臺灣博碩士論文加值系統

　　本論文主要目的在於探討離子束沉積之純類鑽碳（a-C:H）及含氮類鑽碳（a-C:H (N)）薄膜之特性，並有系統地研究製程中氮氣體流量比例變化對薄膜結構、機械及光學性質之影響。在理論方面，我們建構一套藉由三維表面微細形貌量測儀獲得之鍍膜前後表面形貌數據，並進而求得薄膜殘餘內應力分佈的方法，此外，再由類鑽碳薄膜產生皺摺的特殊現象，也反推算出薄膜局部的楊式模數；在評估薄膜與基板附著狀態的刮痕測試上，發現各含氮類鑽碳薄膜之摩擦係數與刮痕距離之變化關係皆可明顯劃分成四區域，並以此作為本實驗判別臨界荷重的標準。
　　我們使用拉曼光譜儀、化學分析電子儀及歐傑電子儀分析薄膜之組成及鍵結，並輔以橢圓偏光儀量測其光學參數。在抗磨耗性能研究方面，使用已鍍膜之不鏽鋼薄片為下試件，鋁環為上試件相互對磨，並同時量測系統之接觸電阻值變化，藉以評估本實驗鍍膜之抗磨耗性。
由實驗結果得知，類鑽碳薄膜中含氮量愈多，雖會使得膜內的sp2鍵結量增加且消光係數升高（較不透明），但整體來講，卻有助於降低膜內的平均殘餘內應力及增進與基板的附著力。

　　The material structure , mechanical properties and tribological performances of Diamond-like carbon (a-C:H) and nitrogen-containing diamond-like carbon (a-C:N:H) films deposited by ion-beam process were studied in this thesis. The distribution of film residual stress were obtained also using the theory developed in the content. Besides, local Young’s modulus of a-C:H:N thin film can be obtained by measuring the length of film wrinkle. About scratch test, the relationship of friction coefficient and scratch length in a-C:H:N thin films could be divided into four major regions distinctly. Therefore, the critical normal load could also be decided by the criterion discussed above.
　　The films’ structure has been analysed by Raman and X-ray photoelectron spectroscopy. The optical properties, index of refraction and extinction coefficient, were measured by ellipsometer. In the study of tribological performance, aluminum ring and stainless steel flat substrate were used as upper and lower specimen respectively. In the results of experiments, nitrogen doped in Diamond-like thin film will increase the amount of sp2 bond and decrease average internal stress inside the film simultaneously.

中文摘要…………………………………………….…………...i
英文摘要……………………………………………………...ii
致謝………………………………………………………………..iii
目錄…………………………………………………….………….iv
表目錄…………………………………………………….………….vi
圖目錄…………………………………………………….…………vii
第一章緒論…………………………………………….…………..1
1-1　前言………………………………………...…………………..1
1-2　文獻回顧………………………...……………………………..1
第二章　基本理論………………………………………………….…11
　　　2-1　類鑽碳薄膜之組成及成膜機制………………11
　　　　　　2-1-1　膜之組成……….…………………………….11
2-1-2　成膜機制………..………..……………....12
2-2　鍍膜系統之基本原理……………………………………………14
　　　　　　2-2-1　離子披覆系統…………………………………14
　　　　　　2-2-2　電漿化學………………………………………15
　　　　　　2-2-3　CS無柵極離子束源..…………………………17
2-3　薄膜分析儀器之基本原理……………………………………19
　　　　　　2-3-1　歐傑電子儀及化學分析電子儀..…………19
　　　　　　2-3-2　掃描式電子顯微鏡....……..………....20
　　　　　　2-3-3　拉曼光譜儀………....………………....21
　　　　　　2-3-4　橢圓偏光儀………....………………....22
2-4　類鑽碳薄膜之拉曼光譜及ESCA分析…………………………25
　　　　　　2-4-1　拉曼光譜分析………………………………25
　　　　　　2-4-2　ESCA分析……………………....…………27
2-5　薄膜殘留內應力及量測理論……………………..…………28
　　　　　　2-5-1　薄膜內應力之產生原因……………………29
　　　　　　2-5-2　曲率法量測薄膜殘留內應力之理論..……29
2-6　薄膜附著狀態之評估-刮痕試驗...……………………...34
2-7　類鑽碳薄膜之皺摺現象及楊式模數探討……………………35
第三章　實驗方法及步驟……………………………………….…54
3-1　實驗目的………………………………………….…………54
3-2　薄膜之製鍍……………………………………….…………54
　　　　　　3-2-1　鍍膜系統設備……………………………54
　　　　　　3-2-2　實驗材料………………………………55
　　　　　　3-2-3　步驟……………………………………………55
3-3　薄膜特性分析及鑑定……………………...………………56
第四章　結果與討論……………………………………………….…65
4-1　拉曼光譜分析結果…………………………..………………65
4-2　光學性質探討：折射率（N）、消光係數（K）……………67
4-3　ESCA成分定量分析及AES縱深分析…………..………….67
4-4　附著狀態評估結果…………………………….………………69
4-5　殘留內應力分析結果…………………………………………70
4-6　以皺摺形貌估算薄膜之楊式模數……………………………72
4-7　抗磨耗性能………………………………………...………………73
4-8　綜合分析…………………………………………...………………74
第五章　結論與建議……………………………………………...123
5-1　結論……………………………………...……………..123
5-2 建議………………………………...…………….124
參考文獻………………………………………………...…125
自述…………………………………………………………...130
著作權聲明…………………………………………………...131

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