臺灣博碩士論文加值系統

本研究使用直流磁控反應性濺鍍系統製鍍WO3薄膜，藉由改變不同的製程參數，製鍍WO3薄膜，藉由一連串的分析實驗，探討WO3薄膜微結構與光學特性之關係，其中薄膜厚度由電子顯微鏡觀察薄膜剖面圖而獲得，同時藉由電子顯微鏡的能量散佈分析儀分析薄膜成分，薄膜表面粗糙度則經由原子力顯微鏡量測分析，且使用X光繞射儀分析薄膜結晶狀態，再透過變色實驗與光譜分析WO3薄膜著色態與漂白態之穿透率，發現製鍍中摻雜少量的碳，有助於增加漂白態WO3薄膜可見光範圍之穿透率，且在變色後降低其穿透率。
在分析實驗中，發現製鍍WO3C電致變色薄膜中，鎢靶以DC 150W、碳靶以DC 功率40W；氬氧比 5 sccm :5 sccm、濺鍍時間5000秒及工作壓力為20 mm Torr之條件下進行製鍍，可得到著色態與漂白態之間最大的可見光平均穿透率差異，在可見光範圍內(400 nm~700 nm)相差59.19%之穿透率變化，在波長550 nm 時， 為63.5% 、 值為0.724、CE為2.70(cm2/C)。薄膜表面粗糙鍍(Rms)在0.735nm-2.338 nm之間，且薄膜呈現非晶態。

Abstract

In this study, WO3C thin films were prepared on ITO glass substrates at room temperature by DC magnetron reactive co-sputtering deposition. The various rates of carbon–doped WO3 films were obtained by using different sputtering power for a graphite target. The relationship between microstructures and optical properties of WO3C thin films was investigated. The film thickness was decided by SEM micrographs of the cross-section morphology. The composition of the films was analyzed using an energy-dispersive X-ray spectrometer on a SEM. The rms surface roughness of the films was determined using an atomic force microscope. The crystalline structure of the films was studied using an X-ray diffractometer. We found that each transmittance in the visible-light range (400nm~700nm) of uncolored WO3C films was 76.50% and colored WO3C films was 17.31% as a small amount of carbon was doped WO3 films. X-ray diffraction analysis revealed that all the WO3C thin films were amorphous.

總目錄
中文摘要 ........................................................................................................i
英文摘要 ........................................................................................................ii
致謝 ...............................................................................................................iii
總目錄 ........................................................................................................... iv
圖目錄 ...........................................................................................................vi
表目錄 ...........................................................................................................vii

第一章 緒論 ...............................................................................................1
1.1 前言 ............................................................................................1
1.2 文獻回顧 ....................................................................................2
1.3 研究動機 ....................................................................................4
1.4 論文架構 ....................................................................................6
第二章 基本理論 .......................................................................................7
2.1電致變色基本原理 .....................................................................7
2.1.1 電致變色機制 .....................................................................7
2.1.2電致變色性質 ......................................................................7
2.2 濺鍍原理 ......................................................................................8
2.2.1 直流濺鍍原理 .......................................................................8
2.2.2 磁控濺鍍原理 .......................................................................9
2.2.3 反應性濺鍍原理 ...................................................................10
2.3 薄膜成長理論 ................................................................................11
2.4 微結構分析原理 ...........................................................................13
2.4.1 掃描式電子顯微鏡工作原理 ..............................................13
2.4.2 能量散佈分析儀工作原理 ..................................................15
2.4.3 原子力顯微鏡工作原理 ......................................................16
2.4.4 X光繞射儀工作原理 ........................................................18
第三章 實驗方法與流程............................................................................20
3.1實驗設計 ......................................................................................20
3.2 變色實驗及微結構分析 .............................................................22
3.2.1 薄膜厚度及濺鍍速率量測 ..................................................23
3.2.2 薄膜表面微結構及橫截面觀察 ..........................................23
3.2.3 成分分析 ..............................................................................23
3.2.4 薄膜表面形貌及粗糙度分析 ..............................................23
3.2.5薄膜結晶狀態分析 ...............................................................24
3.2.6 變色實驗 ..............................................................................24
3.2.7 薄膜穿透率量測分析 ..........................................................24
第四章 結果與討論....................................................................................25
4.1不同碳靶濺鍍功率製鍍WO3C薄膜 .......................................25
4.1.1 光譜分析結果 ...................................................................26
4.1.2 掃描式電子顯微鏡分析......................................................31
4.1.3電子顯微鏡的能量散佈分析儀...........................................35
4.1.4 表面粗糙度分析 ................................................................36
4.1.1 X-ray繞射分析 ...................................................................39
4.2不同濺鍍時間製鍍WO3薄膜 ...................................................40
4.2.1 光譜分析結果 ....................................................................41
4.2.2 掃描式電子顯微鏡分析......................................................45
4.2.3電子顯微鏡的能量散佈分析儀...........................................48
4.2.4 表面粗糙度分析 ................................................................48
4.2.1 X-ray繞射分析 ...................................................................50
4.3電致變色元件的製作....................................................................51
第五章 結論.............................................................................................. ..53
5.1 總結..................................................................................................53
參考文獻.........................................................................................................54

