜分析儀所量測得知。研究中以原子力顯微鏡(AFM)、掃描式電子顯微鏡(SEM)與光學量測等方法觀察與紀錄實驗之結果，並研究探討。

This thesis is to study the effect of the thickness of the guiding layer on the planar waveguide. In this thesis, a procedure for fabricating a high aspect ratio periodic structure on a UV polymer at submicron order using holographic interferometry and molding processes is described. First, holographic interferometry using a laser was used to create the master of the periode line structure on an i-line sub-micron positive photoresist film. Final line pattern on a UV polymer was formed from casting against the master mold. Finally, a different thickness of SU8 polymer was spun on the polymer grating to form a planar waveguide. The optical transmission characteristics were measured in terms of Tunable Laser spectrum analyzer. The grating profiles of the devices were observed using SEM and AFM system.

摘要 I
Abstract II
致謝 III
目錄 IV
圖目錄 VII
表目錄 IX
第一章 緒論 1
1.1 前言 1
1.2 研究目的與方法 3
1.3 論文架構 4
第二章 研究背景理論探討 5
2.1 光波導理論 5
2.2 光波導元件介紹與探討 8
2.3 軟式微影技術 10
2.3.1 微接觸印刷(microcontact printing, μCP) 11
2.3.2 毛細管微成形(micromolding in capillaries, MIMIC) 12
2.3.3 微轉印成形(microtransfer molding, μTM) 12
2.3.4 複製成形(replica molding, REM) 13
2.4 PDMS特性探討與製程條件 13
2.4.1 PDMS特性探討 13
2.4.2 PDMS製程條件 14
2.5 繞射光柵概述 14
2.5.1 光柵的結構 14
2.5.2 光柵的種類 15
2.5.3 光柵的製作及其相關文獻 18
第三章 布拉格光柵元件研製 21
3.1 實驗流程 21
3.1.1 高分子布拉格光柵元件架構說明 22
3.2 全像術干涉微影技術 22
3.3 全像干涉微影之布拉格光柵理論 26
3.4 光學全像干涉系統架構與干涉角度計算 29
3.5 光柵黃光微影製程 31
3.5.1 光柵製程結果探討： 36
3.6 光柵轉印製程 38
3.6.1 光柵翻模製程結果探討 42
第四章 平面波導導光層厚度分析量測 46
4.1 導光層光頻譜分析量測 46
4.2 導光層不同厚度分析結果 48
4.3 導光層不同厚度的應用 49
第五章 結論 51
參考文獻 52
Extended Abstract 55

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