臺灣博碩士論文加值系統

本研究主要利用雙離子束濺鍍系統，在矽基板上製備鉭/鈷/氧化鈷薄膜，並利用X-ray繞射分析確認其晶格結構、穿透式電子顯微鏡(TEM)進行晶粒大小、成分結構與薄膜厚度…等分析，並與XRD的分析結果進行比對驗證。鉭/鈷/氧化鈷薄膜之鉭層具有體心立方(B.C.C)結構，晶格常數為3.31A；鈷層為六方最密堆積(H.C.P)結構，晶格常數a＝2.51A,c＝4.05A；氧化鈷層為面心立方(F.C.C)結構，晶格常數為4.27A。晶粒大小為介於5~16nm。

在磁性質方面，使用震動樣品磁力計(VSM)磁性質量測室溫下(T=298K)、外加磁場沿著平行膜面及垂直膜面量測之磁滯曲線圖，可得知試片於平行膜面量測時達到飽和所需的外加場較垂直膜面量測時來的小，由此可知此試片有平行膜面方向的易磁化軸。另外，在室溫下Ta/Co/CoO薄膜無交換偏壓(Hc∼6.8Oe)發生，而T在180K時，因溫度低於反鐵磁層之涅爾溫度(Co∼290K)，故交換偏壓有些微的提升(Hex∼3.6 Oe；Hc∼7 Oe)，具有較明顯的交換耦合之現象。

The composite films of Ta/Co/CoO on Si substrate was prepared by dual ion-beam deposition technique. The structural and magnetic properties of the composite films were studied by X-ray diffraction(XRD),transmission electron microscopy(TEM),
Vibrating sample magnetometer(VSM),respectively.

XRD results have shown that Ta layer consisted of B.C.C. with a＝3.31 A, Co layer consisted of H.C.P. with a＝2.51A,c＝4.05A, and CoO layer consisted of F.C.C. with a＝4.27A.TEM results have shown that the grain size of polycrystalline composite films range from 5 to16nm.

Magnetic properties at room temperature (298K) and magnetic field along the parallel and perpendicular to the film surface have been measured,and the results showed that the easy axis of specimen is in-plane.In addition, Ta/Co/CoO film exhibits no exchange bias field (Hc∼6.8 Oe) at room temperature, but at 180K,the temperature below the antiferromagnetic Neel temperature (Co∼290K),a slightly increased exchange bias field (Hex~ 3.6 Oe) was observed.

摘要.........................................................I
Abstract..................................................II
目錄.......................................................III
圖目錄.........................................................V
表目錄........................................................IX
第一章 緒論
1-1 前言.........................................................1
1-2 磁性物質介紹.........................................................2
1-3 磁異向性........................................................10
1-4 交換耦合機制........................................................12
1-5 應用........................................................23
1-6 文獻回顧........................................................27
1-7 動機與目的........................................................31
第二章 實驗
2-1 實驗設計........................................................33
2-2 實驗流程........................................................34
2-3 材料選用........................................................35
2-4 基材前處理........................................................36
2-5 薄膜製備........................................................36
2-6 離子束濺鍍系統........................................................37

第三章 分析儀器原理與介紹
3-1穿透式電子顯微鏡(TEM).....................................................44
3-2 X光繞射儀(XRD) ....................................................49
3-3 震動樣品磁力計(VSM) ....................................................52
第四章 結果與討論
4-1 X-ray繞射分析(XRD) ....................................................54
4-2 穿透式電子顯微鏡(TEM)微結構分析........................................................55
4-3 震動樣品磁力計(VSM)磁性量測........................................................58
第五章 結論........................................................61
參考文獻........................................................62

中文：
[1] 金重勳主編,”磁性技術”手冊，中華民國磁性技術協會。
[2] 杜怡君、張毓娟、翁乙壬等九人，國立台灣大學化學系，磁性基本特性及磁性材料應用。
[3] 胡裕民、黃榮俊, ”鐵磁/反鐵磁金屬薄膜之間的交換磁異向性”,物理雙月刊26卷6期(2006)。
[4] 張慶瑞，旋轉的新世紀-自旋電子傳輸與自旋電子學，”物理雙月刊”，26卷6期(2000)。
[5] 陳姵希，國立中興大學碩士論文(2012)。
[6] 李正中，”薄膜光學與鍍膜技術”藝軒圖書出版社(2001)。
[7] 龔志榮、駱榮富,”電子顯微鏡教材大綱”。
[8] 林麗娟,”X光繞射原理及其應用”,工業材料86期。
[9] 汪建民主編”材料分析”, 中國材料科學學會。

