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研究生:鄒議漢
論文名稱:應用鎳酉太有機半導體薄膜感測一氧化氮
論文名稱(外文):Organic Semicondutor-Type Sensor based on Nickel Phthalocyanine for NO Sensing
指導教授:何國川
學位類別:碩士
校院名稱:國立臺灣大學
系所名稱:化學工程學研究所
學門:工程學門
學類:化學工程學類
論文種類:學術論文
論文出版年:1997
畢業學年度:85
語文別:中文
論文頁數:159
中文關鍵詞:鎳酉太菁一氧化氮感測器有機半導體靈敏度真空蒸鍍
外文關鍵詞:nickel phthalocyaninenitric oxide sensororganic semiconductorsensitivityvacuum deposition
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本論文是關於應用鎳酉太菁(Nickel phthalocyanine,簡稱NiPc)有機半導體薄膜製備一氧化氮氣體感測器及其特性之研究。本研究採用真空蒸鍍法將金屬酉太菁蒸鍍於氧化鋁極板,而極板之製作則是運用網版印刷印製梳子型之金電極於氧化鋁板上;將此極板置於氣體偵測室中,組成一氣體偵測系統。運用金屬酉太菁之有機半導體特性,當薄膜吸附氮氧化物時將導致導電度的變化,依此原理來偵測氮氧化物的存在。
本研究所探討的範圍包括氣體吸附時之應答電流與時間(I-t curve)、濃度的理論模擬,氣體分子於薄膜內擴散的理論分析,NiPc薄膜的老化分析,蒸鍍速率、薄膜厚度、基板溫度等參數變化對NiPc之NO感測效應,以及感測器靈敏度,NO濃度、流量/應答電流分析,NiPc薄膜在各種製備條件下表面型態鑑定分析及晶相變化等。
經由實驗的結果發現,新鮮NiPc薄膜對相同NO階段濃度之應答電流並非一致,呈現老化的趨勢,亦即應答電流漸小,然後趨於平緩。本研究經由覆蓋率及氣體吸附濃度的觀念所推導出之理論模式,與實驗之NiPc薄膜應答電流及濃度的關係符合,且由濃度變化之測試(500ppm∼5pp,5ppm∼500ppm),可以求出吸附速率常數對脫附速率常數的比值K,且在低濃度(5ppm∼50ppm)時有較大之靈敏度。另外,經由擴散模式的分析,NiPc薄膜厚度與應答時間的關係也可由實驗數據來驗證。
在製備參數的設定對薄膜表面型態的影響上,本實驗經SEM之分析發現,蒸鍍速率對薄膜的表面型態影響不大;相對的,基板溫度、熱處理對NiPc薄膜的表面型態有顯著的影響。基板溫度對薄膜表面也有重要的影響。經250℃熱處理之薄膜表面由長柱狀變為長方形晶粒。經由X光繞射分析薄膜晶相發現,僅有經250℃熱處理兩小時之薄膜晶相有改變。


This thesis is about the preparation and characterization of nickel phthalocyanine (NiPc) thin film for nitric oxide (NO) sensing. NiPc thin film was chosen for the present study mainly because its sensing properties appear to be most stable among other tested Pcs. NiPc thin films were vacuum deposited on a gold-coated sapphire interdigitated electrode. The substrate then is placed into the cell of gas detecting chamber which is exposed to NO. The change in conductivity was measured during the adsorption/desorption processes. The sensing characteristics, including current response, sensitivity, response time, and aging, were studied.
A current increment-time (Al-t) relation has been derived which takes into account the adsorption/desportion at the thin film/gas interface and the diffusion inside the film. The effects of evaporation rate, film thickness, and substrate temperature on the NO sensing characteristics were discussed. The sensitivity, morphology, and crystalline phase of NiPc film prepared under various conditions are also studied.
The experimental data revealed that the same step change in NO concentration causing different response currents, presumably due to the presence of irreversible aging. The model derived from the surface coverage and the adsorption consists with the experimental data of response current. Various parameters, defined in the steady- state model, have been extracted from the experimental results. Experimental results show that the lower the concentration of NO, the larger the sensitivity. In addition, the relationship between film thickness and response time derived in the diffusion model is verified by the experimental data.
The effect of preparation parameters on the surface morphology of thin films was analyzed by SEM. The evaporation rate has little effect on the surface morphology, while substrate temperature and heat treatment have significant effect. When the NiPc films have been heated to 250℃, the surface morphology changed from long-cylinder to cuboid. The crystalline phase change was observed by XRD only when the NiPc films have been annealed at 250℃ for 2 hours.

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