目錄
中文摘要
合格證明
Ackonwledgement
Abstract
Table Captions
Figure Captions
CHAPTER 1 Introduction
CHAPTER 2 Experimental Procedures
§2-1 Substrate Preparation
§2-2 Mechanism Of Photo-CVD
§2-3 Growth Process
§2-4 MOSFET fabrication process
CHAPTER 3 Results and Discussion on Photo Oxidx,Oxide-semiconductor Interface Interface and MOS capacitor
§3-1 Properties of Photo-SiO2
§3-2 Estimation of Oxide-Semiconductor Interface
§3-3 Capacitance-Voltage measurement
§3-4 I-V measurement
§3-5 DLTS measurement
CHAPTER 4 Characteristics of MOSFFTs
§4-1 Si MOSFET
§4-2 InP MISFET
CHAPTER 5 Conclusion and Futur Prospects
References
Tables
Figures
APPENDIX A
APPENDIX B
APPENDIX C