臺灣博碩士論文加值系統

近年來新興汙染物對環境與人體之威脅與日俱增，以傳統的處理技術無法有效去除，因此，本研究之目標為製備於可見光下能有效降解新興汙染物(例如抗生素磺胺甲基噁唑(sulfamethoxazole, SMX)之光觸媒。利用簡易濕式化學法製備光觸媒，以五水合硫酸銅及氧化石墨烯(graphene oxide, GO)為前驅物，抗壞血酸為還原劑，先合成出氧化亞銅/石墨烯光觸媒，再於500℃下通入氫氣還原以製備出銅/石墨烯光觸媒，藉由XRD、TEM、UV-vis、Raman、XPS等分析儀器進行物化特性分析。並分別將氧化亞銅/石墨烯光觸媒與銅/石墨烯光觸媒於可見光的條件下降解SMX，探討其光催化活性。 光催化降解實驗結果顯示，以添加80 mg石墨烯於奈米銅觸媒(B80)有最佳的降解率，可能是摻雜石墨烯之銅奈米顆粒所造成的局域性表面電漿共振效應，有助於提升光觸媒之可見光光催化活性。

Recently, the sulfamethoxazole (SMX), one of the emerging contaminants in surface waters, has been detected at high frequency. SMX in the water system was a potential risk to the ecosystem balance. Unfortunately, the traditional treatment techniques can not remove SMX completely. Thus, the objective of this study is to synthesize an efficient photocatalyst for degrading emerging contaminants under visible light.The Cu2O/graphene photocatalysts were synthesized via a simple wet-chemical method by using CuSO4·5H2O and graphene oxide as precursors and ascorbic acid as reducing agent. Then, the Cu/graphene photocatalysts were obtained by reducing the Cu2O/graphene photocatalysts in H2 at 500℃. A variety of different spectroscopic and analytical techniques, such as X-ray diffraction, Raman scattering spectroscopy, UV-visible spectroscopy, X-ray photoelectron spectroscopy and transmission electron microscopy were used to characterize the physical properties of materials. Photodegrading SMX by these photocatalysts under visible light was also examined in this study.
In the photodegrading experiments, it was found that the Cu/graphene photocatalysts sample (B80) has the superior visible-light response of 80% removal ratio which may be confirmed that a localized surface plasmon resonance effect of copper nanoparticles and doping graphene can enhance the photocatalytic activity under visible light irradiation.

中文摘要 I
Abstract II
誌謝 IV
總目錄 V
表目錄 VII
圖目錄 VIII
第一章 緒論 1
1-1前言 1
1-2研究動機 1
第二章 文獻回顧 2
2-1新興汙染物之簡介 2
2-1.1新興汙染物之概述 2
2-1.2磺胺甲基噁唑之特性 3
2-2光觸媒簡介 5
2-2.1 光觸媒的發展 5
2-2.2光催化的原理 6
2-2.3表面電漿子 8
2-2.4光觸媒的應用 9
2-3影響光催化反應效率之因素 9
2-3.1催化劑 9
2-3.2光源與光強 10
2-3.3有機物濃度 10
2-3.4 pH值 11
2-4銅 12
2-4.1銅之基本性質 12
2-4.2銅之改質 12
2-5氧化亞銅 13
2-5.1氧化亞銅之基本性質 13
2-5.3氧化亞銅之改質 16
2-6石墨烯 17
2-6.1石墨烯之基本性質 17
2-6.2石墨烯之製備方法 19
2-7光觸媒於新興汙染物的應用 25
第三章 實驗方法與步驟 26
3-1實驗藥品 26
3-2實驗儀器 27
3-3實驗步驟 28
3-3.1製備氧化石墨烯 28
3-3.2合成氧化亞銅/石墨烯光觸媒 30
3-3.3製備銅/石墨烯光觸媒 32
3-3.4光觸媒於可見光下降解新興汙染物 34
3-4材料特性分析儀 35
第四章 結果與討論 38
4-1氧化亞銅/石墨烯光觸媒之物理特性分析 38
4-1.1 XRD分析 38
4-1.2 TEM分析 41
4-1.3 UV-vis分析 43
4-1.4 XPS分析 44
4-1.5 Raman分析 48
4-2 氧化亞銅/石墨烯光觸媒可見光降解實驗 51
4-2.1 揮發與無觸媒光解實驗 51
4-2.2 吸附實驗 53
4-2.3 可見光降解實驗 54
4-2.4推估反應速率常數 55
4-2.5光觸媒重複耐久實驗 57
4-3 銅/石墨烯光觸媒之物理特性分析 60
4-3.1 XRD分析 60
4-3.2 TEM分析 63
4-3.3 UV-vis分析 65
4-3.4 XPS分析 66
4-3.5 Raman分析 70
4-4銅/石墨烯光觸媒可見光降解實驗 72
4-4.1吸附實驗 72
4-4.2可見光降解實驗 72
4-4.3 推估反應速率常數 74
4-4.4 光觸媒重複耐久實驗 76
第五章 結論 79
參考文獻 80
自傳 90

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