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研究生:吳柏蒼
研究生(外文):Po-Tsang Wu
論文名稱:Ni80Fe20/Ir(111)/Ni80Fe20三層膜之磊晶成長與磁耦合研究
論文名稱(外文):Studies of the Epitaxial Growth and Magnetic Coupling of Ni80Fe20/Ir(111)/Ni80Fe20 Trilayers
指導教授:黃榮俊黃榮俊引用關係
指導教授(外文):J. C. A. Huang
學位類別:碩士
校院名稱:國立成功大學
系所名稱:物理學系碩博士班
學門:自然科學學門
學類:物理學類
論文種類:學術論文
論文出版年:2003
畢業學年度:91
語文別:中文
論文頁數:117
中文關鍵詞:巨磁阻交換耦合效應三層膜
外文關鍵詞:GMRexchange couplingsandwich
相關次數:
  • 被引用被引用:1
  • 點閱點閱:143
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  • 下載下載:10
  • 收藏至我的研究室書目清單書目收藏:0
我們使用分子束磊晶(MBE)成長晶向為fcc(111)的Ni80Fe20/ Ir/ Ni80Fe20三層膜系統來研究其界面之交換耦合行為。我們觀測到在Ni80Fe20/ Ir(tIr Å)/ Ni80Fe20三層膜(tIr = 5~40)產生異常的振盪交換耦合現象,其反鐵磁耦合的極值發生在Ir厚度為7、19、28、40 Å處,而最大的反鐵磁耦合強度在Ir厚度7 Å時為2.32 erg/cm2,但我們發現到其振盪耦合週期長度並不一致,可能與Ir(111)複雜的費米面之延展向量所造成長短週期疊加的結果。
The molecular beam epitaxy (MBE) growth fcc(111) oriented Ni80Fe20/Ir/ Ni80Fe20 trilayers were prepared to study the interlayer exchange coupling. We found that Ni80Fe20/Ir (tIr Å)/ Ni80Fe20 (tIr = 5~40) sandwich exhibit anomalous oscillatory exchange coupling strength. The antiferromagnetic (AF) peaks appear at tIr =7, 19, 28, 40 Å, and the maxima AF coupling strength is about 2.32 erg/cm2 with tIr =7 Å, however, the oscillation period is not the same, may course by the superposition of the spanning vector of the complicated Ir(111) Fermi surface.
第一章 簡介
§ 1-1前言1
§ 1-2交換耦合效應與RKKY理論3
§ 1-3近代相關文獻研究11
§ 1-4 Co/Ir多層膜之交換耦合研究14
§ 1-4-1 Study of Epitaxial Co/Ir(001) Superlattices16
§ 1-4-2 Study of Sputtering Co/Ir(110) multilayers17
§ 1-4-3 Study of Epitaxial Co/Ir(111) Superlattice18
§ 1-5 Review Articles19
【Reference】23
第二章 磁學理論簡介
§ 2-1磁性的來源24
§ 2-2磁異向性介紹26
§ 2-2-1磁晶異向性27
§ 2-2-2形狀異向性31
§ 2-2-3應力磁異向性35
§ 2-2-4交換磁異向性41
§ 2-3磁異向性的量測43
§ 2-4磁阻的簡介48
§ 2-5 GMR效應50
【Reference】56
第三章 實驗儀器介紹與實驗步驟
§ 3-1分子束磊晶系統57
§ 3-2實驗量測儀器63
§ 3-2-1 X-ray繞射儀63
§ 3-2-2磁光Kerr效應儀64
§ 3-2-3反射式高能電子繞射儀71
§ 3-2-4震動式磁力計73
§ 3-3實驗步驟74
§ 3-3-1系統真空環境的準備74
§ 3-3-2基板的準備75
§ 3-3-3樣品成長76
【Reference】77
第四章 實驗結果和討論
§ 4-0 Preparation of the Experiment78
§ 4-1 [Ni80Fe20/Ir(tIr Å)/Ni80Fe20]三層膜在Al2O3(11-20)基板之成長結構與機制81
§ 4-1-1 Study of the Surface Structure by RHEED Pattern82
§ 4-1-2 Study of the Bulk Structure by X-ray Diffraction84
§ 4-1-3 Study of the Bulk Structure by Synchrotron Radiation91
§ 4-2 改變Ir厚度對於[Ni80Fe20/Ir(tIrÅ)/Ni80Fe20]三層膜反鐵磁耦合之影響96
§ 4-3 變化Ir成長溫度對於[Ni80Fe20/Ir(tIr Å)/Ni80Fe20]三層膜反鐵磁耦合之影響105
§ 4-3-1 Growth on Al2O3(11-20) substrate107
§ 4-3-2 Growth on Al2O3(1-102) substrate112
【Reference】116
第五章 結論117
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[4.1]from “PCPDFWIN® data base v. 2.02”
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[4.5]David Jiles, Introduction to Magnetism and Magnetic Materials, p278 (1991)
[4.6]陳文娟,Ni80Fe20/Ru/Ni80Fe20三層膜磁耦合隨著Ru厚度變化之研究,成功大學物理系碩士論文(2002)
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