臺灣博碩士論文加值系統

本研究使用噴射式大氣壓電漿（Atmospheric Pressure Plasma Jet）配合控制蒸發供料系統（Controlled Evaporating and Mixing，CEM System），將藥品六甲基二矽氮烷（HMDSN）輸送至大氣壓電漿反應器中離子化，並沉積氧化矽薄膜至聚碳酸酯（Polycarbonate，PC）試片上。研究中探討不同參數範圍在藥品流量、氬氣流量、載臺移動速度、電漿源與試片間距，各參數對薄膜的影響，而在實驗中為了能符合工廠生產的連續式製程，在實驗方法中應用反應曲面法進行實驗參數最佳化設定，並使用水滴接觸角量測儀（Water Contact Angle，W.CA）、紫外光/可見光分光光譜儀（UV/Visible Spectroscopy）、場發射掃描式電子顯微鏡（Scanning Electron Microscopy，SEM）、X-射線繞射分析儀（X-Ray Diffractometer，XRD）、傅立葉轉換紅外線光譜儀（Fourier Transform infrared spectrometer，FTIR）、橢圓偏光儀（Ellipsometer）進行分析，在現行不同實驗參數下對水滴接觸角的實驗，可得到極佳的PC水滴接觸角參數為150°、光穿透度86%（分析波長550 nm），在PC板料上本研究確實能夠鍍膜SiOX，且較以往的製程方法中的鍍氟化合物薄膜要高10°的水滴接觸角，在光穿透度方面也能維持在業界的83%標準上。

In this study, the atmospheric pressure plasma was combined with Controlled Evaporating and Mixing System to transport the drug HMDSN into an atmospheric pressure plasma reactor and deposit a silicon oxide film onto a Polycarbonate test piece. In this study, the effects of different parameters on the flow rate of the drug, the flow rate of argon, the velocity of the platform, the distance between the plasma source and the test piece, and the influence of the parameters on the film were discussed. In order to meet the continuous production process in the experiment. The results show that the experimental parameters can be used to optimize the experimental parameters and then analyzed by Water Contact Angle, UV / Visible Spectroscopy, Scanning Electron Microscopy, X-Ray Diffractometer, Fourier Transform infrared spectrometer and Ellipsometer. The results show that the contact angle of the water droplets is 150 °and the light penetration is 86%（the analysis wavelength is 550 nm）.

摘要 i
ABSTRACT ii
誌謝 iii
目 錄 v
表目錄 vii
圖目錄 viii
第一章 前言 1
1.1 研究背景與動機 1
1.2 文獻回顧 2
第二章 實驗設備與方法 4
2.1 液體輸送與氣體蒸氣控制系統 4
2.1.1 介紹 4
2.1.2 控制蒸發混合系統（CEM） 4
2.2 噴射式大氣壓電漿與鍍膜系統 5
2.3 反應曲面法 7
2.3.1 反應曲面法設計實驗方法 8
2.4 實驗方法 9
2.4.1 實驗流程 9
2.4.2 實驗藥品及試片 9
2.4.3 試片準備 11
2.4.4 實驗參數設定 12
2.4.5 實驗步驟 13
2.5 檢測儀器 15
第三章 結果與討論 16
3.1 前驅物流量對SiOx薄膜性質影響 16
3.1.1 前驅物流量對水滴接觸角之影響 16
3.1.2 前驅物流量對光穿透度之影響 17
3.1.3 前驅物流量結果討論 18
3.2 載氣流量對SiOx薄膜性質影響 18
3.2.1 載氣流量對水滴接觸角之影響 19
3.2.2 載氣流量對光穿透度之影響 19
3.2.3 載氣流量結果討論 20
3.3 載臺移動速度對SiOx薄膜性質影響 20
3.3.1 載臺移動速度對水滴接觸角之影響 20
3.3.2 載臺移動速度對光穿透度之影響 21
3.3.3 載臺移動速度結果討論 22
3.4 電漿源與試片間距對SiOx薄膜性質影響 22
3.4.1 電漿源與試片間距對水滴接觸角之影響 22
3.4.2 電漿源與試片間距對穿透度之影響 23
3.4.3 電漿源與試片間距結果討論 24
3.5 反應曲面法參數對SiOx薄膜性質影響 24
3.5.1接觸角變異數分析討論 27
3.5.2光穿透度變異數分析討論 31
3.5.3反應曲面法參數對SiOx薄膜性質影響結果討論 36
3.6 鍍膜覆蓋率對接觸角影響分析結果與討論 37
3.7 XRD分析結果與討論 39
3.8 FT-IR分析結果與討論 39
3.9橢圓偏光儀SiO2膜厚測量 40
3.10光穿透度與水滴效果實際照片案例 42
3.11鍍膜回復性實驗 44
第四章 結論 45
第五章 未來展望 46
參考文獻 47

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