臺灣博碩士論文加值系統

本論文主要是研究以簡單複製製程來製作高分子波長濾波器。在此研究裡，將以全像術干涉技術和微模轉印技術在高分子上製作光柵結構。接著高分子波長濾波器將由兩階段微模技術來製作，主要的模仁將先在負光阻上形成，然後再將其模型轉移到PDMS模仁上；在這步驟之後，將以PDMS高分子濾波器的模型(pattern)轉印至高分子上。此翻模技術可達到大量生產的效果及製作出低損耗的高分子光波導元件，其光學傳輸特性可由Tunable Laser頻譜分析儀所量測得知。

Abstract
This thesis describes a procedure to replicate a polymeric wavelength filter. In this work, the grating structure on a polymer is fabricated first using holographic interferometry and micro-molding processes. The polymeric wavelength filters are produced by a two-step molding process where the master mold is first formed on a negative tone photoresist and subsequently transferred to a PDMS mold; following this step, the PDMS silicon rubber mold was used as a stamp to transfer the pattern of the polymeric wavelength filters onto a UV cure epoxy. Initial results show good pattern transfer in physical shape.
Use soft molding techniques to fabricate the low loss polymer optical waveguides and Large Scale production. The optical transmission characteristics were measured in terms of Tunable Laser spectrum analyzer. The grating profiles of the devices were observed using SEM and AFM system.

目錄
中文摘要 ………………………………………………………… i
英文摘要 ………………………………………………………… ii
誌謝 ………………………………………………………… iii
目錄 ………………………………………………………… iv
圖目錄 ………………………………………………………… vi
表目錄 ………………………………………………………… viii
第一章 緒論…………………………………………………… 1
1.1 前言…………………………………………………… 1
1.2 波導元件發展與研究動機…………………………… 2
1.3 論文架構……………………………………………… 4
第二章 研究背景理論探討…………………………………… 5
2.1 光波導理論…………………………………………… 5
2.1.1 耦合器理論…………………………………………… 7
2.1.2 雙波導耦合器模態理論……………………………… 9
2.2 光波導元件介紹……………………………………… 11
2.3 繞射光柵概述………………………………………… 14
2.3.1 光柵的結構…………………………………………… 14
2.3.2 全像光柵的分類……………………………………… 15
2.3.3 光柵結構製程技術…………………………………… 17
2.4 高分子加工技術之軟式微影技術…………………… 17
2.4.1 微接觸印刷…………………………………………… 18
2.4.2 毛細管微成形………………………………………… 20
2.4.3 微轉印成形…………………………………………… 20
2.4.4 複製成形……………………………………………… 21
2.5 PDMS特性探討與製程條件…………………………… 21
2.5.1 PDMS特性探討………………………………………… 21
2.5.2 PDMS製程條件………………………………………… 22
第三章 布拉格光柵元件研製………………………………… 23
3.1 實驗流程……………………………………………… 23
3.1.1 高分子布拉格光柵元件架構說明…………………… 24
3.2 全像術干涉微影技術………………………………… 24
3.3 全像干涉微影之布拉格光柵理論…………………… 27
3.4 光學全像干涉系統架構與干涉角度計算…………… 30
3.5 布拉格光柵黃光微影製程…………………………… 32
3.5.1 布拉格光柵製程結果探討…………………………… 36
3.6 布拉格光柵轉印製程………………………………… 38
3.6.1 光柵翻模製程結果探討……………………………… 41
第四章 高分子非對稱布拉格耦合元件研製………………… 45
4.1 高分子非對稱布拉格耦合元件架構說明…………… 45
4.2 SU-8厚膜光阻特性探討 ……………………………… 45
4.3 非對稱布拉格耦合元件之厚膜光阻黃光微影製程… 48
4.3.1 SU-8厚膜光阻與OG高分子光柵基板特性探討……… 53
4.4 高分子非對稱布拉格耦合元件模仁製程…………… 55
4.4.1 OG高分子非對稱布拉格耦合元件模仁結果探討…… 58
4.5 高分子非對稱布拉格耦合元件之導光層製作……… 61
第五章 高分子非對稱布拉格耦合元件量測………………… 64
5.1 非對稱布拉格耦合元件量測流程架構說明………… 64
5.2 高分子非對稱布拉格耦合元件之光強度量測……… 64
5.3 高分子非對稱布拉格耦合元件之光頻譜量測……… 68
第六章 結論…………………………………………………… 75
參考文獻 ………………………………………………………… 76
英文論文大綱 ……………………………………………… 79
簡歷 ………………………………………………………… 82

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