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研究生(外文):Sung-chi Chen
論文名稱(外文):Investigation of the effects of quartz nanostructures on surface contact angle and surface wettability
指導教授(外文):Ming-tsung Hung
外文關鍵詞:micro/nano-structurescontact anglequartzwettability
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With the development of semiconductor technology, more materials are used in semiconductor manufacturing processes. Quartz has many special properties, such as piezoelectricity, insulation, and light transmission. It has been widely used in biomedical and MEMS components. In these components, in order to avoid the dust, particles and liquid effects on the operation or performance, the surface hydrophobicity, hysteresis, and self-cleaning properties may play important roles. In this study, we use chromium thin film as an etching mask on the Z-cut quartz wafers. Then, we use the wet etching process to make nanostructures on the quartz surface. Finally, we will discuss how the nanostructures affect surface contact angle and wettability.
In this paper, a nanometer thick non-continuous chromium layer is deposited on the quartz wafer as an etching mask. Ammonium bifluoride solution is used as the etchant to etch quartz to form nanoneedles on the quartz surface. The etched structures for different etching time are observed by scanning electron microscopy and compared with the models from literatures.
In the results, the distribution of structures is not uniform and there are many defects between structures due to the uneven growth of the thin film. The surface wettability switches from hydrophilic to hydrophobic. In the static contact angle measurement, we found that for high structure-density samples, the measured contact angles are close to the values predicted by the Cassie-Baxter model. However, with the reduction in the structure density, the contact angles are lower than that of the Cassie-Baxter model. The reason causes the phenomenon is the droplets penetration into the structures. In addition, the dynamic contact angle measurements show that the advancing contact angles of wafers are close to the static contact angle values, because there are lots of defects on the surface. However, due to the defects, the samples have lower receding angle, and thus the hysteresis on the surface is worse, causing that the droplet is hard to slide or roll on the surface. The quartz wafer prepared by the method of this study will have a high hydrophobicity, but serious surface hysteresis.

摘要 ..i
Abstract. ii
致謝.. iv
圖目錄.. viii
表目錄.. xiv
第一章 緒論1
1.1 研究背景 1
1.2 研究動機與目的 3
1.3 文獻回顧 5
1.3.1 石英晶體的非等向性蝕刻 5
1.3.2 表面改質與潤濕性探討. 7
1.4 論文架構. 12
第二章 理論基礎..13
2.1 石英晶格結構及特性.. 13
2.2 石英晶體之切向. 15
2.3 石英晶體之蝕刻技術.. 16
2.3.1 石英之濕式蝕刻.. 17
2.3.2 石英之乾式蝕刻.. 20
2.4 薄膜蒸鍍. 21
2.4.1 薄膜蒸鍍成長理論. 21
2.4.2 薄膜成長之形式.. 22
2.5 接觸角理論 24
2.5.1 楊氏方程式(Young’s equation).. 24
2.5.2 溫佐方程式(Wenzel equation) 25
2.5.3 卡西方程式(Cassie and Baxter equation). 27
2.5.4 卡西修正模型 28
2.6 遲滯效應. 30
2.6.1 動態接觸角(Dynamic contact angle).. 30
2.6.2 遲滯效應(Hysteresis effect) . 31
2.7 蓮花效應與花瓣效應.. 33
2.7.1 蓮花效應(Lotus effect) 33
2.7.2 花瓣效應(Petal effect). 34
第三章 研究方法..37
3.1 研究流程架構.. 37
3.2 實驗步驟. 39
3.2.1 晶圓清洗.. 40
3.2.2 蒸鍍金屬薄膜 40
3.2.3 蝕刻液之調配 41
3.2.4 試片之蝕刻. 41
3.3 量測與分析方法. 43
第四章 結果與討論.46
4.1 結構數據整理.. 46
4.2 數學模型分析.. 58
4.2.1 溫佐模型分析 58
4.2.2 卡西模型分析 62
4.2.3 卡西模型修正 63
4.3 靜態接觸角量測結果與分析.. 67
4.3.1 接觸面積25%以上之試片接觸角. 68
4.3.2 接觸面積25%以下試片之接觸角. 70
4.3.3 接觸面積10%以下之試片接觸角. 72
4.3.4 靜態接觸角整理與模型分析比較. 73
4.4 動態接觸角量測結果與分析.. 81
4.4.1 微量液滴法量測結果 81
4.4.2 旋轉平台法量測結果 90
第五章 結論與未來展望102
5.1 結論. 102
5.2 未來展望.. 103
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