臺灣博碩士論文加值系統

本研究提出結合全像干涉微影技術及軟式模仁的新穎製程技術，並配合黃光微影製程光學技術，來製作非對稱耦合器光柵波導元件。
本製程中先以光學全像干涉微影技術，來製作高分子布拉格光柵元件，並以此光柵元件配合軟式印刷(soft printing)技術之微接觸成形(micro-contact printing)、毛細管成形(micromolding in capillaries)技術與複製成形(replica molding)技術來製作高分子光柵元件模仁，之後利用前述之高分子OG光柵元件模仁，以黃光微影製程之厚膜光阻製作出非對稱耦合器光柵波導元件。
本實驗會以不同轉速來控制波導的厚度,藉此來比較各波導厚度的效率。
此高分子光柵元件翻膜模仁可達到大量生產的效果，且此法具有製作容易、和低成本之優點。
研究中以原子力顯微鏡(AFM)、掃描式電子顯微鏡(SEM)與光學量測等方法觀察與紀錄實驗之結果，並研究探討。其光學傳輸特性可由光波量測系統測量得知。

In this research, we propose a novel technique of fabricating an asymmetric Bragg coupler device by using holographic technique and master molding of soft printing along with the photolithography.
First, we produce out a polymeric Bragg Grating by Holographic lithography and then carried out a master mold of a Bragg Grating associated with techniques of micro-contact printing, micro-molding in capillaries and replica molding. While successfully fabricated a master mold of polymeric Grating component, we fabricated an asymmetrical waveguide coupler on the grating using photolithography with thick film photoresist.
In this experiment, the waveguides thickness were controlled by different spinning speeds thereby, a comparison of efficiency was made in each waveguide.
It is easily to achieve the mass production, easy fabrication and low cost by using technique of lift molding of polymeric Grating.
In order to observe and record the results of this experiment accurately, we utilize the AFM (Atomic Force Microscopy) and SEM (Scanning Electron Microscopy), and its characteristic of optical transmission can be observed by an optical measuring system.

中文摘要…………………………………………………………… i
英文摘要…………………………………………………………… ii
致謝 …………………………………………………………… iii
目錄 …………………………………………………………… iv
表目錄 …………………………………………………………… vi
圖目錄 …………………………………………………………… vii
第一章 導論……………………………………………………… 1
1.1 前言……………………………………………………… 1
1.2 研究目的與方法………………………………………… 2
1.3 論文架構………………………………………………… 2
第二章 研究背景理論探討……………………………………… 4
2.1 微機電系統技術………………………………………… 4
2.2 光波導簡介……………………………………………… 6
2.3 光波導元件介紹與探討………………………………… 8
2.4 繞射光柵概述…………………………………………… 9
2.4.1 光柵的結構……………………………………………… 9
2.4.2 光柵的種類……………………………………………… 9
2.4.3 光柵的製作及其相關文獻……………………………… 10
2.5 全像干涉微影之系統架構……………………………… 12
2.6 全像干涉微影繞射光柵理論與光束入射角度推算…… 13
2.6.1 全像干涉微影之繞射光柵理論………………………… 13
2.6.2 全像干涉微影之光束入射角度推算…………………… 15
2.7 軟式微影技術…………………………………………… 20
2.7.1 微接觸印刷(microcontact printing, μCP)………… 21
2.7.2 毛細管微成形(micromolding in capillaries,MIMIC) 22
2.7.3 微轉印成形(microtransfer molding, μTM)………… 22
2.7.4 複製成形(replica molding, REM)…………………… 22
2.8 PDMS特性探討與製程條件……………………………… 23
2.8.1 PDMS特性探討…………………………………………… 23
2.8.2 PDMS製程條件…………………………………………… 23
2.9 原子力顯微鏡(AFM)介紹……………………………… 24
2.10 掃描式電子顯微鏡(SEM)介紹………………………… 27
第三章 高分子布拉格光柵元件研製…………………………… 29
3.1 高分子布拉格光柵元件之架構說明…………………… 29
3.2 高分子布拉格光柵元件製作…………………………… 29
3.2.1 光阻塗佈與光柵製作…………………………………… 30
3.3 OG 高分子光柵元件模仁製程………………………… 33
3.4 布拉格光柵深度與週期之量測………………………… 34
第四章 非對稱耦合器光柵波導元件之研製…………………… 38
4.1 非對稱耦合器光柵波導元件之架構說明……………… 38
4.2 SU8厚膜光阻特性探討………………………………… 39
4.3 非對稱耦合器光柵波導元件之厚膜光阻黃光微影製程 40
4.4 非對稱耦合器光柵波導元件之保護層製作…………… 46
4.5 非對稱耦合器光柵波導元件之拋光研磨……………… 46
第五章 非對稱耦合器光柵波導元件之量測…………………… 48
5.1 非對稱耦合器光柵波導元件之光強度量測…………… 48
5.2 非對稱耦合器光柵波導元件之光頻譜量測…………… 53
第六章 結論……………………………………………………… 57
參考文獻…………………………………………………………… 58

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