|
This thesis presents the fabrication and experimental results of
x-ray mask inx-ray lithography. The silicon-rich nitride is used
as membrane and tungsten and gold are studied as absorbers. In
order to increase the ability of opticalalignment between mask
and wafer in the SR stepper, it is necessary to improvethe
transmittance of membrane. For this reason,recipe of low-
pressure chemicalvapor deposition (LPCVD) system for membrane
deposition was constructured and deposition of anti-reflective
coating (ARC) on membrane was also performed. Onthe other hand,
the suitable recipes of sputtering with low-stress absorber
were adopted to avoid ruinning the membrane during experiments.
In this resea-rch, the process procedure of x-ray mask was
accomplished and 6cm*6cm membranewith low tensile stress and
optical transmittance up to square was available.
|