臺灣博碩士論文加值系統

本研究將使用聚甲基丙烯酸甲酯(壓克力)作為基板，經由電漿增強化學氣相沉積系統(Plasma-Enhaced Chemical Vapor Deposition；PECVD)、熱蒸鍍系統(Thermal Evaporation Coater)、射頻磁控共濺鍍系統(RF magnetron co-sputtering system)以及噴塗法(spray painting)，製備硬化膜、反射膜、抗反射膜、透明導電膜作為功能性薄膜測試其附著度並改善。
研究結果顯示，當功能性薄膜沉積於壓克力基板時附著度只有0B等級，為了提高功能性薄膜在壓克力基板上的附著度，而利用電漿增強化學氣相沉積系統(PECVD)沉積有機矽基薄膜作為緩衝層，目的為增強壓克力基板與功能性薄膜之間的附著度，並減少薄膜沉積後的殘留應力，使薄膜附著度為5B等級，再經由力道100 mN的絨布磨擦1000次，鹽水及鹽酸環境測試來探討其功能性薄膜改善結果對於嚴苛環境下的穩定性。
為了分析薄膜附著度改善原因，使用表面輪廓儀量測薄膜沉積前後曲率，再經由Stoney方程式計算出殘留應力，當殘留內應力越小則表示薄膜附著度越好。以傅立葉轉換紅外線光譜量測出薄膜的化學鍵結，分析材料的同質性跟附著度的關係。利用X射線繞射儀量測薄膜的結晶性，分析結晶性對於薄膜附著度的影響。量測接觸角得知薄膜表面親疏水性，分析親疏水對於附著度影響。使用原子力顯微鏡量測薄膜的粗糙度，分析粗糙度與附著的關係。

This study will be used polymethyl methacrylate (acrylic) as the substrate, by plasma enhanced chemical vapor deposition system (PECVD), thermal evaporation system, RF magnetron co-sputtering system, and spray painting, testing and adhesion improvement on a functional thin film that include hard coatings thin film, reflection thin film, anti-Glare Coating and transparent conductive thin film.
The results showed that when the functional thin film adhered to the acrylic substrate only 0B degree level, in order to improve the adhesion of the functional thin film on the acrylic substrate using PECVD deposition of the organic silicon thin film as a buffer layer for the purpose of enhancing the adhesion of the functional thin film between the acrylic substrate and to reduce the residual stress after the thin film deposition, the degree of adhesion level reaches 5B, then through the force of 100 mN flannel friction 1000 times, hydrochloric acid and brine environmental testing to explore the functional thin film for improving results under harsh environment stability.
In order to analyze the reasons of the improvement on the thin film, and using a surface profiler measurement of curvature before and after the thin film deposition, and then calculate for residual stress via Stoney equation, when the residual stress is smaller the better adhesion of the thin film.Using Fourier transform infrared spectroscopy measure thin film chemical bonding, and analyze attachment relationship with the homogeneity of material.X-ray diffraction measure the crystallinity of the thin film, the thin film is attached to the analysis of the crystalline degree of influence.Measuring the contact angle that the thin film surface hydrophilic and hydrophobic, hydrophilic and hydrophobic for analysis of the impact on attachment.Measured using an atomic force microscope roughness of the thin film, analyze the relationship between roughness and adhesion.

摘要...i
Abstract...ii
誌謝...iii
目錄...iv
表目錄...vi
圖目錄...vii
第一章 緒論...1
1.1前言...1
1.2文獻回顧...1
1.3研究動機...3
第二章 理論基礎...7
2.1電漿成分及原理...7
2.2化學氣相沉積薄膜之成長機制...7
2.3電漿增強化學氣相沉積法...8
2.4物理熱蒸鍍理論...8
2.5噴塗理論...8
2.6射頻磁控濺鍍原理...9
2.7薄膜成長原理...9
2.8薄膜應力原理及機制...10
第三章 實驗方法及步驟...17
3.1實驗流程...17
3.2實驗系統...17
3.2.1電漿增強化學氣相沉積系統...17
3.2.2金屬蒸鍍系統...18
3.2.3共濺鍍系統...18
3.3薄膜量測分析...19
3.3.1原子力顯微鏡(Atomic force microscope；AFM)...19
3.3.2 α-step表面輪廓儀...19
3.3.3低掠角X光繞射儀(Grazing incident X-ray diffraction pattern；GIXRD)...19
3.3.4傅立葉轉換紅外線吸收光光譜儀(Fourier transform infrared spectroscopy；FTIR)...20
3.3.5接觸角分析...20
3.4薄膜附著測試...20
3.4.1百格測試...20
3.4.2環境測試...20
3.4.3磨耗測試...21
第四章 結果與討論...29
4.1薄膜附著度測試及改善...29
4.1.1以電漿增強化學氣相系統沉積氧化矽光學硬化膜之研究...29
4.1.2以熱蒸鍍系統沉積鋁反射膜之研究...30
4.1.3以噴塗製程沉積抗眩膜之研究...31
4.1.4以射頻磁控共濺鍍系統沉積氧化鋅及氧化銦錫-氧化鋅透明導電膜之研究...31
4.2薄膜應力特性分析...33
4.2.1以電漿增強化學氣相系統沉積氧化矽光學硬化膜應力分析...33
4.2.2以熱蒸鍍系統沉積鋁反射膜應力分析...34
4.2.3以射頻磁控共濺鍍系統沉積氧化銦錫-氧化鋅透明導電膜應力分析...35
4.3薄膜材料特性分析...36
4.3.1原子力顯微鏡分析...36
4.3.2 X光繞射分析...36
4.3.3接觸角分析...36
4.3.4傅立葉轉換紅外線光譜分析...37
第五章 結論...75
參考文獻...77
Extended Abstract...78
簡歷(CV)...82

