[1] 李正中 ”薄膜光學與鍍膜技術“, 台北 藝軒出版社(第四版), 2004.
[2] P. J. Martin and H. Macleod, "Ion-beam-assisted deposition of thin films," Appl. Opt. 22, 178-184 (1983).
[3] M. Marinov, "Effect of Ion Bombardment on the Initial Stages of Thin Film Growth," Thin Solid Films 46, 267-274 (1977).
[4] E. H. Hirsch and I. K. Varga, Thin Solid Films 69, 99 (1980)
[5] J. Ebert, Proc. Soc. Photo-Opt. Instrum. Eng. 325, (1982).
[6] P. J. Martin, W. G. Sainty, R. P. Netterfield, D. R. McKenzie, D. J. H. Cockayne, S. H. Sie, O. R. Wood, and H. G. Craighead, "Influence of ion assistance on the optical properties of MgF2 ," Appl. Opt. 26 (1987).
[7] M. Kennedy, D. Ristau, and H. Niederwald, "Ion beam-assisted deposition of MgF2 and YbF3 films," Thin Solid Films 333, 191-195 (1998).
[8] L. Dumas, E. Quesnel, J. Y. Robic, Y. Pauleau, “Chracterization of magnesium fluoride thin films produced by argon ion beam-assistied deposition” Thin Solid Films 382 (2001) 61-68.
[9] S. H. Woo and C. K. Hwangbo, "Effects of annealing on the optical, structural, and chemical properties of TiO2 and MgF2 thin films prepared by plasma ion-assisted deposition," Appl. Opt. 45, 1447-1455 (2006).
[10] J. Manifacier, J. Gasiot, and J. Fillard, "A simple method for the determination of the optical constants n, k and the thickness of a weakly absorbing thin film," J.Phys.E 9, 1002 (1976).
[11] R. Swanepoel, "Determination of the thickness and optical constants of amorphous silicon," Journal of Physics E: Scientific Instruments 16, 1214-1222 (1983).
[12] D. Gardner, Wayne Sainty, “ Characterization of a high output gridless ion source ”, 2005 Society of Vacuum Coaters505/856-7188 2 48th Annual Technical Conference Proceedings (2005) ISSN0737-5921.
[13] 童啟弘, “離子輔助熱蒸鍍紫外光學薄膜之研究” ,國立中央大學光電所碩士論,2002。[14] 戴國良, “離子輔助反應射頻磁控濺鍍紫外光薄膜之研究” ,國立中央大學光電所碩士論文,2001。[15] 鄭春皇, “鋁金屬誘發多晶矽之研究” ,國立中央大學光電所碩士論文,2006。[16] 潘鼎翔, “光學薄膜應力量測與分析之探討” ,國立中央大學光電所碩士論文,2003。