臺灣博碩士論文加值系統

隨著時代的變遷、科技的進步，各類光電產業對多層膜技術也日漸苛求，因此如何快速且精準地量測薄膜之厚度、折射率以及消光係數是非常重要的課題。本研究之目的在於使用白光干涉術量測薄膜之厚度、折射率以及消光係數，運用白光干涉同調長度較短之特性，分析鍍膜基板產生之白光干涉訊號，藉此推算出薄膜的厚度、折射率以及消光係數。研究中建立一白光垂直掃描干涉儀，將壓電致動器元件安裝至此干涉儀，如此可自動化量測干涉訊號。撰寫Labview程式對鍍膜基板之干涉訊號進行分析，並以簡形優化法作為擬合方法，成功的量測介電質薄膜與薄金屬薄膜之厚度、折射率以及消光係數，其中白光量測之介電質薄膜折射率結果與橢偏儀量測結果於波長400nm至700nm範圍內約相差0.1，其消光係數結果約略相差0.01，其薄膜厚度與橢偏儀量測結果比較約略相差5nm。白光量測薄金屬薄膜折射率之結果與橢偏儀量測結果於波長400nm至700nm範圍內約略相差0至0.4，其消光係數結果約略相差0.05至0.2，薄膜厚度約略相差1nm。

In this study, a white-light vertical scanning Michelson interferometer has been successfully built to measure refractive index, extinction coefficient, and thickness of optical thin films. The white-light interferometer, based on short white-light coherence length, measures the optical path between the top and bottom faces of a thin film by a vertical scanning method with zero-order interference fringe identification. Refractive index, extinction coefficient, and thickness of thin films are determined by fitting interference patterns of white-light intensity using a LabVIEW program with a simplex algorithm, made by ourselves. The differences of refractive index, extinction coefficient, and thickness of a dielectric film between measurements of the white-light interferometer and an ellipsometer are within 0.1, 0.01, and 5nm over the 400-700nm wavelength range. The differences of refractive index, extinction coefficient, and thickness of a thin metal film between measurements of the white-light interferometer and an ellipsometer are within 0.4, 0.2, and 1nm over the 400-700nm wavelength range. The method of measuring refractive index, extinction coefficient, and thickness of optical thin films has the advantages of inherently high sensitivity and accuracy.

目錄

摘要 i
Abstract ii
誌 謝 iii
表 目 錄 iv
圖 目 錄 v
第一章 緒論 1
1.1 前言 1
1.2 研究動機 2
1.3 文獻探討 3
1.4 論文架構 8
第二章 量測系統理論 9
2.1 白光干涉原理 9
2.2 白光垂直掃描干涉術 15
2.3 薄膜厚度及光學常數量測法 19
2.4 包絡法 24
2.5 簡形優化法 28
2.6 橢圓偏振法 31
第三章 量測系統架構與實驗操作 33
3.1 系統介紹 33
3.2 分光光譜儀系統與實驗操作 33
3.3 橢圓偏光儀系統與實驗操作 34
3.4 白光麥克森干涉儀系統與實驗操作 35
第四章 實驗結果與討論 37
4.1使用簡形優化法模擬分析薄膜折射率、消光係數與厚度 37
4.1.1 簡形優化法程式撰寫 37
4.1.2 五氧化二鈮薄膜的白光光強度模擬分析 42
4.1.3 鈮薄膜的白光光強度模擬分析 52
4.2 分光光譜儀與橢圓偏光儀之實驗結果 62
4.3 白光麥克森干涉儀實驗結果 65
第五章 結論與建議 78
參考文獻 79
作者簡介 81

