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研究生:葉琦珍
研究生(外文):Yeh, C.J.
論文名稱:GX-5CrNiMoNb不銹鋼早期氧化及抗蝕性研究
論文名稱(外文):The pre-oxidation and corrosion resistance of Gx-5 Cr Ni Mo Nb
指導教授:顏秀崗顏秀崗引用關係
指導教授(外文):S.K.Yen
學位類別:碩士
校院名稱:國立中興大學
系所名稱:材料工程學研究所
學門:工程學門
學類:材料工程學類
論文種類:學術論文
論文出版年:1996
畢業學年度:84
語文別:中文
論文頁數:117
中文關鍵詞:早期氧化氧化膜不銹鋼孔蝕抗蝕性
外文關鍵詞:pre-oxidationoxidefilmstainless steelpittingcorrosion resistance
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本研究乃探討早期氧化成長氧化膜對GX-5 Cr Ni Mo Nb不銹鋼抗蝕性的影
響,藉由電化學動態極化方法、電化學阻抗光譜學測量、浸泡實驗等,了
解試片在不同環境下之腐蝕情況,且經由TGA動態氧化分析、歐傑分析(
AES)、X-ray 繞 射分析,對其氧化機構有更進一步的了解。試片在較
低溫氧化 (573K-673K) 的孔蝕電位較高,和氧化物層下金屬底材含鉻量
較高且氧化膜較緻密且均勻有關。較高溫之氧化膜 (773K-973K) 抗蝕性
較差且有沿晶腐蝕 現象,因其處於敏化溫度範圍使晶界周圍出現鉻
乏區所致。1073K 以上氧化膜已脫離敏化範圍且因鉻氧化速率較快,表層
鉻含量豐富,抗蝕性因而提高,但在 1173K氧化30分鐘以上時抗蝕性又變
差。藉由熱重差分析(TGA)了解各種材料在不同溫度時其增重隨時間的變
化情形,可增進對氧化膜機構的了解。經由GX-5 Cr Ni Mo Nb 不銹鋼試
片之TGA及AES曲線,可求得鉻氧化速率比鐵快之臨界溫度約在 934K ,因
而低溫氧化表層以富鐵氧化物為主,而超過臨界溫度的氧化物表層以富鉻
氧化物為主。 經由電化學阻抗光譜學(EIS) 的分析,
可不破壞試片而由電荷轉移阻抗之高低來判斷抗蝕性之優劣,且經由等效
電路模擬軟體(EQU)之模擬可增進對抗蝕機構之了解。
The effect of corrosion resistance of GX-5 Cr Ni Mo Nb
stainless steel has been explored by pre-oxidizing oxide
film in this study. The problem of the difference of
corrosion resistance between different temperature grown
oxide films can be investigated by some methods such as
electrochemical dynamic polarization , electrochemical
impedance spectroscopy and immersion test. The surface
morphology of the corroded species can also be observed by
the OM (Optical Microscopy), SEM (Scanning Electron Micr-
oscopy). TGA (Thermal Gravitation Analysis), AES ( Auger
Electron Spectroscopy) and X-ray diffraction, which are
very helpful to propose the oidation mechanisim of the
species. It
is found that the pitting potentials of the species at
lower oxidized temperatures(573K-673K) are higher than the
others, because of in the matrix is rich in chronium
chromium under the oxide film is richer and the oxidized
film is uniform and adherent. At higher temperatures
(773K-973K) the corrosion resistances of the oxide films
are worse and intergranular corrosion can be observed,
because they are within sensitizing temperature range.
Above 1073K the oxide film is out of the sensitizing
temperature range and the corrosion resistance is increased
by the higher concentration of chromium within the oxide
film. But at 1173K oxidation over thirty minutes will
decrease the corrosion resistance again. By
the use of TGA and AES analyses, the weight gain
against time of different materials at different temperatures
can increase the understanding of the oxidation mechanism.
It is found that the critical temperature near 934K, above
which the oxidation rate of chromium will surpass that of
the iron. On the other hand the oxide film will be
dominated by the iron rich oxide below the critical
temperature.

Through the electrochemical impedance spectroscopy
(EIS) analysis, it is found that the corrosion resistance is
increased with the increasing charge transfer resistance Rct
and the simulation by the software of equivalent circuit
(EQU) is also helpful to increase the understanding of
corrosion mechanism.
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