|
[1] C.P.Wen, “Coplanar waveguide:A surface strip transmission line suitable for nonreciprocal gyromagnetic device appliactipn,” IEEE Trans.Microwave theory tech,vol.17.pp.1087-1090,Dec.1969.
[2] Raju,G.G.“Dielectrics in Electric Fields,” Marcel Dekke.Inc,New York,2003.
[3] 翁敏航,射頻被動元件設計,東華書局,2005
[4] Reyes.A.C, El-Ghazaly.S.M, Dorn.S.J, Dydyk.M, Schroder.D.K, Patterson.H, “Coplanar Waveguides and Microwave Inductors on Silicon Substrates,” IEEE Transactions on Microwave theory and techniques,vol.43, no.9,September 1995.
[5] Ru-Yuan Yang, Cheng-Yuan Hung, Yan-Kuin Su, Min-Hang Weng, Hung-Wei Wu, “Loss Characteristics of Silicon Substrate with different Resistivities,” Microwave and Optical technology letters,vol.48,no.9,September 2006.
[6] Reyes.A.C, El-Ghazaly.S.M, Dorn.S.J, Dydyk.M, “Temperature and Bias Effects in High Resistivity Silicon Substrates,” 1996 IEEE MTT-S Digest .
[7] Reyes.A.C, El-Ghazaly.S.M, Dorn.S.J, Dydyk.M, Schroder.D.K, “Silicon as a Microwave Substrates,” 1994 IEEE MTT-S Digest .
[8] Yunhong Wu, Harold S.Gamble, B.Mervyn Armstrong, Vincent F.Fusco, J.A.Carson Stewart, “SiO2 Interface Layer Effects on Microwave Loss of High Resistivity CPW line,” IEEE Microwave and guided wave letters,vol.9, no.1,January 1999.
[9] K.T.Chan, Albert Chin, S.P.McAlister,“Low RF Noise and Power Loss for Ion-Implanted Si having an Improved Implanation Process,” IEEE electron device letters,vol.24, no.1,January 2003.
[10] C.J.Chen, “Study of Improving Microwave Loss and Crosstalk of High Resistivity Silicon and Implementing Microwave Passive,” National Cheng Kung University 2011.
[11] R.N.Simons,“Coplanar Waveguide Circuits Components and System,” Wiley,2001.
[12] D.Lederer, J.P.Raskin, “Effective resistivity of Fully-Processed SOI Substrates,”Solid State Electronics,vol.49,pp.491-496,2005.
[13] W.Heinrich,“Quasi-TEM description of MMIC coplanar lines including conductor-loss effects,” IEEE Trans.Microwave theory,tech.vol.41.pp.45-52,jan.1993.
[14] D.M.Pozar,“Microwave Engineering,” seconded. Wiley, New York, 1998.
[15] C.C.Ho, B.S.Chiou, “S-Parameters-Based High Speed Signal Characterization of Al Interconnect on Low-k Hydrogen Silsesquioxane-Si Substrate,” Microelectric Engineering,vol.83, no.3,pp.528-535, 2006.
[16] Y.K.Koutsoyannopoulos, Y.Papananos, “Systematic analysis and modeling of integrated inductors and transformers in RFIC design,” IEEE trans.Circuits Syst.-II.vol.47.no.8.pp699-713,Aug 2000.
[17] Sang-Myeon Han, Joong-Hyun Park, Hee-Sun Shin, Young-Hwan Choi, Min-Koo Han, “High Performance Nanocrystalline Si TFT Fabricated at 150℃ Using ICP-CVD,” Electron Devices Meeting, 2005. IEDM Technical Digest. IEEE International.
[18] Lydia L.W.Leung, Wai Cheong Hon, Kevin J.Chen, “Low Loss Coplanar Waveguides Interconnects on Low Resistivity Silicon Substrate,” IEEE transactions on components and packaging technologies ,vol.27, no.3,September 2004..
[19] C.J.Chen, R.L.Wang, Y.K.Su, T.J.Hsueh, “A Nanocrystalline Silicon Surface-Passivation Layer on an HR-Si Substrate for RFICs,” IEEE electron device letters,vol.32, no.3,March 2011.
[20] Dong-Won Kang, Joong-Hyun Park, Sang-Myeon Han, Min-Koo Han, “The Effects of Nanocrystalline Silicon Thin Film Thickness on TopGate Nanocrystalline Silicon Thin Film Transistor Fabricated at 180℃,” Journal of semiconductor technology and science,vol.8, no.2,June 2008.
[21] Sung Hwan Won, Jae Hyung Youn, Jin Jang,“Study of polycrystalline Silicon Films Deposited by Inductively Coupled Plasma Chemical Vapor Deposition,” Journal of the Korean Physical Society ,vol.39,no.1.pp.123-126,July 2001
[22] R.L.Wang, Y.K.Su, C.J.Chen T.J.Hsueh, “Nanocrystalline Silicon Thickness Dependence of Transmission characteristics of CPWs on Surface-Passivates High Resistivity Silicon Substrates,” Electronics letters 29th September 2011, vol.47.no.20.
[23] P.Baine, M.Jin, H.S.Gamble, B.M.Armstrong, D.Linton, F.Mohammed, “Cross-talk suppression in SOI Substrates,” Solid-State Electronics,vol.49.pp.1461-1465,2005.
[24] J.Craninckx, M.S.J.Steyaert, “A 1.8GHz Low-Phase-Noise CMOS VCO using Optimized Hollow Spiral Inductors,” IEEE J.Solid-State Circuits,vol.32.no.5.pp.736-744,May 1997.
|