[1]J. E. Klemberg-Sapieha, L. Martinu, N. L. S. Yamasakib, and C. W. Lantmanc, 2005, “Tailoring the adhesion of optical film on polymethyl-methacrylate by plasma-induced surface stabilization”, Thin Solid Films, 476, 101.
[2]T. Gururaj, R. Subasri, K. R. C. Soma Raju, and G. Padmanabham, 2011, “Effect of plasma pretreatment on adhesion and mechanical properties of UV-curable coatings on plastics”, Appl. Surf. Sci., 257, 4360.
[3]L. Cui, A. N. Ranade, M. A. Matos, G. Dubois, and R. H. Dauskardt, 2013, “Improved Adhesion of Dense Silica Coatings on Polymers by Atmospheric Plasma Pretreatment”, ACS Appl. Mater. Inter., 5, 8495.
[4]A. Liebermann, C. Keul, N. Bähr, D. Edelhoff, M. Eichberger, M. Roos, and B. Stawarczyk, 2013, “Impact of plasma treatment of PMMA-based CAD/CAM blanks on surface properties as well as on adhesion to self-adhesive resin composite cements”, Dent. Mater., 29, 935.
[5]J. Ahn, S. J. Son, and J. Min, 2013, “The control of cell adhesion on a PMMA polymer surface consisting of nanopillar arrays”, J. Biotechnol., 164, 543.
[6]吳東權等，2005，“微機電系統之技術現況與發展”，工業技術研究院機械工業研究所。
[7]Michael Quirk、Julian Serda 著，2005，羅文雄、蔡榮輝、鄭岫盈譯，“半導體製造技術”，滄海書局，chap 11，8月。
[8]Sematech., 1994, “Deposition Processes in Furnace Processes and Related Topics ”, Austin, TX : SEMATECH, 6.
[9]J. R. Roth, 1995, “Industrial Plasma Engineering, Volume 1: Principles”, Institute of Physics Publishing Bristol and Philadelphia.
[10]莊達人，2000，“VLSI 製造技術”，高立圖書有限公司，chap 5。
[11]L. Eckertova, and T. Ruzicka., 1993, “Diagnostics and Applications of Thin Films”, Institute of Physics Publishing, chap. 1 & 2.
[12]R.W. Hoffman, C.H.S. Dupuy, A. Cachard., 1976, “Physics of nonmetallic Thin Films“, Plenum Press: New York, 273.
[13]K.L. Chopra., 1969, “Mechanical effects in thin films, in Thin Film Phenomena”, McGRAW -HILL : New York, 266.
[14]Day-Shan Liu, and Cheng-Yang Wu, 2010, “Adhesion enhancement of hard coatings deposited on flexible plastic substrates using an interfacial buffer layer”, J. Phys. D: Appl. Phys., 43, 175301.
[15]Shao-Kai Lu, Shun-Chi Chen, Tai-Hong Chen, Li-Wen Lai, Ren-Mao Liao, Day-Shan Liu, 2015, “Organosilicon/silicon oxide gas barrier structure encapsulated flexible plastic substrate by using plasma-enhanced chemical vapor deposition”, Surface & Coatings Technology, 280, 92-99.
[16]甘嘉倫，2015，“數位影像相關法於Cr薄膜殘留應力的量測”，國立中山大學碩士論文
[17]劉安祐，2009，“不同表面濺鍍對於複合雙極板之導電性及機械強度研究”，國立交通大學碩士論文
[18]張光輝，2009，“大氣電漿處理聚苯乙烯及表面接枝聚合聚異丙基丙烯醯胺之研究”，私立大同大學碩士論文
[19]Charles E. Mortimer，吳惠平 譯述，1995，“大學化學”，科技圖書股份有限公司
[20]Teresa Oh, 2007, “Characteristic of Organic Thin Film Depending on Carbon Content by Fourier Transform Infrared Spectra and X-ray Diffraction Pattern”, Bull. Korean Chem. Soc., 28, 9.
[21]吳政洋，2012，“以電漿表面改質技術於可撓式塑膠基板上製備多功能性薄膜之研究”，國立國立虎尾科技大學
[22]M. Nakamura, T. Aoki, Y. Hatanaka, 2001, “Hydrophilicity of TiO2 thin films obtained by radio frequency magnetron sputtering deposition”, J. Mater. Res, 16, 21
[23]W. Que, Z. Sun, Y. Zhou, Y. L. Lam, Y. C. Chan, C. H. Kam, 2000, “”, Thin Solid Film, 359, 177
[24]陳致宇、劉吉?、張智傑、李宜芳，2004，“以自組裝奈米孔洞 SiO2 作為次 70 nm IC 技術之超低介電薄膜之應用研究”，行政院國家科學委員會專題研究計畫成果報告
[25]F. Namouchi, H. Smaoui, N. Fourati, C. Zerrouki, H. Guermazi, J.J. Bonnet, 2009, “Investigation on electrical properties of thermally aged PMMA by combined use of FTIR and impedance spectroscopies”, Journal of Alloys and Compounds, 469, 197-202.