臺灣博碩士論文加值系統

本研究提出單一元素氮化物在不同濺鍍參數下形成多層膜堆疊之簡化製程。利用射頻磁控濺鍍法並控制75至150W之濺鍍功率來製備氮化鉭單層與多層膜。對於氮化鉭單層膜可利用撞擊能量變化而產生不同結構，低瓦數下易生成非晶而高瓦數濺鍍易生成結晶結構。非晶層是因為初期的原子隨意堆疊而形成，而後緻密的柱狀晶因連續沉積所提升的能量而接續形成。其晶粒大小與表面粗糙度隨濺鍍功率增加而降低。為了提升保護行為，氮化鉭多層膜系統分別由75/150及100/150W的濺鍍功率之氮化鉭薄膜交互堆疊組成。在控制膜厚為1 μm條件下，本研究也分析總堆疊層數20與50層之差異。總數20層的氮化鉭多層膜在75/150W呈現非晶/結晶結構，然而，其他多層膜則因非晶層被抑制生長而展現連續的柱狀結構。單層膜中，氮化鉭薄膜在 150W的功率下之緻密結構有益於硬度及抗磨耗行為的提升。然而，氮化鉭薄膜在100W有較大的初期非晶層而呈現出優越的抗腐蝕性。對於氮化鉭多層膜，硬度表現介於單層膜之間。在磨耗性能評估中，氮化鉭多層膜相較於其單層膜有較窄的磨耗軌跡以及較少的薄膜破裂，顯示其較佳的耐磨性質。在Rockwell-C 附著性以及刮痕測試中，50層的氮化鉭多層膜因為較多的界面而有較高的附著品質。總層數20層的75/150W氮化鉭多層膜因具有明顯的分層結構及非晶層而呈現較佳的抗腐蝕性。

A simplified fabricating process for the multilayer coating using an innovative stacking type of single element nitride layers under various deposition input powers were proposed in this study. Tantalum nitride (TaN) single layer and multilayer coatings were manufactured through RF magnetron sputtering. Various deposition input powers from 75 to 150 W were used in fabricating TaN layers with various impingement energies for different structures. For TaN single layers, an amorphous layer formed due to random stacking of atoms at early deposition stage, following which a compact columnar structure evolved. The grain size and surface roughness decreased with the input power, leading to an increase in protective capability. To promote the protective behavior, the TaN multilayer systems consisted of alternately stacked TaN layers were fabricated at input powers of 75/150 and 100/150 W. The layer numbers of 20 and 50 under a fixed 1 μm in total thickness were also considered. The TaN multilayer at 75/150 W with 20 layers presented an amorphous/crystalline structure, while other multilayer coatings showed continuous columnar structures due to the limited growth for amorphous structure. For single layer TaN coatings, a compact columnar structure of the 150 W deposited TaN film was beneficial to the hardness and tribological behavior. On the other hand, the TaN film under 100 W with thick amorphous layer at the early deposition stage showed a superior corrosion resistance. For the TaN multilayers, an average hardness between those staked single layers was expected. For tribological analysis, narrower wear scars and limited film failure for multilayer systems indicated a greater durability than the single-layer TaN films. In Rockwell-C adhesion and scratch tests, the TaN multilayer with 50 layers showed higher adhesion strength due to more interfaces. Owing to the obvious stratified amorphous/crystalline structure, the TaN multilayer deposited at 75/150 W with 20 layers presented a better corrosion resistance.

摘要 I
Abstract II
Contents IV
Table List VII
Figure Captions VIII
Chapter 1 Introduction 1
1.1 Background 1
1.2 Material Systems 1
1.3 Critical Issues 2
1.4 Objective 2
Chapter 2 Literature review 4
2.1 Surface engineering 4
2.1.1 Surface coating 4
2.1.2 Surface engineering functions and applications 5
2.2 Sputter technology 5
2.2.1 Plasma theory 5
2.2.2 Sputtering theory 6
2.2.3 RF sputtering 6
2.2.4 Magnetron sputtering 7
2.2.5 Reactive sputtering 7
2.2.6 Thin film growth 8
2.3 Multilayer coatings 9
2.4 TaN coatings 9
2.4.1 Introduction to hard coatings 9
2.4.2 Introduction to TaN coatings 10
2.4.3 Microstructure and phase characteristics 10
2.4.4 Mechanical properties 11
2.4.5 Corrosion behavior 13
2.4.6 TaN multilayer coatings 13
Chapter 3 Experimental Procedures 44
3.1 Design Philosophy 44
3.2 RF sputtering deposition of TaN coatings 44
3.2.1 Substrate and pretreatment 44
3.2.2 Coating fabrication process 45
3.3 Measurements and analysis 46
3.3.1 Microstructure features 46
3.3.1.1 Composition analysis 46
3.3.1.2 Phase identification 46
3.3.1.3 Microstructure investigation 46
3.3.1.4 Surface characterization 47
3.3.2 Characterization 47
3.3.2.1 Hardness evaluation 47
3.3.2.2 Wear resistance 48
3.3.2.3 Coating adhesion 49
3.3.2.3.1 Rockwell C adhesion test 49
3.3.2.3.2 Scratch test 50
3.3.2.4 Anti-corrosion behavior 50
Chapter 4 Results and Discussion 67
4.1 TaN single layer coatings 67
4.1.1 Composition analysis 67
4.1.2 Phase identification 67
4.1.3 Microstructure investigation 68
4.1.4 Surface roughness 71
4.2 TaN multilayer coatings 72
4.2.1 Composition analysis 72
4.2.2 Phase identification 72
4.2.3 Microstructure investigation 72
4.2.4 Surface roughness 77
4.3 Protective properties 77
4.3.1 Hardness evaluation 77
4.3.2 Wear resistance 78
4.3.3 Coating adhesion 82
4.3.4 Anti-corrosion behavior 86
4.4 Overview on TaN film growth and protective performance 88
Chapter 5 Conclusions 155
References 158
Appendix 166

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