臺灣博碩士論文加值系統

半導體製程IC線幅日趨細微化之下，氣態分子汙染物的控制成為重要之課題。晶圓盒在儲存及運送的過程中，若含有AMC存在於晶圓盒內部，將會汙染晶圓導致良率下降。晶圓盒內部的AMC有可能是前次製程殘留，或是內部晶圓的交叉污染。因此若能及時監控晶圓盒內部的AMC濃度，藉以判斷其乾淨與否，便能避免使用已受汙染的晶圓盒裝載晶圓造成良率下降。
過去有很多量測AMC的方法都有明顯的局限性，包括難以有即時監測能力及靈敏度、準確度、操作的複雜性、停機和維護成本等考量。晶圓盒的晶片儲存和運輸之AMC 追蹤量測必要性在於需要快速和簡易的方法，與自動線上即時量測和容易操作取樣收集。對於AMC 在ppb 或ppt 等級之固定監測有清楚的需要，來保證製程的完整性。
本文針對半導體產業中常見的苯及氫氟酸為主要的量測標的，利用光腔衰盪光譜分析儀(CRDS)量測氫氟酸，使用光離子化檢測器(PID)檢測苯等有機汙染物；研究發現PID及CRDS的靈敏度極高，因此能迅速掌握FOUP腔體內的汙染程度。且復歸時間短，感測器在十分鐘內即可歸零，相較以往的其他量測法，使用PID及CRDS能在相同的時間內完成更多的晶圓盒檢測。

The airborne molecular contamination (AMC) control has become an important issue since smaller and smaller integrated circuit (IC) linewidth is used in semiconductor products. During the process of wafer storage and transportation in front opening unified pods (FOUP), any AMC may pollute the wafer and decrease the defect-free rate. The AMC inside a FOUP might be reminder from the previous manufacturing process or the cross-contamination between wafers. Therefore, if the real-time AMC concentration inside a FOUP can be monitored to evaluate the cleanliness, the polluted FOUP can be discarded for loading wafer and prevent the decrease of defect-free rate.
Many AMC monitoring methodologies which were used in the past have their own limitations, including difficult real-time monitoring, poor sensitivity, poor accuracy, complex operation, often breakdown, and high maintenance cost. It is essential to make AMC monitoring fast and easy on the wafer storage and transportation in FOUPs. Automatic real-time monitoring and easy operation of sample collecting are examples but not limited to meet the demands of AMC monitoring on ppb or ppt level to assure the integrity of manufacturing process.
This research aims to measure hydrogen fluoride and toluene particles as main AMC in semiconductor manufacturing. The Cavity Ring-Down Spectroscopy (CRDS) was used for measuring hydrogen fluoride particles while the photoionization detector (PID) monitoring system was used for measuring toluene and related organic contaminant. The results showed that both CRDS and PID were highly sensitive and could measure the pollution index rapidly. In addition, the recovery time for the monitor was short that the indicator went back to zero within 10 minutes. Compared with other methods of measurements, CRDS and PID could finish more FOUPs monitoring within the same time period.

摘要 i
ABSTRACT ii
誌謝 iv
目錄 v
表目錄 vii
圖目錄 viii
第一章 緒論 1
1.1 前言 1
1.2 研究動機及背景 4
1.3 文獻回顧 6
第二章 實驗設備與儀器 13
2.1 實驗設備 13
2.1.1 450 mm晶圓盒 13
2.2 監測儀器 14
2.2.1 光離子化檢測器 14
2.2.2 光腔盪光譜分析儀 17
第三章 實驗方法 19
3.1 實驗步驟 20
3.2 建立汙染濃度 23
3.3 監測晶圓盒內濃度 24
3.4 相對標準差 24
3.5 相對誤差 25
3.6 理想氣體方程式 25
3.7 晶圓盒門縫洩漏量 27
第四章 結果與討論 28
4.1 汙染濃度建立 28
4.2 濃度隨時間變化之曲線 30
4.3 偵測時間及相對標準差 32
4.4 實驗相對誤差 34
4.5 不同濃度下偵測時間之比較 36
第五章 結論與建議 37
5.1 CRDS並聯PID用於即時分析系統之量測效率 37
5.2 CRDS並聯PID用於即時分析系統之量測準確性 38
5.3 CRDS並聯PID用於即時分析系統之可行性 39
5.4 建議 40
第六章 參考文獻 41
附錄-審查意見回覆 42

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