英文：
[10] W.P.Meiklejohn,C.P.Bean,Phys.Rev.,102,1413(1956).
[11] W.P.Meiklejohn,J.Appl.Phys.,33,1328(1962).
[12] D.Mauri,H.C.Siegmann,J.Appl.Phys.,62,3047(1987).
[13] A.P.Malozemoff,Phys.Rev.B.,35,3679(1987).
[14] N.C.Koon,Phys.Rev.Lett.,78,4865(1997).
[15] T.C.Schulthess and W.H.Butler,Phys.Rev.Lett.,81,4516(1998).
[16] A.E.Berkowitz,Kentaro Takano,J.Magn.Magn.Mater.,200,552(1999).
[17] J.Nogues,Ivan K.Schuller,J.Magn.Magn.Mater.,192,203(1999).
[18] B.D.Cullity,L,D Granam ,”Introduction to Magnetic Materials” (2009,2nd).
[19] Nicola A.Spaldin,”Magnetic materials”,(2003).
[20] David Jiles,” Introduction to Magnetism and magnetic materials”,Champman & Hall.
[21] M.A.Plonus,婁祥麟譯,「應用電磁學(下冊)」,乾泰圖書(1985)。
[22] J.A.C.Bland and B.Heinrich,Ultrathin Magnetic Structure I,Springer-Verlag,New York(1994).
[23] J.Nogues and I.K. Schuller, J Magn.Magn.Mater.,192,203(1999).
[24] C.Kittel,Introduction of Solid State Phys,7th ed,John Wiley & Sons inc,New York(1997).
[25] Soshin Chinkazumi著，張煦、李學養合譯，”磁性物理學”。
[26]B.Diney,V.S.Speriosu,S.S.P.Parkung,B.A.Gurney,D.R.Wilhoit,and D Mauri,Phys.Rev.,43,1297(1991).
[27] J.Nogues,J.Sort,V Langlais,Skumryev,
S.Surinach,J.S.Munoz.M.D.Baro
,Physics Reports.,422.65(2005).
[28] A.P.Malozemoff,Phys.Rev. B, 37,7673(1988).
[29] A.P.Malozemoff,J.Appl.Phys.,63,3874(1988).
[30] U.Nowak and K.D.Usadel,Phys.Lett.,B66,014430(2002).
[31] B.Beckmann,U.Nowak,and K.D.Usadel,Phys.Rev.Lett.,91,187201-1(2003).
[32] M.N.Baibich,J.M.Broto,A.Fert,F.Nguyen Van Dau and F.Pctroff,Phys.Rev.Lett.,61,2472(1998).
[33] R.R.Katti,proceedings of the IEEE.91,687(2003).
[34] M.Gruyters and D.Riegel,Phys.Rev.B,63,052401(2000).
[35] K.Vahaplar,S.Tari,H.Tokuc,and S.Okur.J.Vac.Sci.
Technol.B 2112(2009).
[36] R.C.Weast,”Handbook of Chemistry and Physics”,CRC Press,Inc.,(1986)
[37] R.C.O’Handley”Modern Magnetic Materials”,John Wiley and Sons Inc.,2000.
[38] J.J.Cuomo and S.M.Rossnagel,H.R.Kaufman,”Handbook of ion beam rocessing technology：principles,deposition,film modification,and synthesis”,Noyes Publication(1989).
[39] H.R. Kaufman,R.S.Robinson,”End Hall Ion Source”,J.Vac.Sci.Technol.A,5(3),2081(1987).
[40] Milton Ohring,”Materials Science of Thin Films,
Deposition and Structure”,(2002).
[41] C.Weissmantle,”Ion Beam Deposition of Special Film Structure”,Vac.Sci.Technol.,18,179(1989).
[42] T.C.Huang,G.Lim,F.Parmigiani,and E.Kay,J.Vac.Sci.Technol.A,3,216(1985).
[43] R.A.Roy,D.Yee,and J.J.Cuomo,J.Vac.Sci.Technol.A,6,1621(1988).
[44] David B.Williams and C. Barry Carter,” Transmission Electron Microscopy”Press(1996).
[45] C.H.Lai,P.H.Huang,J.Appl.Phys.,95,7222(2004).
[46] Bruce M.Moskoeitz,Hitchhhiker's Guide to magnetism.
[47] Foner's.,”Versatile and Sensitive Vibrating-Sample Magnetometer” ,The Review
of Scientific Instrument,Vol.30,No.7,pp.584-557(1959).
[48] David Jiles,”Magnetism and Magnetic Materials”,Champman & Hall,(1991).