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As integrated circuit technology continues to push further into
the submicrometer regime, considerable effort has been
devoted to finding means of extending the resolution limits of
optical lithographic system. We would like to determine an
input (mask) to the imaging operator that results in an image
that is close to the prescribed image. We propose a
computationally iterative algorithm for the fast design of
masks for arbitrary two-dimensional patterns. This iterative
approach maintain arbitrary phase and amplitude to iterate and
get some compensation for the resolution-limiting effects of
optical diffraction. We obtain the result with resolution as
good as the conventional phase-shift mask technology.
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