臺灣博碩士論文加值系統

抗反射薄膜之研究已經進行了許久，許多關於原理及製作的研究已經提出，但幾乎都只探討至光線垂直入射之部分，本研究的目的便是為了能夠獲得可供大角度入射所使用之理想抗反射膜。實驗中利用到光學及薄膜矩陣原理所寫成的Matlab程式進行模擬，主要是計算基板為玻璃材料，並用於可見光波段的抗反射膜層。
研究中主要以非均勻抗反射膜之結構為主進行討論，此種結構之折射率值是由空氣介質連續變化到基板，藉由分別討論膜層中之折射率分佈情形、層數多寡、膜層厚度以及起始折射率值，並進行數值模擬的過程，以期獲得擁有最佳效果之理想抗反射膜層。
經由計算許多不同折射率分佈情形後，我們得到膜層為十層時的
折射率最佳分佈曲線，在入射角80°以下之反射率皆低於0.01，而在85°時反射率約為0.05，幾乎已經達到理想抗反射膜的標準。另外我們也模擬出膜層數目為五層時的最佳分佈情形，入射角度在70°以下的反射率皆小於0.01，而此效果也明顯優於傳統四層之抗反射膜。
並且基於實際製作上的考量，我們選用較高的起始折射率值，並
將膜層數目固定為五層進行模擬，當起始折射率為1.05時，其容許
入射角度在60°-70°之間，而起始值為1.1時其容許角度在50°-60°
之間，而這些容許之入射角範圍皆明顯大於傳統之四層抗反射膜。

Researches of AR coating had been studied for a long time, but most of them focused on vertical-incident part. In this paper, we would find out the kind of ideal AR coating which could be used for every incident angle. Based on the characteristic matrix theory, we wrote the computer program to calculate the average reflectance for p- and s-polarization of different AR coating structures on the glass for visible spectral.
We designed the ideal AR coating by using of the inhomogeneous structure with refractive index changing from air to substrate. The numerical results were discussed by discussing the distribution of index change, the numbers of layers and the thickness of coatings to obtain the most effective AR coating.
After series of discussion, we obtain the best refractive index distribution for 10-layers. The average reflectance was less than 0.01 over the whole spectral region up to 80°, and its result was close to that of the ideal AR coating. we also develop the best index distribution for 5-layers structure.
For practical manufacturing, we decreased numbers of layers and raised the initial index of coating, however the effects were better than that of the traditional 4-layers AR coating. At last we brought up some methods to fabricate ideal AR coating for the future work.

總目錄
總目錄………………………………………………………………….. I
致謝……………………………………………………….………….…Ⅴ
摘要……………………………………………………………….…….Ⅵ
Abstract…………………………………………………………..…….Ⅶ
圖目錄………………………………………………..……………..…..Ⅷ
第一章 緒論…………………………………………..1
1.1抗反射膜之演進……………………………………………...1
1.2抗反射層之功用……………………………………………...1
1.3抗反射層之分類……………………………………………...2
1.4研究動機……………………………………………………..4
第二章 抗反射膜設計………………………………..5
2.1薄膜之特性矩陣……………………………………………..5
2.1.1基本假設……………………………………………….5
2.1.2兩介質間界面之穿透與反射………………………….6
2.1.3單層膜之穿透與反射………………………………….7
2.1.4多層膜之穿透與反射………………………………….8
2.1.5斜向入射……………………………………………….9
2.2導納軌跡法設計抗反射膜………………………………….10
2.2.1單層膜之導納軌跡…………………………………...10
2.2.2多層膜之導納軌跡……………………………………11
2.3由軌跡導納法設計抗反射膜………………………………..11
2.3.1單層抗反射膜之設計………………………………...11
2.3.2雙層抗反射膜之設計…………………………………12
2.3.3三層抗反射膜之設計…………………………………12
2.4 Matlab程式…………………………………………………13
第三章 抗反射膜製作………………………………14
3.1抗反射膜之選擇……………………………………………14
3.1.1單層抗反射膜…………………………………………14
3.1.2雙層抗反射膜…………………………………………15
3.1.3三層抗反射膜…………………………………………15
3.1.4四層抗反射膜…………………………………………16
3.2抗反射膜製作………………………………………………17
3.2.1實驗流程………………………………………………17
3.2.2試片清潔………………………………………………18
3.2.3光譜量測………………………………………………18
3.2.4鍍膜系統………………………………………………18
3.3分析儀器…………………………………………………….19
3.3.1光譜儀…………………………………………………19
3.3.2橢圓測厚儀……………………………………………19
3.3.3掃描式電子顯微鏡SEM………………………………20
3.3.4歐傑電子能譜儀AES…………………………………21
3.4鍍膜結果……………………………………………………21
3.4.1鍍膜參數量測…………………………………………22
3.4.2鍍膜參數討論…………………………………………22
3.4.3鍍製抗反射膜…………………………………………23
3.5鍍膜結果分析……….……………………………………..24
第四章 理想的抗反射膜……………………….26
4.1理想抗反射膜定義………………………………………….26
4.1.1基板之反射率…………………………………………26
4.1.2傳統四層抗反射膜之反射率…………………………27
4.2非均勻型抗反射膜…………………………………………..27
4.2.1線性變化之抗反射膜………………………………....27
4.2.2非線性變化折射率之抗反射膜……………………..29
4.2.3指數函數變化折射率之抗反射膜…………………..31
4.3膜層吸收的效應………………………………………….…36
4.3.1吸收膜層數目之影響………………………………..36
4.3.2吸收膜層位置之影響………………………………..37
4.3.3消光係數大小之影響………………………………..38
4.3.4結果與討論…………………………………………..39
4.4理想抗反射膜的製作……………………………………...40
4.4.1增加膜層法…………………………………………..40
4.4.2去除膜層法…………………………………………..41
4.4.3增加/去除膜層法……………………………………41
4.4.4疊加法………………………………………………..42
4.4.5製作方式之比較……………………………………..42
第五章 結論………………………………………….44
參考文獻…………………………………………………………….….46
圖…………………………………………………………………….….52
Appendix………………………………………………………………84

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