圖目錄
圖1.3.1電致變色元件結構圖 ...............................................................................5
圖1.3.2 電致變色元件摻雜碳結構圖 ..................................................................5
圖2.2.1 磁控濺鍍結構與電子運動路徑 ..............................................................10
圖2.2.2 反應性濺射之模型 ..................................................................................11
圖2.3.1 薄膜物質分子團在基材表面上成長分佈的情形 ..................................13
圖2.4.1掃描式電子顯微鏡結構 ...........................................................................14
圖2.4.2 電子束與試片交互作用 ..........................................................................15
圖2.4.3 能量散佈分析儀示意圖 ..........................................................................16
圖2.4.4 原子力顯微鏡的示意圖 ..........................................................................18
圖2.4.5 低掠角X光繞射儀原理示意圖 .............................................................19
圖3.1.1 直流磁控反應濺鍍系統 .........................................................................20
圖3.1.2反應性濺鍍系統示意 ..............................................................................21
圖3.1.3 實驗規劃 .................................................................................................22
圖3.2.1變色實驗之架構圖 ..................................................................................24
圖4.1.1不同碳靶濺鍍功率之WO3C薄膜穿透率圖 ..........................................26
圖4.1.2摻雜碳之WO3薄膜實圖比較 .................................................................31
圖4.1.3不同碳靶濺鍍功率製鍍 WO3C薄膜之濺鍍速 .....................................32
圖4.1.4不同碳靶濺鍍功率之WO3C薄膜剖面圖與表面形貌 ..........................33
圖4.1.5碳靶濺鍍功率40W製鍍WO3C薄膜組成..............................................35
圖4.1.6不同碳靶濺鍍功率製鍍 WO3C薄膜之成分分析 .................................36
圖4.1.7 不同碳靶濺鍍功率製鍍 WO3C薄膜之表面粗糙度 ............................37
圖4.1.8 不同碳靶濺鍍功率之WO3C薄膜X-ray繞射分析圖 ..........................40
圖4.2.1 不同濺鍍時間之WO3C薄膜光譜圖 ......................................................41
圖4.2.2不同濺鍍時間之WO3C薄膜實圖比較 ...................................................44
圖4.2.3不同濺鍍時間之WO3C薄膜濺鍍速率 ...................................................46
圖4.2.4不同濺鍍時間之WO3C薄膜剖面圖與表面形貌 ...................................47
圖4.2.5不同濺鍍時間之WO3C薄膜成分分析 ...................................................48
圖4.2.6不同濺鍍時間之WO3C薄膜表面粗糙度 ...............................................49
圖4.2.7 不同濺鍍時間之WO3C薄膜X-Ray繞射分析圖 .................................51
圖4.3.1 WO3C/Ta2O5著色與漂白穿透率光譜圖 ..................................................52
圖4.3.2 元件膜層結構示意圖 ...............................................................................52

表目錄
表1各種過渡金屬元素在電致變色材料的分類.......................................................2
表2各類製備電致變色之方法 ...............................................................................3
表3分析儀器及量測項目對照表 ...........................................................................23
表4不同碳靶濺鍍功率之WO3C薄膜實驗參數 ..................................................25
表5 不同碳靶濺鍍功率之WO3C薄膜厚度 .........................................................32
表6 不同碳靶濺鍍功率製鍍 WO3C薄膜之成分組成..........................................35
表7 不同碳靶濺鍍功率之WO3C薄膜表面粗糙度 .............................................37
表8 不同濺鍍時間之WO3C薄膜實驗參數 .........................................................41
表9 不同濺鍍時間之WO3C薄膜厚度 .................................................................46
表10 不同濺鍍時間之WO3C薄膜表面粗糙度 ...................................................49

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