參考文獻

[1]陳文杰，鄭名山，國內太陽能集熱產業技術與推廣，能源報導月刊，民95年
[2]蔡定侃，許哲源，無電鍍複合鍍製備太陽能選擇性吸收膜之性質探討，行政院國家科學委員會專題研究計畫NSC95-2221-E-150-004，民95年
[3] George B. Dantzig, Alex Orden, PhilipWolfe,“The generalized simplex method for minimizing a linear form under linear inequality restraints,” Pacific J. Math., Vol. 5, No 2, pp.183-195 (1955).
[4] J. A. Nelder and R. Meadf, “A simplex method for function minimization,” The Computer Journal, Vol. 7, No 4, pp.308-313 (1965).
[5] 吳國誠，簡形優化法在光學設計之應用，民72年
[6] 黃毓中，利用調制式橢圓偏光術於研究光學參數、薄膜厚度與光學性質，蓬甲
大學，民91年
[7] 謝振榆，謝基生，林志明，林坤賢，具節能隔熱之透明玻璃窗，國立虎尾科技
大學，民100年
[8] Optical Shop Testing 2nd Edition, Malacara, John Wiley & Sons,pp.18-21 (1992).
[9] R. Windecker, M. Fleischer, K. Korner, H. J. Tiziani, “Testing micro devices with fringe projection and white-light interferometry,” Optics and Lasers in Engineering, Vol. 36, pp.141 (2001).
[10] P. Sandoz and G. Tribillon, “Profilometry by zero-order interference fringe identification,” J. Mod. Optics, Vol. 40, No. 9, pp.1691-1700 (1993).
[11] A. Hirabayashi, H. Ogawa, and K. Kitagawa, “Fast surface profiler by white-light interferometry using a new algorithm, the SEST algorithm,” Appl. Opt, Vol. 41, pp. 4876-4883 (2002).
[12] Perter de Groot and Leslie Deck, Surface profiling by analysis of white-light interferograms in the spatial frequency domain, J. Mod. Optics, vol. 42, pp.389-401 (1995).
[13] R. Windecker, H. J. Tiziani, Optical roughness measurements using extended white-light interferometry, Optical Engineering, vol. 38(6), pp.1081-1087 (1999).
[14] Artur Olszak, Lateral scanning white-light interferometer, Appl. Opt., vol. 39, pp.3906-3913 (2000).
[15] Mingzhou Li, Chenggen Quan, Measurement of transparent coating thickness by the use of white light interferometry, SPIE, vol. 5852, pp.401-406 (2005).
[16] Young-Sik Ghim, Seung-Woo Kim, Dispersive white-light interferometry for thin-film thickness profile measurement, SPIE, vol. 5856, pp.419-426 (2005).
[17] S. Guo, G. Gustafsson, O. J. Hagel and H. Arwin, Determination of refractive index and thickness of thick transparent films by variable-angle spectroscopic ellipsometry: application to benzocyclobutene films, Appl. Opt., vol. 35, pp.1693-1699 (1996).
[18] Changsoo Jung and Bum Ku Rhee, Simultaneous determination of thickness and optical constants of polymer thin film by analyzing transmittance, Appl. Opt., vol. 41, pp.3861-3865 (2002).
[19] J. E. Greivenkamp and J. H. Bruning, Phase shifting interferometry, in Optical shop testing, D. Malacara, John Wiley, pp. 501 (1992).
[20] P. Sandoz and G. Tribillon, “Profilometry by zero-order interference fringe
identification,” J. Mod. Optics, Vol. 40, No. 9, pp. 1691-1700 (1993).
[21] M. C. Liu, B. H. Liao, W. H. Cho, C. C. Lee and C. C. Jaing, “The research of oblique deposition of lanthanum fluoride thin films at 193nm,” Proc. SPIE 6645, pp.66451Y (2007).
[22] K. L. Chopra, Mechanic effects in thin films, in Thin Film Phenomena, McGraw-Hill : New York, pp. 266 (1969).
[23] C. L. Tien, C. C. Jaing, C. C. Lee and K. P. Chuang, “Simultaneous determination of the thermal expansion coefficient and the elastic modulus of Ta2O5 thin film using phase shifting interferometry,” J. Mod. Optics, 47, pp. 1681-1691 (2000).
[24] C. C. Jaing, M. C. Liu, C. C. Lee, W. H. Cho, W. T. Shen, C. J. Tang and B. H. Liao, “Residual Stress in Obliquely Deposited MgF2 Thin Films” Appl. Opt., 44, pp. 2996-3000 (2008).
[25] C. J. Tang, C. C. Jaing, K. S. Lee and C. C. Lee, “Residual stress in Ta2O5-SiO2 composite thin film rugate filters prepared by RF ion-beam sputtering” Appl. Opt., 44, pp. 2996-3000 (2008).
[26] 李正中，薄膜光學與鍍膜技術(第六版)，藝軒出版社，民98年
[27] 蔡方銘，金屬混合膜應用於太陽能吸收膜之光學特性及殘留應力研究，明新科技大學，民99年
[28] Manifacier J.C., Gasiot J. and Filland J.P., “Simple method for determination of the optical constant n, k and the thickness of weekly absorbing thin films”, J. Phy. E. :Sci. Inst. 9, 1002-1004 (1976).
[29] Azzam R. M. A. and Bashara N. M., “Ellipsometry and polarized light” , North-Holland Publishing Company (1977).
[30] 陳政儒，使用白光干涉技術量測薄膜折射率與厚度之研究，明新科技大學，民100年
[31] E. D. Palik., “Handbook of Optical Constants of Solids II” , Academic Press, Boston, USA, p389-396 (1991).