[1]A.N. Banerjee, K.K. Chattopadhyay, Prog. Cryst. Growth and Charact. Mater, 50, 52-105 (2005).
[2]劉碩航,P型透明導電氧化物薄膜製備及其電性與光學特性之探討,碩士論文,台灣大學光電工程研究所,2007年 (指導教授:陳奕君)。[3]O. Kluth, B. Rech, L. Houbena, S. Wieder, G. Schope, C. Beneking, H. Wagner, A. Loffl, and H. W. Schock, Thin Solid films, 351, 247-249 (1999).
[4]M. A. Martinez, J. Herrero, and M. T. Gutierrez, Solar Energy Materials and Solor Cells, 45, 75-86 (1997).
[5]H. Kima, A. Pique, J. S. Horwitz, H. Murata, Z. H. Kafafi, C. M. Gilmore, and D. B. Chrisey, Thin Solid Films, 377-378, 798-802(2000).
[6]Z. A. Ansari, R. N. Karekar, and R. C. Aiyer, Thin Solid Films, 305, 330-335 (1997).
[7]楊明輝,"透明導電膜",藝軒圖書,第二版,2006年。
[8]H. Sato, T. Minami, S. Takata and T. Yamada, Thin Solid Films 236, 27-31 (1993).
[9]H. Kawazoe, M. Yasukawa, H. Hyodo, M. Kurita, H. Yanagi, and H. Hosono, Nature 389, 939-942 (1997).
[10]H. Yanagi, S. Inoue, K. Ueda, H. Kawazoe, H. Hosono, N. Hamada, J. Appl. Phys. 88, 4159-4163 (2000).
[11]K. Ueda, T. Hase, H. Yanagi, H. Kawazoe, H. Hosono, H. Ohta, M. Orita, M. Hirano, J. Appl. Phys. 89, 1790-1793 (2001).
[12]J. Tate, M.K. Jayaraj, A.D. Draeseke, T. Ulbrich, A.W. Sleight, K.A. Vanaja, R. Nagarajan, J.F. Wager and R.L. Hoffman, Thin Solid Films 411, 119-124 (2002).
[13]H. Yanagi, T. Hase, S. Ibuki, K. Ueda, H. Hosono, J. Appl. Phys. 78, 1583-1585 (2001).
[14]R. Nagarajan, A. D. Draeseke, A. W. Sleight, J. Tate, J. Appl. Phys. 89, 8022-8025 (2001).
[15]M. K. Jayaraj, A. D. Draeseke, J. Tate, A. W. Sleight, Thin Solid Films 397 244-248 (2001).
[16]T-W. Chiu, Y. C. Yang, A. C. Yeh, Y. P. Wang, and Y. W. Feng, Vacuum 87, 174-177 (2013).
[17]王永伯, “Preparation of Cu-based delafossite thin films and its antibacterial properties,” 國立臺北科技大學, 2012 (指導教授:邱德威).
[18]T-W. Chiu, K. Tonooka, and N. Kikuchi, Thin Solid Films 516, 5941-5947 (2008)
[19]T-W. Chiu, S. W. Tsai, Y. P. Wang, and K. H. Hsu, Ceramic International 38, 673-676 (2011).
[20]“Directive 2011/65/Eu Of The European Parliament And Of The Council” Official Journal of the European Union L74/100 (2011).
[21]石黑隆,石澤伸夫,水谷維恭,加藤誠軌,窯業協會誌92,25 (1984).
[22]J. L. Garciamunoz, J. Rodriguez-Carvajal, X. Obradors, M. Valletregi, J. Gonzalez Calbet, E. Garcia, J. Physics Letters A 149, 319-327 (1990).
[23]T. Minami, Semiconductor Science and Technology 20, 35-44 (2005).
[24]B. J. Ingram, G. B. Gonzalez, D. R. Kammler, M. I. Bertoni, and T. O. Mason, Journal of Electroceramics 13, 167-175 (2004).
[25]楊明輝,"金屬氧化物透明導電材料的基本原理",工業材料,第179期,134-144 (2001).
[26]李玉華,"透明導電膜及其應用",科儀新知,第12卷,第1期 94-102 (1990).[27]A.N. Banerjee, C.K. Ghosh, K.K. Chattopadhyay, Solar Energy Mater. & Solar Cells. 89, 75-83 (2005).
[28]T-W. Chiu, K. Tonooka, N. Kikuchi, Vacuum 83, 614-617 (2009).
[29]蔡松淵,以溶膠凝膠法製備CuAlO2薄膜之研究,碩士論文,義守大學材料工程研究所,2007年 (指導教授:洪博彥)。
[30]A. Sarkar, S. Ghosh, S. Chaudhuri and A. K. Pal, Thin Solid Films 204, 255-264 (1991).
[31]J. O. Noyce, H. Michels and C. W. Keevil, Journal of Hospital Infection 63, 289-297 (2006).
[32]L. Weaver, H. Michels and C. W. Keevil, Journal of Hospital Infection 68, 145-151 (2008).
[33]G. Borkow, S. Zhou, T. Pang, and J. Gabbay, Journal of Hospital Infection 5, E11295-E11296 (2010).
[34]L. John Vossen and Werner Kerm, Academic Process 134, (1999).
[35]Brain Campman, “Plasma,” John Wiley & Sons, chapter 3 (1980).
[36]R. F. Bunshah, “Deposition Technologies for Films and Coatings,” Noyes Publications (1982).
[37]J. Venables, Rep. Prog. Phys. 47, 399 (1984).
[38]John A. Thornton, J. Vac. Sci. Technol. 11, 666-674 (1974).
[39]艾啟峰,"電漿工程科技在表面處理工業應用之發展(上) "科儀新知,(1998).[40]李正中,"薄膜光學與鍍膜技術",藝軒圖書出版社,第一版,(1999).
[41]Juan I. Larruquert and Ritva A.M. Keski-Kuha, Optical Communications 215, 93-99 (2003).
[42]L. Gupta, A. Mansingh and P.K.Srivastava, Thin Solid Films 176, 33-44 (1989).
[43]黃珧玲,黃嘉宏,曾堯宣,劉淑鈴,郭廷威 “健康綠建築的空氣污染商機光觸媒於室內空氣品質改善之應用”,中華水電冷凍空調月刊 1-6 (2008).