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研究生:胡定強
研究生(外文):Hu, Ding-Chiang
論文名稱:高功率脈衝共濺鍍Zr-Cr/DLC薄膜微結構及機械性質之研究
論文名稱(外文):Microstructure and Mechanical Properties of Zr-Cr/DLC Films with High Power Impulse Magnetron Co-Sputtering System
指導教授:許春耀許春耀引用關係
指導教授(外文):Hsu, Chun-Yao
口試委員:施議訓陳釘煙郭啟全陳俊生許春耀
口試委員(外文):Shih,Yih-ShiunChen, Ding-YengKuo, Chil-ChyuanChen, Chun-ShengHsu, Chun-Yao
口試日期:2019-06-22
學位類別:碩士
校院名稱:龍華科技大學
系所名稱:機械工程系碩士班
學門:工程學門
學類:機械工程學類
論文種類:學術論文
論文出版年:2019
畢業學年度:107
語文別:中文
論文頁數:49
中文關鍵詞:高功率脈衝鋯-鉻/類鑽碳薄膜硬度分析奈米壓痕磨耗實驗
外文關鍵詞:High Power ImpulseZr-Cr / DLC FilmsHardness AnalysisNanoindentationAbrasion Test
相關次數:
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類鑽碳膜(Diamond-like carbon, DLC)結構,有堅硬的鑽石鍵結(SP3, 四面體鑽石碳膜),及潤滑功能的石墨鍵結(SP2, 六方網狀結構),有良好的機械、物理、光及電特性,應用範圍廣泛。本研究以Ar為濺鍍氣體,CH4反應氣體,應用高功率脈衝磁控濺鍍,沉積(Zr-Cr/DLC)薄膜於玻璃與不鏽鋼(SUS 304)基材,分別探討不同CH4/(Ar+CH4)流量比率(8, 12, 16, 20, 24%)、Zr-Cr功率(90/40, 120/70, 150/100, 180/130, 210/160 Watt),基材溫度(100, 150, 200, 250, 300°C)、以及基材偏壓(–20, –30, –40, –50, –60 V),對(Zr-Cr/DLC)薄膜特性之影響。為了使薄膜厚度相近,有利於性質分析,故配合不同薄膜沉積時間(12, 14, 16, 18, 20 min)。
為了使Zr-Cr/DLC薄膜厚度相近,有利於性質分析,用較長的沉積時間補償高CH4流量、低濺鍍功率、高基材溫度及高偏壓不足之膜厚。SEM表面形貌分析,薄膜厚度160.0 nm~ 200.0 nm,顯示薄膜無空孔,均勻緻密附著於基材。XRD分析,Zr-Cr/DLC薄膜為無結晶結構。EDS檢測,C、Cr、及Zr元素皆有微量增加,但O元素含量隨之減少。奈米壓痕量測,硬度由7.83 GPa ~7.98 GPa、彈性回復量21.88% ~26.38%,顯示硬度及彈性回復量增加。隨基材偏壓值增加,C、Cr、及Zr元素微量減少,但O元素含量隨之增加。配合薄膜不同之沉積時間,薄膜更緻密,硬度、彈性回復量及摩擦係數皆獲得良好之改善。
Diamond-like carbon (DLC) structure with hard diamond bond (SP3, tetrahedral diamond carbon film), and graphite bond with lubrication function (SP2, hexagonal mesh structure), good mechanical , physical, optical and electrical properties, a wide range of applications. In this study, Ar is a sputtering gas, CH4 reaction gas, high-power pulsed magnetron sputtering, deposition of (Zr-Cr/DLC) film on glass and stainless steel (SUS 304) substrate, respectively, to explore different CH4/(Ar+ CH4) flow ratio (8, 12, 16, 20, 24%), Zr-Cr power (90/40, 120/70, 150/100, 180/130, 210/160 Watt), substrate temperature (100, 150, 200, 250, 300°C), and substrate bias (–20, –30, –40, –50, –60 V), the effect on (Zr-Cr/DLC) film properties. In order to make the film thickness similar, it is advantageous for the property analysis, so it is suitable for different film deposition time (12, 14, 16, 18, 20 min).
In order to make the Zr-Cr/DLC film thickness similar, it is advantageous for the property analysis to compensate for high CH4 flow rate, low sputtering power, high substrate temperature and high bias voltage film thickness with long deposition time.
SEM surface morphology analysis, film thickness 160.0 nm ~ 200.0 nm, showing that the film has no pores, uniform and dense adhesion to the substrate. XRD analysis showed that the Zr-Cr/DLC film had no crystal structure. EDS detection, C, Cr, and Zr elements have a slight increase, but the O element content is reduced. The nanoindentation measurement showed a hardness of 7.83 GPa to 7.98 GPa and an elastic recovery of 21.88% to 26.38%, indicating an increase in hardness and elastic recovery.
As the bias value of the substrate increases, the C, Cr, and Zr elements decrease slightly, but the O element content increases.
With the different deposition time of the films, the films is denser, and the hardness, elastic recovery and friction coefficient are all improved.
摘要 i
ABSTRACT ii
誌謝 iii
目錄 iv
表目錄 v
圖目錄 vii
第一章 緒論 1
1.1 前言 1
1.2 研究動機與目的 3
第二章 理論基礎與文獻回顧 4
2.1 文獻回顧 4
2.2 類鑽碳薄膜之基本特性 5
第三章 實驗方法與儀器設備 8
3.1 實驗設計 9
3.1.1 前處理作業 9
3.1.2 濺鍍實驗參數 9
3.2 實驗材料與設備 11
第四章 實驗結果與討論 13
4.1 改變CH4/(Ar+CH4)流量比率 13
4.2 改變(Zr/Cr)Watt多層薄膜分析 20
4.3 改變(Zr/Cr)溫度多層薄膜分析 27
4.4 改變(Zr/Cr)偏壓多層薄膜分析 34
4.5 (Zr-Cr/DLC)最佳參數再現性驗證 41
第五章 結論 46
參考文獻 47







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