臺灣博碩士論文加值系統

本研究使用直流磁控濺鍍系統，沉積氮化物多層膜(MoN/ZrMoN) 於玻璃及SUS 304不鏽鋼基材，探討反應磁控濺鍍沉積參數對於MoN/ZrMoN硬質薄膜特性的影響。分別改變ZrMoN之Zr功率(50~250 Watt)、中間MoN膜厚(225~690 nm)，及基材電漿蝕刻前處理(duration time 5~15 min)，對MoN/ZrMoN多層膜微結構及機械性質的影響。利用SEM、EDS、XRD，奈米壓痕、摩擦磨耗試驗及水滴接觸角，量測分析薄膜特性。結果發現Zr含量增加，ZrMoN薄膜的(111)繞射波的結晶位置，向低角度偏移。研究顯示單層MoN，ZrMoN， 多層膜MoN/ZrMoN及基材經電漿蝕刻多層膜MoN/ZrMoN的硬度，摩擦係數及彈性回復量分別為(8.22 GPa, 50.24%)，(11.95 GPa, 0.74, 64.93%)， (12.53 GPa, 0.42, 58.69%)， (13.87 GPa, 0.29, 62.77%)。基材經電漿蝕刻前處理，增加基材表面粗糙度，水滴接觸角由85.0o降低到58.4o，表面趨於親水性，有效提升薄膜附著性，顯示MoN/ZrMoN多層膜有優良機械性質。本研究最佳MoN/ZrMoN多層膜有優越的抗磨耗性，經確認實驗驗證，其硬度，摩擦係數及彈性回復量，分別為15.71GPa、0.21及66.65 %。

In this study, a DC magnetron sputtering system was used to deposit multilayer films on nitride (MoN / ZrMoN) glass and SUS304 stainless steel substrates. The effects of reactive magnetron sputtering deposition parameters on MoN / ZrMoN rigid films were investigated. Change the Zr power of ZrMoN (50~250W), the thickness of intermediate MoN film (225~690nm), and the pretreatment of substrate plasma etching (duration 5~15min), and the microstructure and mechanical properties of MoN / ZrMoN multilayer. Impact. Film properties were measured by SEM, EDS, XRD, nanoindentation, frictional wear test and water droplet contact angle. As a result, it was found that the content of Zr was increased, and the crystal position of the (111) diffraction wave of the ZrMoN film was shifted to a low angle. Studies have shown that the MoN / ZrMoN friction coefficient and elastic recovery of a single MoN, ZrMoN, multilayer film MoN / ZrMoN and plasma etched substrate through the multilayer film are (8.22 GPa, 50.24%), respectively (11.95 GPa, 0.74, 64.93%) ), (12.53 GPa, 0.42, 58.69%), (13.87 GPa, 0.29, 62.77%). The substrate is processed by plasma etching to increase the surface roughness of the substrate. The contact angle of the water droplets was reduced from 85.0o to 58.4o, and the surface became hydrophilic, effectively improving the adhesion of the film. It shows that the MON / ZrMoN multilayer film has excellent mechanical properties. The best MoN / ZrMoN multilayer film in this study has excellent wear resistance. The hardness, friction coefficient and elastic recovery were 15.71 GPa, 0.21 and 66.65%, respectively.

摘要 i
ABSTRACT ii
誌謝 iii
目錄 iv
表目錄 vi
圖目錄 vii
第一章 前言 1
1.1 前言 1
1.2 研究目的 1
第二章 文獻回顧 3
2.1 文獻回顧 3
2.2 濺鍍(Sputtering) 4
2.2.1磁控濺鍍(Magnetron Sputtering Deposition) 4
2.2.2反應式濺鍍(Reactive sputtering) 5
2.3 薄膜沉積原理 6
2.3.1薄膜成長機制 7
2.4 薄膜機械性質 8
2.5 氮化物薄膜 8
2.5.1氮化鉬 9
2.5.2氮化鋯 9
2.6 奈米壓痕理論 9
第三章 實驗設備與方法 10
3.1 磁控濺鍍設備與實驗材料 10
3.1.1磁控濺鍍設備 10
3.1.2基材 11
3.1.3靶材 11
3.1.4氣體 11
3.2 薄膜分析設備 12
3.2.1電子顯微鏡(FE-SEM) 12
3.2.2(X-Ray Diffraction；XRD) 13
3.2.3低真空顯微鏡 15
3.2.4 (α-step) 16
3.3 薄膜機械性質分析設備 17
3.3.1奈米壓痕量測儀 17
3.3.2球對盤磨耗測試儀 18
3.3.4微表面粗糙度量測儀 19
3.3.5水滴接觸角量測儀 20
3.4 濺鍍步驟 21
3.4.1基材前處理 21
3.4.2基材薄膜製備步驟 21
3.5 實驗規劃與流程 21
3.6 實驗濺鍍參數設計 23
第四章 結果與討論 24
4.1 改變膜厚之MoN薄膜分析 24
4.1.1 MoN薄膜XRD微結構分析 24
4.1.2 硬度、彈性回復量分析 26
4.1.3 水滴接觸角分析 27
4.2 改變Zr功率MoN/ZrMoN多層膜分析 27
4.2.1 ZrMoN薄膜EDS成分及XRD微結構分析 27
4.2.2 SEM表面及橫斷面分析 29
4.2.3 硬度、彈性回復量及摩擦係數分析 30
4.2.4 水滴接觸角分析 33
4.3 改變中間層MoN之膜厚影響ZrMoN薄膜分析 33
4.3.1 ZrMoN薄膜EDS成分及XRD微結構分析 34
4.3.2 SEM表面及橫斷面分析 35
4.3.3 硬度、彈性回復量及摩擦係數分析 37
4.3.4 水滴接觸角分析 39
4.4 基材蝕刻前處理影響MoN/ZrMoN多層膜分析 40
4.4.1 基材蝕刻 40
4.4.2 ZrMoN薄膜EDS成分及XRD微結構分析 41
4.4.3 SEM表面及橫斷面分析 42
4.4.4 硬度、彈性回復量及摩擦係數分析 43
4.4.5水滴接觸角分析 46
4.5 最佳參數再現性驗證 46
4.5.1硬度及彈性回復量及摩擦係數分析 46
第五章 結論 48
5.1 結論 48
參考文獻 50

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