臺灣博碩士論文加值系統

本論文主要進行高分子波導非對稱結構之研究與分析，以微機電製程技術中的黃光微影製程、微接觸成型、複製成形技術，製作波導結構至高分子材料上，並用其技術將其中一條波導通道遮蔽，接著利用全像干涉微影技術製作布拉格光柵於波導底部，形成非對稱的結構。在製程中兩條導光層分別使用了不同的材料，為更進一步調整此波導元件之反射波形，在輸入/輸出側的導光層中，加入了高折射率的液晶以提高濾波的精細度。
本文研究中，會以原子力顯微鏡觀測元件中光柵的週期、深度及3D模擬圖；以場發射掃描式電子顯微鏡觀察元件的細微結構，並以近場量測技術來觀察元件的光飽和強度，最後再以寬頻光源模組元件輸出之穿透頻譜與經由光柵反射於擷取端的反射頻譜。

In this thesis, research and analysis of polymer waveguide asymmetric structure in LIGA technology in the photolithography process, the micro-contact molding, copy forming technology, making the waveguide structure to polymer materials, and use its technology to one of the waveguide channels shelter, then the use of holographic interference lithography to fabricate waveguide Bragg gratings on the bottom, forming a non-symmetrical structure. In the process, two waveguide cores are the different materials in the waveguide elements , in the input / output side of the core, the liquid crystal with high refractive index is added, to increase the fineness of the filter .
In this paper, using Atomic Force Microscope to observe element’s grating cycle, depth and 3D Rendering; with Field Emission Scanning Electron Microscope to observe the fine structure elements and the near-field observation light saturation intensity, then the output of the tunable laser penetrate through the grating reflection spectrum and capture the reflection spectrum of clients.

摘要 ........................................................................................................................ i
Abstract ................................................................................................................. ii
誌謝 ...................................................................................................................... iii
目錄 ...................................................................................................................... iv
表目錄 .................................................................................................................. vi
圖目錄 ................................................................................................................. vii
第一章 緒論 ...................................................................................................... 1
1.1 前言 ...................................................................................................... 1
1.2 研究動機與目的 .................................................................................. 1
1.3 論文架構 .............................................................................................. 2
第二章 文獻探討 .............................................................................................. 3
2.1 光波導的原理和結構 .......................................................................... 3
2.1.1 光波導原理 ............................................................................... 3
2.2 光塞取多工器簡介 .............................................................................. 6
2.3 材料特性 .............................................................................................. 7
2.3.1 高分子材料 ............................................................................... 7
2.3.2 聚二甲基矽氧烷 ....................................................................... 7
2.3.3 液晶 ........................................................................................... 7
2.4 微機電系統 .......................................................................................... 8
2.5 全像干涉微影 .................................................................................... 10
2.6 黃光微影製程 .................................................................................... 10
第三章 研究內容與方法 ................................................................................ 11
3.1 基板清潔 ............................................................................................ 11
3.2 黃光微影技術製作波導結構 ............................................................ 12
3.3 具波導結構之PDMS公模 ............................................................... 15
3.4 高分子波導元件 ................................................................................ 16
3.5 全像干涉微影製作布拉格光柵 ........................................................ 18
3.6 PDMS翻印非對稱波導結構 ............................................................ 21
3.7 導光層與披覆層之研製 .................................................................... 23
3.8 量測端研磨拋光 ................................................................................ 26
第四章 結果與討論 ........................................................................................ 28
4.1 AFM量測布拉格光柵表面結構 ...................................................... 28
4.2 光強度測詴 ........................................................................................ 28
4.3 光頻譜量測 ........................................................................................ 29
第五章 結論與未來研究方向 ........................................................................ 31
v
5.1 結論 .................................................................................................... 31
5.2 未來研究方向 .................................................................................... 31
參考文獻 ............................................................................................................. 32
Extended Abstract ............................................................................................... 34
Abstract ............................................................................................................... 34
簡歷(CV) ............................................................................................................. 39

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